Issued Patents All Time
Showing 25 most recent of 33 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11968772 | Optical etendue matching methods for extreme ultraviolet metrology | Zefram Marks, Larissa Juschkin | 2024-04-23 |
| 11469571 | Fast phase-shift interferometry by laser frequency shift | Haifeng Huang, Rui-fang Shi | 2022-10-11 |
| 11333621 | Methods and systems for semiconductor metrology based on polychromatic soft X-Ray diffraction | Oleg Khodykin, Andrei V. Shchegrov, Alexander Kuznetsov, Nikolay Artemiev, Michael Friedmann | 2022-05-17 |
| 11112691 | Inspection system with non-circular pupil | Damon F. Kvamme, Rui-fang Shi, Sseunhyeun Jo, Xin Ye | 2021-09-07 |
| 10438825 | Spectral reflectometry for in-situ process monitoring and control | Prateek Jain, Kevin Peterlinz, Andrei V. Shchegrov, Shankar Krishnan | 2019-10-08 |
| 9759912 | Particle and chemical control using tunnel flow | Frank Chilese, Gildardo Delgado, John R. Torczynski, Leonard E. Klebanoff | 2017-09-12 |
| 9625810 | Source multiplexing illumination for mask inspection | Daimian Wang, Damon F. Kvamme, Tao-Yi Fu | 2017-04-18 |
| 9544984 | System and method for generation of extreme ultraviolet light | Alexander N. Bykanov, Oleg Khodykin, Konstantin Tsigutkin, Layton Hale, Joseph F. Walsh +3 more | 2017-01-10 |
| 9335637 | Laser-produced plasma EUV source with reduced debris generation utilizing predetermined non-thermal laser ablation | Gildardo Delgado | 2016-05-10 |
| 9295147 | EUV light source using cryogenic droplet targets in mask inspection | Alexander N. Bykanov, Oleg Khodykin | 2016-03-22 |
| 9164388 | Temperature control in EUV reticle inspection tool | Frank Chilese, Douglas Fowler | 2015-10-20 |
| 9151881 | Phase grating for mask inspection system | Daimian Wang, Oleg Khodykin, Li-Ping Wang, Yanwei Liu | 2015-10-06 |
| 8941336 | Optical characterization systems employing compact synchrotron radiation sources | Yanwei Liu | 2015-01-27 |
| 8917432 | Multiplexing EUV sources in reticle inspection | Daimian Wang, Karl R. Umstadter, Ed Ma, Frank Chilese | 2014-12-23 |
| 8842272 | Apparatus for EUV imaging and methods of using same | Damon F. Kvamme, John Rogers, James P. McGuire, John M. Rodgers | 2014-09-23 |
| 8798966 | Measuring critical dimensions of a semiconductor structure | John J. Hench, Edward Ratner, Yaoming SHI, Andrei Veldman | 2014-08-05 |
| 8772731 | Apparatus and method for synchronizing sample stage motion with a time delay integration charge-couple device in a semiconductor inspection tool | Pradeep Subrahmanyan, Michael J. Wright, David Alles | 2014-07-08 |
| 8749179 | Optical characterization systems employing compact synchrotron radiation sources | Yanwei Liu | 2014-06-10 |
| 8045179 | Bright and dark field scatterometry systems for line roughness metrology | Guorong V. Zhuang, Steven Russel Spielman, Leonid Poslavsky, John Fielden | 2011-10-25 |
| 7951672 | Measurement and control of strained devices | Ady Levy, John Fielden | 2011-05-31 |
| 7838309 | Measurement and control of strained devices | Ady Levy, John Fielden | 2010-11-23 |
| 7826071 | Parametric profiling using optical spectroscopic systems | Andrei V. Shchegrov, Anatoly Fabrikant, Mehrdad Nikoonahad, Ady Levy, Noah Bareket +2 more | 2010-11-02 |
| 7826072 | Method for optimizing the configuration of a scatterometry measurement system | Andrei Veldman, Edward Ratner, John J. Hench, Noah Bareket | 2010-11-02 |
| 7821654 | System for scatterometric measurements and applications | Anatoly Fabrikant, Guoheng Zhao, Mehrdad Nikoonahad | 2010-10-26 |
| 7716003 | Model-based measurement of semiconductor device features with feed forward use of data for dimensionality reduction | Andrei Veldman, Edward Ratner, John J. Hench, Noah Bareket | 2010-05-11 |