Issued Patents All Time
Showing 26–50 of 102 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10715095 | Radiofrequency (RF) filter for multi-frequency RF bias | Maolin Long | 2020-07-14 |
| 10690374 | Air cooled faraday shield and methods for using the same | Saravanapriyan Sriraman, John Drewery, Jon McChesney | 2020-06-23 |
| 10679825 | Systems and methods for applying frequency and match tuning in a non-overlapping manner for processing substrate | Ying Wu, John Drewery, Arthur H. Sato | 2020-06-09 |
| 10672590 | Frequency tuning for a matchless plasma source | Maolin Long, Yuhou Wang, Ying Wu | 2020-06-02 |
| 10658222 | Moveable edge coupling ring for edge process control during semiconductor wafer processing | Haoquan Yan, Robert Griffith O'Neill, Raphael Casaes, Jon McChesney | 2020-05-19 |
| 10649006 | Cathode RF asymmetry detection probe for semiconductor RF plasma processing equipment | Maolin Long | 2020-05-12 |
| 10638593 | Matchless plasma source for semiconductor wafer fabrication | Maolin Long, Yuhou Wang, Ricky Marsh | 2020-04-28 |
| 10600620 | Temperature control in RF chamber with heater and air amplifier | Jon McChesney | 2020-03-24 |
| 10585347 | Photoresist design layout pattern proximity correction through fast edge placement error prediction via a physics-based etch profile modeling framework | Saravanapriyan Sriraman, Richard Wise, Harmeet Singh, Andrew D. Bailey, III, Vahid Vahedi +1 more | 2020-03-10 |
| 10580618 | Multi-level pulsing of DC and RF signals | Juline Shoeb, Ying Wu | 2020-03-03 |
| 10573494 | Multi-level parameter and frequency pulsing with a low angular spread | Juline Shoeb, Ying Wu | 2020-02-25 |
| 10460951 | Gas reaction trajectory control through tunable plasma dissociation for wafer by-product distribution and etch feature profile uniformity | Saravanapriyan Sriraman, Monica Titus | 2019-10-29 |
| 10427307 | Automated replacement of consumable parts using end effectors interfacing with plasma processing system | Damon Tyrone Genetti, Jon McChesney, Derek John Witkowicki, Austin Ngo | 2019-10-01 |
| 10431426 | Gas plenum arrangement for improving etch non-uniformity in transformer-coupled plasma systems | Tom A. Kamp, Arthur H. Sato | 2019-10-01 |
| 10431434 | Powered grid for plasma chamber | Maolin Long, Richard A. Marsh, Ying Wu | 2019-10-01 |
| 10424461 | Controlling ion energy within a plasma chamber | Thorsten Lill, Harmeet Singh, Gowri Kamarthy | 2019-09-24 |
| 10410832 | Control of on-wafer CD uniformity with movable edge ring and gas injection adjustment | Yiting Zhang, Saravanapriyan Sriraman | 2019-09-10 |
| 10395894 | Systems and methods for achieving peak ion energy enhancement with a low angular spread | Juline Shoeb, Ying Wu | 2019-08-27 |
| 10386828 | Methods and apparatuses for etch profile matching by surface kinetic model optimization | Mehmet Derya Tetiker, Saravanapriyan Sriraman, Andrew D. Bailey, III, Juline Shoeb, Richard A. Gottscho | 2019-08-20 |
| 10366865 | Gas distribution system for ceramic showerhead of plasma etch reactor | Michael Kang | 2019-07-30 |
| 10340121 | Plasma processing systems including side coils and methods related to the plasma processing systems | Maolin Long | 2019-07-02 |
| 10332725 | Systems and methods for reversing RF current polarity at one output of a multiple output RF matching network | Arthur H. Sato, Maolin Long | 2019-06-25 |
| 10304717 | Automated replacement of consumable parts using interfacing chambers | Damon Tyrone Genetti, Jon McChesney, Derek John Witkowicki, Austin Ngo | 2019-05-28 |
| 10304660 | Multi-level pulsing of DC and RF signals | Juline Shoeb, Ying Wu | 2019-05-28 |
| 10303830 | Methods and apparatuses for etch profile optimization by reflectance spectra matching and surface kinetic model optimization | Mehmet Derya Tetiker, Saravanapriyan Sriraman, Andrew D. Bailey, III, Richard A. Gottscho | 2019-05-28 |