SM

Sandra G. Malhotra

IN Intermolecular: 85 patents #4 of 248Top 2%
EM Elpida Memory: 27 patents #13 of 692Top 2%
IBM: 25 patents #4,217 of 70,183Top 7%
TL Tokyo Electron Limited: 7 patents #1,084 of 5,567Top 20%
HY Hypernex: 2 patents #5 of 8Top 65%
📍 Fort Collins, CO: #5 of 3,421 inventorsTop 1%
🗺 Colorado: #66 of 40,980 inventorsTop 1%
Overall (All Time): #11,335 of 4,157,543Top 1%
113
Patents All Time

Issued Patents All Time

Showing 101–113 of 113 patents

Patent #TitleCo-InventorsDate
6989321 Low-pressure deposition of metal layers from metal-carbonyl precursors Hideaki Yamasaki, Tsukasa Matsuda, Atsushi Gomi, Tatsuo Hatano, Masahito Sugiura +3 more 2006-01-24
6975032 Copper recess process with application to selective capping and electroless plating Shyng-Tsong Chen, Timothy J. Dalton, Kenneth M. Davis, Chao-Kun Hu, Fen F. Jamin +11 more 2005-12-13
6974531 Method for electroplating on resistive substrates Panayotis Andricacos, Hariklia Deligianni, Wilma Jean Horkans, Keith Kwietniak, Michael Lane +4 more 2005-12-13
6949461 Method for depositing a metal layer on a semiconductor interconnect structure Andrew H. Simon 2005-09-27
6924223 Method of forming a metal layer using an intermittent precursor gas flow process Hideaki Yamasaki, Tsukasa Matsuda, Atsushi Gomi, Tatsuo Hatano, Mitsuhiro Tachibana +6 more 2005-08-02
6909772 Method and apparatus for thin film thickness mapping Krzysztof Kozaczek, David S. Kurtz, Paul R. Moran, Roger Isaac Martin, Patrick W. DeHaven +1 more 2005-06-21
6792075 Method and apparatus for thin film thickness mapping Krzysztof Kozaczek, David S. Kurtz, Paul R. Moran, Roger Isaac Martin, Patrick W. DeHaven +1 more 2004-09-14
6660330 Method for depositing metal films onto substrate surfaces utilizing a chamfered ring support Peter S. Locke, Fenton R. McFeely, Andrew H. Simon, John J. Yurkas 2003-12-09
6395164 Copper seed layer repair technique using electroless touch-up Panayotis Andricacos, James E. Fluegel, John G. Gaudiello, Ronald D. Goldblatt, Milan Paunovic 2002-05-28
6380075 Method for forming an open-bottom liner for a conductor in an electronic structure and device formed Cyril Cabral, Jr., Chao-Kun Hu, Fenton R. McFeely, Stephen M. Rossnagel, Andrew H. Simon 2002-04-30
6358832 Method of forming barrier layers for damascene interconnects Daniel C. Edelstein, Timothy J. Dalton, John G. Gaudiello, Mahadevaiyer Krishnan, Maurice McGlashan-Powell +2 more 2002-03-19
6153935 Dual etch stop/diffusion barrier for damascene interconnects Daniel C. Edelstein, Timothy J. Dalton, John G. Gaudiello, Mahadevaiyer Krishnan, Maurice McGlashan-Powell +2 more 2000-11-28
6090722 Process for fabricating a semiconductor structure having a self-aligned spacer Michael D. Armacost, Tina Wagner, Richard S. Wise 2000-07-18