Issued Patents All Time
Showing 26–49 of 49 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9442063 | Measurement of composition for thin films | Ming Di, Torsten R. Kaack, Qiang Zhao, Xiang Gao | 2016-09-13 |
| 9412673 | Multi-model metrology | In-Kyo Kim, Xin Li, Liequan Lee, Meng Cao, Sungchul Yoo +2 more | 2016-08-09 |
| 9405290 | Model for optical dispersion of high-K dielectrics including defects | Natalia Malkova | 2016-08-02 |
| 9347872 | Meta-model based measurement refinement | Lie-Quan Lee | 2016-05-24 |
| 9311431 | Secondary target design for optical measurements | Sungchul Yoo, Andrei V. Shchegrov, Thaddeus Gerard Dziura, Inkyo Kim, Seunghwan Lee +1 more | 2016-04-12 |
| 9291554 | Method of electromagnetic modeling of finite structures and finite illumination for metrology and inspection | Alexander Kuznetsov, Kevin Peterlinz, Andrei V. Shchegrov, Xuefeng Liu | 2016-03-22 |
| 9239522 | Method of determining an asymmetric property of a structure | Meng-Fu Shih, In-Kyo Kim, Xiafang Zhang | 2016-01-19 |
| 9127927 | Techniques for optimized scatterometry | Jonathan Iloreta, Paul Aoyagi, Hanyou Chu, Jeffrey A. Chard, Peilin Jiang +2 more | 2015-09-08 |
| 9046474 | Multi-analyzer angle spectroscopic ellipsometry | Hidong Kwak, Ward Dixon, Torsten R. Kaack | 2015-06-02 |
| 8930156 | Metrology through use of feed forward feed sideways and measurement cell re-use | Michael Adel, John Fielden, John Ernst Nielsen Madsen, Robert W. Peters | 2015-01-06 |
| 8797534 | Optical system polarizer calibration | Johannes D. de Veer, G. Vera Zhuang, Shankar Krishnan | 2014-08-05 |
| 8711349 | High throughput thin film characterization and defect detection | Xiang Gao, Philip D. Flanner, III, Zhiming Jiang, Jun YE, Torsten R. Kaack +1 more | 2014-04-29 |
| 8577820 | Accurate and fast neural network training for library-based critical dimension (CD) metrology | Wen Jin, Vi Vuong, Junwei Bao, Lie-Quan Lee | 2013-11-05 |
| 8570514 | Optical system polarizer calibration | Johannes D. de Veer, Guorong V. Zhuang, Shankar Krishnan | 2013-10-29 |
| 8045179 | Bright and dark field scatterometry systems for line roughness metrology | Guorong V. Zhuang, Steven Russel Spielman, Daniel Wack, John Fielden | 2011-10-25 |
| 7801713 | Generating a model using global node optimization | Carlos L. Ygartua | 2010-09-21 |
| 7760358 | Film measurement | Paul Aoyagi | 2010-07-20 |
| 7375828 | Modal method modeling of binary gratings with improved eigenvalue computation | Paul Aoyagi | 2008-05-20 |
| 7362686 | Film measurement using reflectance computation | Paul Aoyagi, Philip D. Flanner, III | 2008-04-22 |
| 7345761 | Film measurement | Paul Aoyagi, Philip D. Flanner, III | 2008-03-18 |
| 7321426 | Optical metrology on patterned samples | Carlos L. Ygartua | 2008-01-22 |
| 7190453 | Film measurement | Paul Aoyagi, Philip D. Flanner, III | 2007-03-13 |
| 6649075 | Method and apparatus for measuring etch uniformity of a semiconductor wafer | Melisa Buie, Jennifer Leigh Lewis | 2003-11-18 |
| 6535779 | Apparatus and method for endpoint control and plasma monitoring | Manush Birang, Gregory L. Kolte, Terry Doyle, Nils Johansson, Paul Luscher | 2003-03-18 |