Issued Patents All Time
Showing 26–50 of 73 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11112697 | Method and apparatus for post exposure processing of photoresist wafers | Viachslav Babayan, Douglas A. Buchberger, Jr., Ludovic Godet, Srinivas D. Nemani, Daniel J. Woodruff +2 more | 2021-09-07 |
| 11110383 | Gas abatement apparatus | Adib Khan, Sultan Malik, Srinivas D. Nemani, Rafika Smati, Joseph Ng +1 more | 2021-09-07 |
| 11094573 | Method and apparatus for thin wafer carrier | Jingyu Qiao, Viachslav Babayan, Seshadri Ramaswami, Srinivas D. Nemani | 2021-08-17 |
| 11066747 | Chemical delivery chamber for self-assembled monolayer processes | Adib Khan, Tobin Kaufman-Osborn, Srinivas D. Nemani, Ludovic Godet | 2021-07-20 |
| 10954594 | High temperature vapor delivery system and method | Viachslav Babayan, Tobin Kaufman-Osborn, Ludovic Godet, Srinivas D. Nemani | 2021-03-23 |
| 10947621 | Low vapor pressure chemical delivery | Adib Khan, Srinivas D. Nemani, Tobin Kaufman-Osborn | 2021-03-16 |
| 10896325 | Blending of agricultural products via hyperspectral imaging and analysis | Seetharama C. Deevi, Henry M. Dante, Samuel Timothy Henry | 2021-01-19 |
| 10748783 | Gas delivery module | Adib Khan, Sultan Malik, Srinivas D. Nemani | 2020-08-18 |
| 10720341 | Gas delivery system for high pressure processing chamber | Srinivas D. Nemani, Sean S. Kang, Adib Khan, Ellie Yieh | 2020-07-21 |
| 10704141 | In-situ CVD and ALD coating of chamber to control metal contamination | Sultan Malik, Srinivas D. Nemani, Adib Khan, Maximillian Clemons | 2020-07-07 |
| 10675581 | Gas abatement apparatus | Adib Khan, Sultan Malik, Srinivas D. Nemani, Rafika Smati, Joseph Ng +1 more | 2020-06-09 |
| 10615007 | Plasma reactor with non-power-absorbing dielectric gas shower plate assembly | Michael W. Stowell | 2020-04-07 |
| 10590530 | Gas control in process chamber | Srinivas D. Nemani, Ellie Yieh | 2020-03-17 |
| 10550472 | Flow control features of CVD chambers | Kien N. Chuc, Hanh Nguyen, Xinglong Chen, Matthew L. Miller, Soonam Park +5 more | 2020-02-04 |
| 10529603 | High pressure wafer processing systems and related methods | Srinivas D. Nemani, Adib Khan, Venkata Ravishankar Kasibhotla, Sultan Malik, Sean S. Kang +1 more | 2020-01-07 |
| 10474033 | Method and apparatus for post exposure processing of photoresist wafers | Viachslav Babayan, Douglas A. Buchberger, Jr., Ludovic Godet, Srinivas D. Nemani, Daniel J. Woodruff +2 more | 2019-11-12 |
| 10431427 | Monopole antenna array source with phase shifted zones for semiconductor process equipment | Srinivas D. Nemani | 2019-10-01 |
| 10358715 | Integrated cluster tool for selective area deposition | Tobin Kaufman-Osborn, Srinivas D. Nemani, Ludovic Godet, Adib Khan | 2019-07-23 |
| 10354843 | Chemical control features in wafer process equipment | Xinglong Chen, Kien N. Chuc, Dmitry Lubomirsky, Soonam Park, Jang-Gyoo Yang +4 more | 2019-07-16 |
| 10283321 | Semiconductor processing system and methods using capacitively coupled plasma | Jang-Gyoo Yang, Matthew L. Miller, Xinglong Chen, Kien N. Chuc, Shankar Venkataraman +1 more | 2019-05-07 |
| 10269541 | Workpiece processing chamber having a thermal controlled microwave window | Michael W. Stowell | 2019-04-23 |
| 10240232 | Gas control in process chamber | Srinivas D. Nemani, Ellie Yieh | 2019-03-26 |
| 10224224 | High pressure wafer processing systems and related methods | Srinivas D. Nemani, Adib Khan, Venkata Ravishankar Kasibhotla, Sultan Malik, Sean S. Kang +1 more | 2019-03-05 |
| 10203604 | Method and apparatus for post exposure processing of photoresist wafers | Viachslav Babayan, Douglas A. Buchberger, Jr., Ludovic Godet, Srinivas D. Nemani, Daniel J. Woodruff +2 more | 2019-02-12 |
| 10179941 | Gas delivery system for high pressure processing chamber | Adib Khan, Sultan Malik, Keith Tatseun Wong, Srinivas D. Nemani | 2019-01-15 |