Issued Patents All Time
Showing 401–425 of 605 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9960252 | Method to improve reliability of replacement gate device | Eduard A. Cartier, Kisik Choi, Vijay Narayanan | 2018-05-01 |
| 9954021 | Solid-state imaging device, method for manufacturing the same, and imaging apparatus | Tetsuji Yamaguchi, Yuko Ohgishi, Harumi Ikeda | 2018-04-24 |
| 9941371 | Selective thickening of pFET dielectric | Hemanth Jagannathan, Barry P. Linder | 2018-04-10 |
| 9941128 | Method of lateral oxidation of NFET and PFET high-k gate stacks | Robert H. Dennard, Martin M. Frank | 2018-04-10 |
| 9911597 | Trench metal insulator metal capacitor with oxygen gettering layer | Eduard A. Cartier, Michael P. Chudzik, Aritra Dasgupta, Herbert L. Ho, Donghun Kang +3 more | 2018-03-06 |
| 9905665 | Replacement metal gate stack for diffusion prevention | Johnathan E. Faltermeier, Su Chen Fan, Sivananda K. Kanakasabapathy, Injo Ok, Tenko Yamashita | 2018-02-27 |
| 9887351 | Multivalent oxide cap for analog switching resistive memory | Marwan H. Khater, Seyoung Kim, Hiroyuki Miyazoe | 2018-02-06 |
| 9870953 | System on chip material co-integration | Lukas Czornomaz, Pouya Hashemi, Alexander Reznicek | 2018-01-16 |
| 9865703 | High-K layer chamfering to prevent oxygen ingress in replacement metal gate (RMG) process | Veeraraghavan S. Basker, Johnathan E. Faltermeier, Hemanth Jagannathan, Tenko Yamashita | 2018-01-09 |
| 9859279 | High-k gate dielectric and metal gate conductor stack for fin-type field effect transistors formed on type III-V semiconductor material and silicon germanium semiconductor material | Martin M. Frank, Pranita Kerber, Vijay Narayanan | 2018-01-02 |
| 9859367 | Stacked strained and strain-relaxed hexagonal nanowires | Pouya Hashemi, John A. Ott, Alexander Reznicek | 2018-01-02 |
| 9844789 | Method of forming lubricative plated layer on viscous liquid feed nozzle and viscous liquid feed nozzle | Shinpei Kakiuchi, Eijiro Furuta | 2017-12-19 |
| 9831084 | Hydroxyl group termination for nucleation of a dielectric metallic oxide | Michael P. Chudzik, Min Dai, Martin M. Frank, David F. Hilscher, Rishikesh Krishnan +3 more | 2017-11-28 |
| 9824930 | Method of patterning dopant films in high-k dielectrics in a soft mask integration scheme | Hemanth Jagannathan, Balaji Kannan, Siddarth A. Krishnan, Unoh Kwon, Rekha Rajaram | 2017-11-21 |
| 9825122 | Multiple work function device using GeOx/TiN cap on work function setting metal | Pouya Hashemi, Choonghyun Lee | 2017-11-21 |
| 9793397 | Ferroelectric gate dielectric with scaled interfacial layer for steep sub-threshold slope field-effect transistor | Martin M. Frank, Vijay Narayanan | 2017-10-17 |
| 9761661 | Stacked strained and strain-relaxed hexagonal nanowires | Pouya Hashemi, John A. Ott, Alexander Reznicek | 2017-09-12 |
| 9761655 | Stacked planar capacitors with scaled EOT | Lawrence A. Clevenger, Hemanth Jagannathan, Roger A. Quon | 2017-09-12 |
| 9748348 | Fully-depleted SOI MOSFET with U-shaped channel | Robert H. Dennard, Isaac Lauer, Ramachandran Muralidhar | 2017-08-29 |
| 9748145 | Semiconductor devices with varying threshold voltage and fabrication methods thereof | Balaji Kannan, Unoh Kwon, Siddarth A. Krishnan, Vijay Narayanan | 2017-08-29 |
| 9735192 | Solid state imaging device for reducing dark current and imaging apparatus | Itaru Oshiyama, Susumu Hiyama, Tetsuji Yamaguchi, Yuko Ohgishi, Harumi Ikeda | 2017-08-15 |
| 9735111 | Dual metal-insulator-semiconductor contact structure and formulation method | Hiroaki Niimi, Tenko Yamashita | 2017-08-15 |
| 9735250 | Stable work function for narrow-pitch devices | Mohit Bajaj, Terence B. Hook, Rajan K. Pandey, Rajesh Sathiyanarayanan | 2017-08-15 |
| 9721842 | Method of patterning dopant films in high-k dielectrics in a soft mask integration scheme | Hemanth Jagannathan, Balaji Kannan, Siddarth A. Krishnan, Unoh Kwon, Rekha Rajaram | 2017-08-01 |
| 9707957 | Hybrid vehicle | Yu Shimizu, Takeshi Kishimoto, Masaya Amano | 2017-07-18 |