Issued Patents All Time
Showing 101–125 of 128 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6617794 | Method for controlling etch uniformity | Michael Barnes, Valentin Todorov, Mohit Jain, Alexander Paterson | 2003-09-09 |
| 6598615 | Compact independent pressure control and vacuum isolation for a turbomolecular pumped plasma reaction chamber | Michael Barnes, Steve S. Y. Mak, Patrick Leahey, Jonathan D. Mohn | 2003-07-29 |
| 6507155 | Inductively coupled plasma source with controllable power deposition | Michael Barnes, Valentin Todorov | 2003-01-14 |
| 6472822 | Pulsed RF power delivery for plasma processing | Jin-Yuan Chen, Arthur H. Sato, Valentin N. Todorow | 2002-10-29 |
| 6462481 | Plasma reactor having a symmetric parallel conductor coil antenna | Valentin N. Todorow, Michael Barnes | 2002-10-08 |
| 6447636 | Plasma reactor with dynamic RF inductive and capacitive coupling control | Xue-Yu Qian, Zhi-Wen Sun, Maocheng Li, Arthur H. Sato, Valentin Todorov +2 more | 2002-09-10 |
| 6414648 | Plasma reactor having a symmetric parallel conductor coil antenna | Valentin N. Todorow, Michael Barnes | 2002-07-02 |
| 6409933 | Plasma reactor having a symmetric parallel conductor coil antenna | Valentin N. Todorow, Michael Barnes | 2002-06-25 |
| 6399507 | Stable plasma process for etching of films | Padmapani Nallan, Valentin Todorov, Thorsten Lill | 2002-06-04 |
| 6344151 | Gas purge protection of sensors and windows in a gas phase processing reactor | Anthony Chen | 2002-02-05 |
| 6319355 | Plasma processor with coil responsive to variable amplitude rf envelope | — | 2001-11-20 |
| 6280563 | Plasma device including a powered non-magnetic metal member between a plasma AC excitation source and the plasma | Scott Baldwin, Michael Barnes | 2001-08-28 |
| 6268700 | Vacuum plasma processor having coil with intermediate portion coupling lower magnetic flux density to plasma than center and peripheral portions of the coil | Alex Demos | 2001-07-31 |
| 6265831 | Plasma processing method and apparatus with control of rf bias | Arthur M. Howald, Christopher H. Olson | 2001-07-24 |
| 6229264 | Plasma processor with coil having variable rf coupling | Tiqiang Ni, Wenli Collison | 2001-05-08 |
| 6197388 | Methods of preventing post-etch corrosion of an aluminum neodymium-containing layer | Thomas S. Choi, Nancy Tran | 2001-03-06 |
| 6125025 | Electrostatic dechucking method and apparatus for dielectric workpieces in vacuum processors | Arthur M. Howald | 2000-09-26 |
| 6071375 | Gas purge protection of sensors and windows in a gas phase processing reactor | Anthony Chen | 2000-06-06 |
| 6027603 | Inductively coupled planar source for substantially uniform plasma flux | Michael Barnes | 2000-02-22 |
| 6028395 | Vacuum plasma processor having coil with added conducting segments to its peripheral part | Alex Demos | 2000-02-22 |
| 5982099 | Method of and apparatus for igniting a plasma in an r.f. plasma processor | Michael Barnes, Brett C. Richardson, Tuan Ngo | 1999-11-09 |
| 5975013 | Vacuum plasma processor having coil with small magnetic field in its center | Michael Barnes | 1999-11-02 |
| 5892198 | Method of and apparatus for electronically controlling r.f. energy supplied to a vacuum plasma processor and memory for same | Michael Barnes | 1999-04-06 |
| 5800619 | Vacuum plasma processor having coil with minimum magnetic field in its center | Michael Barnes | 1998-09-01 |
| 5793162 | Apparatus for controlling matching network of a vacuum plasma processor and memory for same | Michael Barnes | 1998-08-11 |