Issued Patents All Time
Showing 76–100 of 128 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7695633 | Independent control of ion density, ion energy distribution and ion dissociation in a plasma reactor | — | 2010-04-13 |
| 7678710 | Method and apparatus for fabricating a high dielectric constant transistor gate using a low energy plasma system | Thai Cheng Chua, Steven C. H. Hung, Patricia M. Liu, Tatsuya Sato, Alex Paterson +1 more | 2010-03-16 |
| 7674394 | Plasma process for inductively coupling power through a gas distribution plate while adjusting plasma distribution | Alexander Paterson, Valentin Todorov, Theodoros Panagopoulos, Brian K. Hatcher, Dan Katz +1 more | 2010-03-09 |
| 7648914 | Method for etching having a controlled distribution of process results | Thomas J. Kropewnicki, Theodoros Panagopoulos, Nicolas Gani, Wilfred Pau, Meihua Shen | 2010-01-19 |
| 7645357 | Plasma reactor apparatus with a VHF capacitively coupled plasma source of variable frequency | Alexander Paterson, Valentin N. Todorow, Theodoros Panagopoulos, Brian K. Hatcher, Dan Katz +2 more | 2010-01-12 |
| 7645710 | Method and apparatus for fabricating a high dielectric constant transistor gate using a low energy plasma system | Christopher S. Olsen, Thai Cheng Chua, Steven C. H. Hung, Patricia M. Liu, Tatsuya Sato +2 more | 2010-01-12 |
| 7544251 | Method and apparatus for controlling temperature of a substrate | Theodoros Panagopoulos | 2009-06-09 |
| 7510665 | Plasma generation and control using dual frequency RF signals | Steven C. Shannon, Alexander Paterson, Theodoros Panagopoulos, Dennis S. Grimard, Daniel J. Hoffman | 2009-03-31 |
| 7436645 | Method and apparatus for controlling temperature of a substrate | Theodoros Panagopoulos, Alexander Matyushkin, Dan Katz, Michael F. Hegarty, Denis M. Koosau +1 more | 2008-10-14 |
| 7431857 | Plasma generation and control using a dual frequency RF source | Steven C. Shannon, Alex Paterson, Theodoros Panagopoulos, Dennis S. Grimard, Yashushi Takakura | 2008-10-07 |
| 7264688 | Plasma reactor apparatus with independent capacitive and toroidal plasma sources | Alexander Paterson, Valentin N. Todorow, Theodoros Panagopoulos, Brian K. Hatcher, Dan Katz +2 more | 2007-09-04 |
| 7196896 | Dechucking method and apparatus for workpieces in vacuum processors | Arthur M. Howald | 2007-03-27 |
| 6962644 | Tandem etch chamber plasma processing system | Alexander Paterson, Valentin Todorov, Jon McChesney, Gerhard Schneider, David Palagashvili +1 more | 2005-11-08 |
| 6893533 | Plasma reactor having a symmetric parallel conductor coil antenna | Valentin N. Todorow, Michael Barnes | 2005-05-17 |
| 6849151 | Monitoring substrate processing by detecting reflectively diffracted light | Michael Barnes, David Mui, Wei Liu | 2005-02-01 |
| 6831021 | Plasma method and apparatus for processing a substrate | Tal Cheng Chua, Philip Allan Kraus | 2004-12-14 |
| 6818562 | Method and apparatus for tuning an RF matching network in a plasma enhanced semiconductor wafer processing system | Valentin N. Todorow, Nicolas Gani | 2004-11-16 |
| 6790375 | Dechucking method and apparatus for workpieces in vacuum processors | Arthur M. Howald | 2004-09-14 |
| 6727655 | Method and apparatus to monitor electrical states at a workpiece in a semiconductor processing chamber | Jon McChesney, Alex Paterson, Valentin N. Todorow, Michael Barnes | 2004-04-27 |
| 6706138 | Adjustable dual frequency voltage dividing plasma reactor | Michael Barnes, Alexander Paterson, Valentin Todorov, Farhad Moghadam | 2004-03-16 |
| 6694915 | Plasma reactor having a symmetrical parallel conductor coil antenna | Valentin N. Todorow, Michael Barnes | 2004-02-24 |
| 6685798 | Plasma reactor having a symmetrical parallel conductor coil antenna | Valentin N. Todorow, Michael Barnes | 2004-02-03 |
| 6660127 | Apparatus for plasma etching at a constant etch rate | Padmapani Nallan, Valentin Todorov, Thorsten Lill | 2003-12-09 |
| 6660659 | Plasma method and apparatus for processing a substrate | Philip Allan Kraus, Thai Cheng Chua, James P. Cruse | 2003-12-09 |
| 6635578 | Method of operating a dual chamber reactor with neutral density decoupled from ion density | Songlin Xu, Xueyu Qian | 2003-10-21 |