Issued Patents All Time
Showing 76–100 of 151 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9442368 | Method of making an extreme ultraviolet pellicle | Chih-Tsung Shih, Tien-Hsi Lee, Chia-Jen Chen, Shang-Chieh Chien, Shinn-Sheng Yu +1 more | 2016-09-13 |
| 9442384 | Extreme ultraviolet lithography process and mask | Yen-Cheng Lu, Shinn-Sheng Yu, Jeng-Horng Chen | 2016-09-13 |
| 9417534 | Lithography method and structure for resolution enhancement with a two-state mask | Yen-Cheng Lu, Shinn-Sheng Yu | 2016-08-16 |
| 9418847 | Lithography system and method for haze elimination | Ching-Wei Shen, Kuan-Wen Lin, Chi-Lun Lu, Ting-Hao Hsu, Sheng-Chi Chin | 2016-08-16 |
| 9412647 | Via definition scheme | Yen-Cheng Lu, Chih-Tsung Shih, Shinn-Sheng Yu, Jeng-Horng Chen | 2016-08-09 |
| 9405195 | Method to define multiple layer patterns with a single exposure by charged particle beam lithography | Yen-Cheng Lu, Chih-Tsung Shih, Jeng-Horng Chen, Shinn-Sheng Yu | 2016-08-02 |
| 9377696 | Extreme ultraviolet lithography process and mask | Yen-Cheng Lu, Shinn-Sheng Yu, Jeng-Horng Chen | 2016-06-28 |
| 9366953 | Lithography mask | Yun-Yue Lin, Hsin-Chang Lee, Chia-Jen Chen | 2016-06-14 |
| 9360749 | Pellicle structure and method for forming the same | Yun-Yue Lin, Chia-Jen Chen, Hsin-Chang Lee | 2016-06-07 |
| 9354507 | Extreme ultraviolet lithography process and mask | Chih-Tsung Shih, Shinn-Sheng Yu, Jeng-Horng Chen | 2016-05-31 |
| 9341937 | Lithography system and method for patterning photoresist layer on EUV mask | Yun-Yue Lin, Chia-Jen Chen, Hsin-Chang Lee | 2016-05-17 |
| 9316900 | Extreme ultraviolet lithography process and mask | Chih-Tsung Shih, Shinn-Sheng Yu, Jeng-Horng Chen | 2016-04-19 |
| 9310675 | Extreme ultraviolet light (EUV) photomasks, and fabrication methods thereof | Tao Huang, Chih-Tsung Shih, Chia-Jen Chen, Hsin-Chang Lee | 2016-04-12 |
| 9304390 | Extreme ultraviolet lithography process and mask | Yen-Cheng Lu, Shinn-Sheng Yu, Jeng-Horng Chen | 2016-04-05 |
| 9285671 | Mask for use in lithography | Yen-Cheng Lu, Shinn-Sheng Yu | 2016-03-15 |
| 9285673 | Assist feature for a photolithographic process | Tao Huang, Chia-Jen Chen, Hsin-Chang Lee, Chih-Tsung Shih, Shinn-Sheng Yu +1 more | 2016-03-15 |
| 9280046 | Method of fabricating mask | Chih-Tsung Shih, Ming-Jiun Yao, Yen-Cheng Lu, Shinn-Sheng Yu, Jeng-Horng Chen +1 more | 2016-03-08 |
| 9261774 | Extreme ultraviolet lithography process and mask with reduced shadow effect and enhanced intensity | Yen-Cheng Lu, Shinn-Sheng Yu, Jeng-Horng Chen | 2016-02-16 |
| 9256123 | Method of making an extreme ultraviolet pellicle | Chih-Tsung Shih, Tien-Hsi Lee, Chia-Jen Chen, Shang-Chieh Chien, Shinn-Sheng Yu +1 more | 2016-02-09 |
| 9257282 | Method of semiconductor integrated circuit fabrication | Chih-Tsung Shih, Tsung-Min Huang, Chung-Ju Lee, Shinn-Sheng Yu, Jeng-Horng Chen | 2016-02-09 |
| 9256142 | Pellicle mounting system and method | Yeh Lee-Chih, Hsin-Chang Lee, Chia-Jen Chen, Ming-Jiun Yao | 2016-02-09 |
| 9252048 | Metal and via definition scheme | Yen-Cheng Lu, Chih-Tsung Shih, Shinn-Sheng Yu, Jeng-Horng Chen | 2016-02-02 |
| 9244341 | Photomask and method for forming the same | Hsin-Chang Lee, Chia-Jen Chen, Pei-Cheng Hsu | 2016-01-26 |
| 9244366 | Extreme ultraviolet lithography process and mask | Yen-Cheng Lu, Shinn-Sheng Yu, Jeng-Horng Chen | 2016-01-26 |
| 9229326 | Method for integrated circuit patterning | Yen-Cheng Lu, Shu-Hao Chang, Shinn-Sheng Yu, Jui-Ching Wu, Jeng-Horng Chen | 2016-01-05 |