Issued Patents All Time
Showing 126–150 of 151 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8765330 | Phase shift mask for extreme ultraviolet lithography and method of fabricating same | Chia-Tsung Shih, Pei-Chung Hsu, Shinn-Sheng Yu, Tsiao-Chen Wu, Yen-Cheng Lu +3 more | 2014-07-01 |
| 8709682 | Mask and method for forming the mask | Chia-Jen Chen, Hsin-Chang Lee, Sheng-Chi Chin | 2014-04-29 |
| 8679707 | Method of fabricating a lithography mask | Hsin-Chang Lee, Yun-Yue Lin, Pei-Cheng Hsu, Chia-Jen Chen, Ta-Cheng Lien | 2014-03-25 |
| 8663878 | Mask and method for forming the same | Shinn-Sheng Yu | 2014-03-04 |
| 8656318 | System and method for combined intraoverlay metrology and defect inspection | Hsin-Chang Lee, Chia-Jen Chen, Yeh Lee-Chih, Sheng-Chi Chin, Ting-Hao Hsu | 2014-02-18 |
| 8628897 | Extreme ultraviolet lithography process and mask | Yen-Cheng Lu, Shinn-Sheng Yu | 2014-01-14 |
| 8589828 | Reduce mask overlay error by removing film deposited on blank of mask | Hsin-Chang Lee, Chia-Jen Chen, Lee-Chih Yeh | 2013-11-19 |
| 8492054 | Mechanisms for patterning fine features | Shinn-Sheng Yu | 2013-07-23 |
| 8241823 | Method of fabrication of a semiconductor device having reduced pitch | Ming-Feng Shieh, Shinn-Sheng Yu, Shao-Ming Yu, Chang-Yun Chang, Jeff J. Xu +1 more | 2012-08-14 |
| 8039179 | Integrated circuit layout design | Ming-Feng Shieh, Shinn-Sheng Yu, Shao-Ming Yu, Chang-Yun Chang, Jeff J. Xu +1 more | 2011-10-18 |
| 7989355 | Method of pitch halving | Ming-Feng Shieh, Shinn-Sheng Yu, Ming-Ching Chang, Jeff J. Xu | 2011-08-02 |
| 7862962 | Integrated circuit layout design | Ming-Feng Shieh, Shinn-Sheng Yu, Shao-Ming Yu, Chang-Yun Chang, Jeff J. Xu +1 more | 2011-01-04 |
| 6991895 | Defocus-invariant exposure for regular patterns | Shinn-Sheng Yu | 2006-01-31 |
| 6877152 | Method of inter-field critical dimension control | Tsai-Sheng Gau, Burn Jeng Lin | 2005-04-05 |
| 6784005 | Photoresist reflow for enhanced process window for random, isolated, semi-dense, and other non-dense contacts | Huan-Tai Lin, Shinn-Sheng Yu | 2004-08-31 |
| 6774044 | Reducing photoresist shrinkage via plasma treatment | Chih-Ming Ke, Tsai-Sheng Giau, Jaw-Jung Shin | 2004-08-10 |
| 6768538 | Photolithography system to increase overlay accuracy | Tsai-Sheng Gau | 2004-07-27 |
| 6720116 | Process flow and pellicle type for 157 nm mask making | San-De Tzu, Chung-Hsing Chang, Chen-Hao Hsieh | 2004-04-13 |
| 6620631 | Plasma etch method for forming patterned layer with enhanced critical dimension (CD) control | Hun-Jan Tao, Chia-Shiung Tsai | 2003-09-16 |
| 6593033 | Attenuated rim phase shift mask | Zhiliu Ma, Cesar M. Garza | 2003-07-15 |
| 6492073 | Removal of line end shortening in microlithography and mask set for removal | Burn Jeng Lin, Ru-Gun Liu, Shih-Ying Chen, Shinn-Sheng Yu, Hua-Tai Lin +1 more | 2002-12-10 |
| 6458689 | Use of PE-SiON or PE-Oxide for contact or via photo and for defect reduction with oxide and w chemical-mechanical polish | Chen-Hua Yu, Syun-Ming Jang, Tsu Shih, Jih-Chuyng Twu | 2002-10-01 |
| 6362093 | Dual damascene method employing sacrificial via fill layer | Syun-Ming Jang, Hung-Chang Hsieh | 2002-03-26 |
| 6233039 | Optical illumination system and associated exposure apparatus | Barundeb Dutta | 2001-05-15 |
| 6228760 | Use of PE-SiON or PE-OXIDE for contact or via photo and for defect reduction with oxide and W chemical-mechanical polish | Chen-Hua Yu, Syun-Ming Jang, Tsu Shih, Jih-Churng Twu | 2001-05-08 |