Issued Patents All Time
Showing 51–73 of 73 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10113236 | Batch curing chamber with gas distribution and individual pumping | Adib Khan, Shankar Venkataraman, Jay D. Pinson, II, Jang-Gyoo Yang, Nitin K. Ingle | 2018-10-30 |
| 10096466 | Pulsed plasma for film deposition | Jun Xue, Ludovic Godet, Srinivas D. Nemani, Michael W. Stowell, Douglas A. Buchberger, Jr. | 2018-10-09 |
| 10039157 | Workpiece processing chamber having a rotary microwave plasma source | Michael W. Stowell | 2018-07-31 |
| 9996745 | Blending of agricultural products via hyperspectral imaging and analysis | Seetharama C. Deevi, Henry M. Dante, Samuel Timothy Henry | 2018-06-12 |
| 9978564 | Chemical control features in wafer process equipment | Xinglong Chen, Kien N. Chuc, Dmitry Lubomirsky, Soonam Park, Jang-Gyoo Yang +4 more | 2018-05-22 |
| 9905400 | Plasma reactor with non-power-absorbing dielectric gas shower plate assembly | Michael W. Stowell | 2018-02-27 |
| 9733579 | Tooling configuration for electric/magnetic field guided acid profile control in a photoresist layer | Sang Ki Nam, Peng Xie, Ludovic Godet | 2017-08-15 |
| 9646807 | Sealing groove methods for semiconductor equipment | Dmitry Lubomirsky | 2017-05-09 |
| 9534289 | Plasma process chambers employing distribution grids having focusing surfaces thereon enabling angled fluxes to reach a substrate, and related methods | Jun Xue, Ludovic Godet | 2017-01-03 |
| 9144147 | Semiconductor processing system and methods using capacitively coupled plasma | Jang-Gyoo Yang, Matthew L. Miller, Xinglong Chen, Kien N. Chuc, Shankar Venkataraman +1 more | 2015-09-22 |
| 9132436 | Chemical control features in wafer process equipment | Xinglong Chen, Kien N. Chuc, Dmitry Lubomirsky, Soonam Park, Jang-Gyoo Yang +4 more | 2015-09-15 |
| 8894767 | Flow control features of CVD chambers | Kien N. Chuc, Hanh Nguyen, Xinglong Chen, Matthew L. Miller, Soonam Park +5 more | 2014-11-25 |
| 8357435 | Flowable dielectric equipment and processes | Dmitry Lubomirsky, Jang-Gyoo Yang | 2013-01-22 |
| 7989365 | Remote plasma source seasoning | Soonam Park, Soo Hyun Jeon, Toan Q. Tran, Jang-Gyoo Yang, Dmitry Lubomirsky | 2011-08-02 |
| 7811411 | Thermal management of inductively coupled plasma reactors | Siqing Lu, Irene Chou, Steven H. Kim, Young S. Lee, Ellie Yieh +1 more | 2010-10-12 |
| 7789993 | Internal balanced coil for inductively coupled high density plasma processing chamber | Robert Chen, Canfeng Lai, Xinglong Chen, Weiyi Luo, Zhong Qiang Hua +4 more | 2010-09-07 |
| 7651587 | Two-piece dome with separate RF coils for inductively coupled plasma reactors | Siqing Lu, Canfeng Lai, Robert Chen, Jason Bloking, Irene Chou +3 more | 2010-01-26 |
| 7572647 | Internal balanced coil for inductively coupled high density plasma processing chamber | Robert Chen, Canfeng Lai, Xinglong Chen, Weiyi Luo, Zhong Qiang Hua +4 more | 2009-08-11 |
| 7510624 | Self-cooling gas delivery apparatus under high vacuum for high density plasma applications | Siqing Lu | 2009-03-31 |
| 6894474 | Non-intrusive plasma probe | Michael S. Cox, Canfeng Lai | 2005-05-17 |
| 6598559 | Temperature controlled chamber | Kim Vellore, Erwin Polar | 2003-07-29 |
| 6508198 | Automatic tuning in a tapped RF transformer inductive source of a plasma reactor for processing a semiconductor wafer | Daniel J. Hoffman, Peter Loewenhardt, Victor H. Fuentes | 2003-01-21 |
| 6326597 | Temperature control system for process chamber | Dmitry Lubomirsky, Allen D'Ambra, Edward Floyd, Daniel J. Hoffman, Victor H. Fuentes +2 more | 2001-12-04 |