Issued Patents All Time
Showing 76–100 of 351 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11137685 | Semiconductor method of protecting wafer from bevel contamination | An-Ren Zi, Joy Cheng, Ching-Yu Chang | 2021-10-05 |
| 11137684 | Lithography mask with both transmission-type and reflective-type overlay marks and method of fabricating the same | Yun-Yue Lin, Hsin-Chang Lee, Chia-Jen Chen, Chih-Cheng Lin, Anthony Yen | 2021-10-05 |
| 11127592 | Photosensitive groups in resist layer | Ya-Ching Chang, Ching-Yu Chang, Yen-Hao Chen | 2021-09-21 |
| 11112698 | Photoresist with gradient composition for improved uniformity | Chang Lilin, Ching-Yu Chang | 2021-09-07 |
| 11092899 | Method for mask data synthesis with wafer target adjustment | Hsu-Ting Huang, Tung-Chin Wu, Shih-Hsiang Lo, Chih-Ming Lai, Jue-Chin Yu +1 more | 2021-08-17 |
| 11079681 | Lithography method for positive tone development | Ming-Hui Weng, Chen-Yu Liu, Cheng-Han Wu, Ching-Yu Chang | 2021-08-03 |
| 11075079 | Directional deposition for semiconductor fabrication | Shih-Chun Huang, Ya-Wen Yeh, Chien-Wen Lai, Wei-Liang Lin, Ya Hui Chang +3 more | 2021-07-27 |
| 11069558 | Dummy fin structures and methods of forming same | Keng-Chu Lin, Shwang-Ming Jeng, Teng-Chun Tsai, Tsu-Hsiu Perng, Fu-Ting Yen | 2021-07-20 |
| 11037820 | Method for forming vias and method for forming contacts in vias | Tzu-Yang Lin, Cheng-Han Wu, Ching-Yu Chang | 2021-06-15 |
| 11036137 | Method for forming semiconductor structure | An-Ren Zi, Ching-Yu Chang | 2021-06-15 |
| 11029602 | Photoresist composition and method of forming photoresist pattern | An-Ren Zi, Ching-Yu Chang, Yahru Cheng | 2021-06-08 |
| 11029593 | Lithography mask with a black border regions and method of fabricating the same | Chien-Cheng Chen, Hsin-Chang Lee, Chia-Jen Chen, Pei-Cheng Hsu, Yih-Chen Su +2 more | 2021-06-08 |
| 11024623 | Layout modification method for exposure manufacturing process | Hung-Wen Cho, Fu-Jye Liang, Chun-Kuang Chen, Chih-Tsung Shih, Li-Jui Chen +1 more | 2021-06-01 |
| 11022886 | Bottom-up material formation for planarization | Ming-Hui Weng, Cheng-Han Wu, Ching-Yu Chang | 2021-06-01 |
| 11022885 | Photosensitive middle layer | Chun-Chih HO, Kuan-Hsin Lo, Ching-Yu Chang | 2021-06-01 |
| 11016386 | Photoresist composition and method of forming photoresist pattern | An-Ren Zi, Ching-Yu Chang | 2021-05-25 |
| 11009796 | Method for forming semiconductor structure | Ming-Hui Weng, An-Ren Zi, Ching-Yu Chang, Chen-Yu Liu | 2021-05-18 |
| 11004729 | Method of manufacturing semiconductor devices | Ru-Gun Liu, Chih-Ming Lai, Wei-Liang Lin, Yung-Sung Yen | 2021-05-11 |
| 11003084 | Method for forming semiconductor structure | Li-Yen Lin, Ching-Yu Chang | 2021-05-11 |
| 11003076 | Extreme ultraviolet photoresist and method | Yen-Hao Chen, Wei-Han Lai, Chien-Wei Wang | 2021-05-11 |
| 10990013 | Method for forming semiconductor structure | An-Ren Zi, Ching-Yu Chang | 2021-04-27 |
| 10879108 | Topographic planarization method for lithography process | Tzu-Yang Lin, Ming-Hui Weng, Cheng-Han Wu | 2020-12-29 |
| 10872773 | Methods of reducing pattern roughness in semiconductor fabrication | Chien-Wei Wang, Joy Cheng, Ching-Yu Chang | 2020-12-22 |
| 10871713 | Method of controlling reticle masking blade positioning to minimize impact on critical dimension uniformity and device for controlling reticle masking blade positioning | Hung-Wen Cho, Fu-Jye Liang, Chun-Kuang Chen, Chih-Tsung Shih, Li-Jui Chen +1 more | 2020-12-22 |
| 10866515 | Lithography process using photoresist material with photosensitive functional group | Ming-Hui Weng, Cheng-Han Wu, Ching-Yu Chang, Siao-Shan Wang | 2020-12-15 |