| 10366865 |
Gas distribution system for ceramic showerhead of plasma etch reactor |
Alex Paterson |
2019-07-30 |
| 9934979 |
Gas distribution showerhead for inductively coupled plasma etch reactor |
Alex Paterson, Ian Kenworthy |
2018-04-03 |
| 9613834 |
Replaceable upper chamber section of plasma processing apparatus |
Leonard J. Sharpless, Harmeet Singh |
2017-04-04 |
| 9245717 |
Gas distribution system for ceramic showerhead of plasma etch reactor |
Alex Paterson |
2016-01-26 |
| 9099398 |
Gas distribution showerhead for inductively coupled plasma etch reactor |
Alex Paterson, Ian Kenworthy |
2015-08-04 |
| 8970114 |
Temperature controlled window of a plasma processing chamber component |
Matt Busche, Adam Mace, Allan K. Ronne |
2015-03-03 |
| 8859432 |
Bare aluminum baffles for resist stripping chambers |
Fred Dennis Egley, Anthony Chen, Jack Kuo, Hong Shih, Duane Outka +1 more |
2014-10-14 |
| 8845856 |
Edge ring assembly for plasma etching chambers |
Michael C. Kellogg, Miguel Saldana, Travis R. Taylor |
2014-09-30 |
| 8562785 |
Gas distribution showerhead for inductively coupled plasma etch reactor |
Alex Paterson, Ian Kenworthy |
2013-10-22 |
| 8410393 |
Apparatus and method for temperature control of a semiconductor substrate support |
Anthony J. Ricci, Saurabh Ullal, Matthew Busche |
2013-04-02 |
| 8313635 |
Bare aluminum baffles for resist stripping chambers |
Fred Dennis Egley, Anthony Chen, Jack Kuo, Hong Shih, Duane Outka +1 more |
2012-11-20 |
| 7811409 |
Bare aluminum baffles for resist stripping chambers |
Fred Dennis Egley, Anthony Chen, Jack Kuo, Hong Shih, Duane Outka +1 more |
2010-10-12 |
