Patent Leaderboard
USPTO Patent Rankings Data through Sept 30, 2025
JH

John Holland

Lam Research: 81 patents #10 of 2,128Top 1%
Applied Materials: 42 patents #212 of 7,310Top 3%
MIMks Instruments: 2 patents #156 of 442Top 40%
San Jose, CA: #150 of 32,062 inventorsTop 1%
California: #1,366 of 386,348 inventorsTop 1%
Overall (All Time): #8,631 of 4,157,543Top 1%
128 Patents All Time

Issued Patents All Time

Showing 51–75 of 128 patents

Patent #TitleCo-InventorsDate
9883549 Substrate support assembly having rapid temperature control Alexander Matyushkin, Dan Katz, Theodoros Panagopoulos, Michael D. Willwerth 2018-01-30
9852889 Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ring Michael C. Kellogg, Alexei Marakhtanov, Zhigang Chen, Felix Kozakevich, Kenneth Lucchesi 2017-12-26
9761414 Uniformity control circuit for use within an impedance matching circuit Alexei Marakhtanov, Felix Kozakevich, Kenneth Lucchesi 2017-09-12
9673058 Method for etching features in dielectric layers Scott Briggs, Eric A. Hudson, Leonid Belau, Mark Wilcoxson 2017-06-06
9595424 Impedance matching circuit for operation with a kilohertz RF generator and a megahertz RF generator to control plasma processes Alexei Marakhtanov, Felix Kozakevich, Brett Jacobs 2017-03-14
9564285 Hybrid feature etching and bevel etching systems Andreas Fischer 2017-02-07
9536749 Ion energy control by RF pulse shape Alexei Marakhtanov, Zhigang Chen 2017-01-03
9275887 Substrate processing with rapid temperature gradient control Alexander Matyushkin, Dan Katz, Theodoros Panagopoulos, Michael D. Willwerth 2016-03-01
9177756 E-beam enhanced decoupled source for semiconductor processing Peter L. G. Ventzek, Harmeet Singh, Jun Shinagawa, Akira Koshiishi 2015-11-03
9111728 E-beam enhanced decoupled source for semiconductor processing Peter L. G. Ventzek, Harmeet Singh, Jun Shinagawa, Akira Koshiishi 2015-08-18
8980046 Semiconductor processing system with source for decoupled ion and radical control Akira Koshiishi, Peter L. G. Ventzek, Jun Shinagawa 2015-03-17
8900403 Semiconductor processing system having multiple decoupled plasma sources Peter L. G. Ventzek, Harmeet Singh, Richard A. Gottscho 2014-12-02
8900402 Semiconductor processing system having multiple decoupled plasma sources Peter L. G. Ventzek, Harmeet Singh, Richard A. Gottscho 2014-12-02
8895452 Substrate support providing gap height and planarization adjustment in plasma processing chamber Jerrel K. Antolik, Yen-Kun Wang 2014-11-25
8801896 Method and apparatus for stable plasma processing Valentin N. Todorow, Michael D. Willwerth 2014-08-12
8663391 Electrostatic chuck having a plurality of heater coils Alexander Matyushkin, Dennis Koosau, Theodoros Panagopoulos 2014-03-04
8475625 Apparatus for etching high aspect ratio features Sharma Pamarthy, Huutri Dao, Xiaoping Zhou, Kelly A. McDonough, Jivko Dinev +9 more 2013-07-02
8349128 Method and apparatus for stable plasma processing Valentin N. Todorow, Michael D. Willwerth 2013-01-08
8226769 Substrate support with electrostatic chuck having dual temperature zones Alexander Matyushkin, Dennis Koosau, Theodoros Panagopoulos 2012-07-24
8075729 Method and apparatus for controlling temperature of a substrate Theodoros Panagopoulos 2011-12-13
7879185 Dual frequency RF match Steven C. Shannon 2011-02-01
7837838 Method of fabricating a high dielectric constant transistor gate using a low energy plasma apparatus Thai Cheng Chua, Alex Paterson, Steven C. H. Hung, Patricia M. Liu, Tatsuya Sato +1 more 2010-11-23
7780864 Process using combined capacitively and inductively coupled plasma sources for controlling plasma ion radial distribution Alexander Paterson, Valentin N. Todorow, Theodoros Panagopoulos, Brian K. Hatcher, Dan Katz +2 more 2010-08-24
7777152 High AC current high RF power AC-RF decoupling filter for plasma reactor heated electrostatic chuck Valentin Todorov, Michael D. Willwerth, Alexander Paterson, Brian K. Hatcher, James E. Sammons, III 2010-08-17
7727413 Dual plasma source process using a variable frequency capacitively coupled source to control plasma ion density Alexander Paterson, Valentin N. Todorow, Theodoros Panagopoulos, Brian K. Hatcher, Dan Katz +2 more 2010-06-01