Issued Patents All Time
Showing 26–50 of 70 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10825663 | Plasma processing apparatus | Shinji Himori, Mitsunori Ohata | 2020-11-03 |
| 10763126 | Etching apparatus and etching method | Koichi Nagami | 2020-09-01 |
| 10553407 | Plasma processing method and plasma processing apparatus | Koichi Nagami, Kazunobu Fujiwara, Tatsuro Ohshita, Takashi Dokan, Koji Maruyama +1 more | 2020-02-04 |
| 9978566 | Plasma etching method | Akihiro Yokota, Shinji Himori, Tatsuro Ohshita, Shu Kusano, Etsuji Ito | 2018-05-22 |
| 9390943 | Substrate processing apparatus | Etsuji Ito, Akihiro Yokota, Shinji Himori, Shoichiro Matsuyama | 2016-07-12 |
| 8941037 | Substrate processing apparatus, focus ring heating method, and substrate processing method | Daisuke Hayashi | 2015-01-27 |
| 8895454 | Etching method of multilayer film | Shinji Himori, Etsuji Ito, Akihiro Yokota, Shu Kusano, Hiroaki Ishizuka | 2014-11-25 |
| 8840753 | Plasma etching unit | Masanobu Honda, Koichiro Inazawa, Shoichiro Matsuyama, Hisataka Hayashi | 2014-09-23 |
| 8821683 | Substrate processing apparatus and method, and program and storage medium | Yusuke Hirayama | 2014-09-02 |
| 8475622 | Method of reusing a consumable part for use in a plasma processing apparatus | Nobuyuki Nagayama, Naoyuki Satoh, Keiichi Nagakubo | 2013-07-02 |
| 8221579 | Method of reusing a consumable part for use in a plasma processing apparatus | Nobuyuki Nagayama, Naoyuki Satoh, Keiichi Nagakubo | 2012-07-17 |
| 7922862 | Plasma processing apparatus, electrode plate for plasma processing apparatus, and electrode plate manufacturing method | Katsuya Okumura, Shinji Himori, Hiroki Matsumaru, Shoichiro Matsuyama, Toshiki Takahashi | 2011-04-12 |
| 7862959 | Transfer mask for exposure and pattern exchanging method of the same | Katsuya Okumura, Naoyuki Satoh | 2011-01-04 |
| 7794616 | Etching gas, etching method and etching gas evaluation method | Masanobu Honda, Akinori Kitamura | 2010-09-14 |
| 7767055 | Capacitive coupling plasma processing apparatus | Shinji Himori, Noriaki Imai, Katsumi Horiguchi, Takaaki Nezu, Shoichiro Matsuyama +5 more | 2010-08-03 |
| 7749914 | Plasma etching method | Masanobu Honda, Hisataka Hayashi | 2010-07-06 |
| 7654010 | Substrate processing system, substrate processing method, and storage medium | Tsuyoshi Moriya | 2010-02-02 |
| 7641806 | Manufacturing method for membrane member | Katsuya Okumura, Naoyuki Satoh, Koji Maruyama | 2010-01-05 |
| 7625494 | Plasma etching method and plasma etching unit | Masanobu Honda, Koichiro Inazawa, Shoichiro Matsuyama, Hisataka Hayashi | 2009-12-01 |
| 7622017 | Processing apparatus and gas discharge suppressing member | Shinji Himori, Shosuke Endoh, Tomoya Kubota, Daisuke Hayashi | 2009-11-24 |
| 7585386 | Plasma processing apparatus, electrode plate for plasma processing apparatus, and electrode plate manufacturing method | Katsuya Okumura, Shinji Himori, Hiroki Matsumaru, Shoichiro Matsuyama, Toshiki Takahashi | 2009-09-08 |
| 7473377 | Plasma processing method | Tomoyo Yamaguchi, Takashi Fuse, Kiwamu Fujimoto, Masanobu Honda, Akiteru Koh +3 more | 2009-01-06 |
| 7470998 | Semiconductor device and method of manufacturing the same | Katsuya Okumura, Koji Maruyama, Akiteru Rai | 2008-12-30 |
| 7419613 | Method and device for plasma-etching organic material film | Masanobu Honda, Shoichiro Matsuyama, Hisataka Hayashi | 2008-09-02 |
| 7344652 | Plasma etching method | Takanori Mimura, Hiroki Miyajima | 2008-03-18 |