Issued Patents All Time
Showing 51–75 of 102 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10264663 | Matchless plasma source for semiconductor wafer fabrication | Maolin Long, Yuhou Wang, Ricky Marsh | 2019-04-16 |
| 10242844 | Rotating RF electric field antenna for uniform plasma generation | Jon McChesney | 2019-03-26 |
| 10242845 | Near-substrate supplemental plasma density generation with low bias voltage within inductively coupled plasma processing chamber | Zhongkui Tan, Yiting Zhang, Qian Fu, Qing Xu, Ying Wu +1 more | 2019-03-26 |
| 10224183 | Multi-level parameter and frequency pulsing with a low angular spread | Juline Shoeb, Ying Wu | 2019-03-05 |
| 10224221 | Internal plasma grid for semiconductor fabrication | Harmeet Singh, Thorsten Lill, Vahid Vahedi, Monica Titus, Gowri Kamarthy | 2019-03-05 |
| 10197908 | Photoresist design layout pattern proximity correction through fast edge placement error prediction via a physics-based etch profile modeling framework | Saravanapriyan Sriraman, Richard Wise, Harmeet Singh, Andrew D. Bailey, III, Vahid Vahedi +1 more | 2019-02-05 |
| 10153136 | Hollow RF feed with coaxial DC power feed | Jason Augustino, John Drewery, Neil Benjamin | 2018-12-11 |
| 10141163 | Controlling ion energy within a plasma chamber | Thorsten Lill, Harmeet Singh, Gowri Kamarthy | 2018-11-27 |
| 10124492 | Automated replacement of consumable parts using end effectors interfacing with plasma processing system | Damon Tyrone Genetti, Jon McChesney, Derek John Witkowicki, Austin Ngo | 2018-11-13 |
| 10121641 | Large dynamic range RF voltage sensor and method for voltage mode RF bias application of plasma processing systems | Maolin Long, John Drewery | 2018-11-06 |
| 10062589 | Front opening ring pod | Scott Wong, Damon Tyrone Genetti, Derek John Witkowicki, Richard H. Gould, Austin Ngo +1 more | 2018-08-28 |
| 10062590 | Front opening ring pod | Scott Wong, Damon Tyrone Genetti, Derek John Witkowicki, Richard H. Gould, Austin Ngo +1 more | 2018-08-28 |
| 10062599 | Automated replacement of consumable parts using interfacing chambers | Damon Tyrone Genetti, Jon McChesney, Derek John Witkowicki, Austin Ngo | 2018-08-28 |
| 10056231 | TCCT match circuit for plasma etch chambers | Maolin Long, Ricky Marsh | 2018-08-21 |
| 9996647 | Methods and apparatuses for etch profile optimization by reflectance spectra matching and surface kinetic model optimization | Mehmet Derya Tetiker, Saravanapriyan Sriraman, Andrew D. Bailey, III, Richard A. Gottscho | 2018-06-12 |
| 9978565 | Systems for cooling RF heated chamber components | Jon McChesney, Saravanapriyan Sriraman, Ricky Marsh, John Holland | 2018-05-22 |
| 9966236 | Powered grid for plasma chamber | Maolin Long, Richard A. Marsh, Ying Wu | 2018-05-08 |
| 9966270 | Gas reaction trajectory control through tunable plasma dissociation for wafer by-product distribution and etch feature profile uniformity | Saravanapriyan Sriraman, Monica Titus | 2018-05-08 |
| 9934979 | Gas distribution showerhead for inductively coupled plasma etch reactor | Michael Kang, Ian Kenworthy | 2018-04-03 |
| 9885493 | Air cooled faraday shield and methods for using the same | Saravanapriyan Sriraman, John Drewery, Jon McChesney | 2018-02-06 |
| 9881820 | Front opening ring pod | Scott Wong, Damon Tyrone Genetti, Derek John Witkowicki, Richard H. Gould, Austin Ngo +1 more | 2018-01-30 |
| 9805963 | Electrostatic chuck with thermal choke | Maolin Long, Ying Wu, Quan Chau | 2017-10-31 |
| 9792393 | Methods and apparatuses for etch profile optimization by reflectance spectra matching and surface kinetic model optimization | Mehmet Derya Tetiker, Saravanapriyan Sriraman, Andrew D. Bailey, III, Richard A. Gottscho | 2017-10-17 |
| 9761459 | Systems and methods for reverse pulsing | Maolin Long, Zhongkui Tan, Ying Wu, Qian Fu, John Drewery | 2017-09-12 |
| 9679751 | Chamber filler kit for plasma etch chamber useful for fast gas switching | Jon McChesney, Theo Panagopoulos, Craig Blair | 2017-06-13 |