Issued Patents All Time
Showing 126–150 of 351 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10668592 | Method of planarizing a wafer | Bo-I Lee, Soon-Kang Huang, Chi-Ming Yang | 2020-06-02 |
| 10658184 | Pattern fidelity enhancement with directional patterning technology | Yu-Tien Shen, Chi-Cheng Hung, Chien-Wei Wang, Ching-Yu Chang, Chih-Yuan Ting +7 more | 2020-05-19 |
| 10649339 | Resist material and method for forming semiconductor structure using resist layer | Ya-Ching Chang, Chen-Yu Liu, Cheng-Han Wu, Ching-Yu Chang | 2020-05-12 |
| 10642158 | Method of controlling reticle masking blade positioning to minimize impact on critical dimension uniformity and device for controlling reticle masking blade positioning | Hung-Wen Cho, Fu-Jye Liang, Chun-Kuang Chen, Chih-Tsung Shih, Li-Jui Chen +1 more | 2020-05-05 |
| 10635000 | Semiconductor method of protecting wafer from bevel contamination | An-Ren Zi, Joy Cheng, Ching-Yu Chang | 2020-04-28 |
| 10573519 | Method for performing a photolithography process | Tsung-Han Ko, Joy Cheng, Ching-Yu Chang | 2020-02-25 |
| 10527941 | Extreme ultraviolet photoresist and method | Chen-Yu Liu, Ya-Ching Chang, Cheng-Han Wu, Ching-Yu Chang | 2020-01-07 |
| 10529552 | Method for manufacturing a semiconductor device and a coating material | Yu Ling Chien, Chien-Chih Chen, Ching-Yu Chang, Yahru Cheng | 2020-01-07 |
| 10520822 | Lithography techniques for reducing resist swelling | Ming-Hui Weng, Cheng-Han Wu, Ching-Yu Chang | 2019-12-31 |
| 10520833 | Extreme ultraviolet lithography system | Ming-Hui Weng, Cheng-Han Wu, Ching-Yu Chang | 2019-12-31 |
| 10520813 | Extreme ultraviolet photoresist with high-efficiency electron transfer | Wei-Han Lai, Chien-Wei Wang | 2019-12-31 |
| 10520820 | Negative tone developer for extreme ultraviolet lithography | Chen-Yu Liu, Wei-Han Lai, Tzu-Yang Lin, Ming-Hui Weng, Ching-Yu Chang | 2019-12-31 |
| 10520821 | Lithography process with enhanced etch selectivity | Chen-Yu Liu, Ching-Yu Chang | 2019-12-31 |
| 10515847 | Method for forming vias and method for forming contacts in vias | Tzu-Yang Lin, Cheng-Han Wu, Ching-Yu Chang | 2019-12-24 |
| 10517179 | Material composition and methods thereof | Siao-Shan Wang, Cheng-Han Wu, Ching-Yu Chang | 2019-12-24 |
| 10515812 | Methods of reducing pattern roughness in semiconductor fabrication | Chien-Wei Wang, Joy Cheng, Ching-Yu Chang | 2019-12-24 |
| 10514247 | Wafer alignment mark scheme | Wei-Hsiang Tseng, Heng-Hsin Liu, Jui-Chun Peng, Ho-Ping Chen | 2019-12-24 |
| 10514597 | Lithography mask with both transmission-type and reflective-type overlay marks and method of fabricating the same | Yun-Yue Lin, Hsin-Chang Lee, Chia-Jen Chen, Chih-Cheng Lin, Anthony Yen | 2019-12-24 |
| 10510580 | Dummy fin structures and methods of forming same | Keng-Chu Lin, Shwang-Ming Jeng, Teng-Chun Tsai, Tsu-Hsiu Perng, Fu-Ting Yen | 2019-12-17 |
| 10401728 | Extreme ultraviolet photoresist and method | Yen-Hao Chen, Wei-Han Lai, Chien-Wei Wang | 2019-09-03 |
| 10394123 | Blocking layer material composition and methods thereof in semiconductor manufacturing | Siao-Shan Wang, Chen-Yu Liu, Ching-Yu Chang | 2019-08-27 |
| 10381481 | Multi-layer photoresist | An-Ren Zi, Ching-Yu Chang | 2019-08-13 |
| 10366973 | Layout modification method for exposure manufacturing process | Hung-Wen Cho, Fu-Jye Liang, Chun-Kuang Chen, Chih-Tsung Shih, Li-Jui Chen +1 more | 2019-07-30 |
| 10354874 | Directional processing to remove a layer or a material formed over a substrate | Shih-Chun Huang, Chien-Wen Lai, Ru-Gun Liu, Wei-Liang Lin, Ya Hui Chang +3 more | 2019-07-16 |
| 10312108 | Method for forming semiconductor structure using modified resist layer | Li-Po YANG, Chien-Wei Wang, Wei-Han Lai | 2019-06-04 |