Issued Patents All Time
Showing 26–50 of 62 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10269574 | Surface treatment of carbon containing films using organic radicals | Michael X. Yang, Hua Chung | 2019-04-23 |
| 9881787 | Deposition methods for uniform and conformal hybrid titanium oxide films | Chien-Teh Kao, Benjamin Schmiege, Xuesong Lu, Juno Yu-Ting Huang, Yu Lei +7 more | 2018-01-30 |
| 9683287 | Deposition of films comprising aluminum alloys with high aluminum content | David Thompson, Srinivas Gandikota, Wei V. Tang, Jing Zhou, Seshadri Ganguli +6 more | 2017-06-20 |
| 9530627 | Method for cleaning titanium alloy deposition | Srinivas Gandikota, Kyoung-Ho BU, Jing Zhou, Seshadri Ganguli, David Thompson | 2016-12-27 |
| 9269584 | N-metal film deposition with initiation layer | Seshadri Ganguli, Atif Noori, Maitreyee Mahajani, Shih Chung Chen, Mei Chang | 2016-02-23 |
| 9147578 | Contact clean by remote plasma and repair of silicide surface | Chien-Teh Kao, Chiukin Lai, Mei Chang | 2015-09-29 |
| 9145612 | Deposition of N-metal films comprising aluminum alloys | Srinivas Gandikota, Shih Chung Chen, Wei V. Tang, Jing Zhou, Seshadri Ganguli +8 more | 2015-09-29 |
| 9048183 | NMOS metal gate materials, manufacturing methods, and equipment using CVD and ALD processes with metal based precursors | Seshadri Ganguli, Srinivas Gandikota, Yu Lei, Sang Ho Yu, Hoon Kim +4 more | 2015-06-02 |
| 8987080 | Methods for manufacturing metal gates | Seshadri Ganguli, Atif Noori, Maitreyee Mahajani, Shih Chung Chen, Yu Lei +3 more | 2015-03-24 |
| 8927059 | Deposition of metal films using alane-based precursors | David Thompson, Jeffrey W. Anthis, Mei Chang, Seshadri Ganguli, Wei V. Tang +2 more | 2015-01-06 |
| 8895443 | N-metal film deposition with initiation layer | Seshadri Ganguli, Atif Noori, Maitreyee Mahajani, Shih Chung Chen, Mei Chang | 2014-11-25 |
| 8846163 | Method for removing oxides | Chien-Teh Kao, Jing-Pei (Connie) Chou, Chiukin (Steven) Lai, Sal Umotoy, Joel M. Huston +6 more | 2014-09-30 |
| 8642468 | NMOS metal gate materials, manufacturing methods, and equipment using CVD and ALD processes with metal based precursors | Seshadri Ganguli, Srinivas Gandikota, Yu Lei, Sang Ho Yu, Hoon Kim +4 more | 2014-02-04 |
| 8637410 | Method for metal deposition using hydrogen plasma | Anantha K. Subramani, John C. Forster, Seshadri Ganguli, Michael S. Jackson, Wei Wang +2 more | 2014-01-28 |
| 8592305 | Doping aluminum in tantalum silicide | Seshadri Ganguli, Shih Chung Chen, Atif Noori, Maitreyee Mahajani, Mei Chang | 2013-11-26 |
| 8318605 | Plasma treatment method for preventing defects in doped silicon oxide surfaces during exposure to atmosphere | Chien-Teh Kao, Haichun Yang, Mei Chang | 2012-11-27 |
| 8268684 | Method and apparatus for trench and via profile modification | Mei Chang, Chien-Teh Kao, Zhenbin Ge | 2012-09-18 |
| 8252696 | Selective etching of silicon nitride | Haichun Yang, Zhenbin Ge, Nan Lu, David T. Or, Chien-Teh Kao +1 more | 2012-08-28 |
| 8043933 | Integration sequences with top surface profile modification | Chien-Teh Kao, Zhenbin Ge, Mei Chang, Hoiman Raymond Hung, Nitin K. Ingle | 2011-10-25 |
| 7994002 | Method and apparatus for trench and via profile modification | Mei Chang, Chien-Teh Kao, Zhenbin Ge | 2011-08-09 |
| 7977246 | Thermal annealing method for preventing defects in doped silicon oxide surfaces during exposure to atmosphere | Haichun Yang, Chien-Teh Kao, Mei Chang | 2011-07-12 |
| 7955510 | Oxide etch with NH4-NF3 chemistry | Reza Arghavani, Chien-Teh Kao | 2011-06-07 |
| 7939422 | Methods of thin film process | Nitin K. Ingle, Jing Tang, Yi Zheng, Zheng Yuan, Zhenbin Ge +4 more | 2011-05-10 |
| 7871926 | Methods and systems for forming at least one dielectric layer | Li-Qun Xia, Mihaela Balseanu, Victor Nguyen, Derek R. Witty, Hichem M'Saad +3 more | 2011-01-18 |
| 7867789 | Contact clean by remote plasma and repair of silicide surface | Chien-Teh Kao, Chiukin Lai, Mei Chang | 2011-01-11 |