Issued Patents All Time
Showing 1–25 of 33 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11998651 | Skin preparation applicator | Manish Kumar, Karthik M R, Prasad Govindaraj, Shishir Kumar Prasad, Kevin M. Ryan | 2024-06-04 |
| 11910363 | Resource sharing during communication pause | Sanjay Kumar, Bapineedu Chowdary Gummadi, Vivek Padi, Arun Ashok Tagare | 2024-02-20 |
| 11832336 | CDRX and IDRX collisions | Surbhi Agarwal, Avinash Dubey | 2023-11-28 |
| 11546396 | Prioritization of frames associated with recovery for video streaming session | Naresh Gundu, Shankar Ganesh Lakshmanaswamy, Avinash Dubey | 2023-01-03 |
| 10911998 | Scan optimization in enhancement machine type communication devices | Bapineedu Chowdary Gummadi, Manikantha Desetty | 2021-02-02 |
| 10741668 | Short channel and long channel devices | Bala Haran, Ruilong Xie, Katsunori Onishi, Vimal Kamineni | 2020-08-11 |
| 10727133 | Method of forming gate structure with undercut region and resulting device | Qun Gao, Shesh Mani Pandey, Haiting Wang | 2020-07-28 |
| 10658363 | Cut inside replacement metal gate trench to mitigate N-P proximity effect | Ayse M. Ozbek, Tao Chu, Bala Haran, Vishal Chhabra, Katsunori Onishi +1 more | 2020-05-19 |
| 10531367 | Techniques and apparatuses for handling extended access barring | Bapineedu Chowdary Gummadi, Venkata A Naidu BABBADI | 2020-01-07 |
| 10446550 | Cut inside replacement metal gate trench to mitigate N-P proximity effect | Ayse M. Ozbek, Tao Chu, Bala Haran, Vishal Chhabra, Katsunori Onishi +1 more | 2019-10-15 |
| 10395993 | Methods and structure to form high K metal gate stack with single work-function metal | Takashi Ando, Siddarth A. Krishnan, Unoh Kwon, Shahab Siddiqui | 2019-08-27 |
| 10332747 | Selective titanium nitride deposition using oxides of lanthanum masks | Koji Watanabe, Meng Zhu, Brian Alexander Cohen, Matthew T. Whitman | 2019-06-25 |
| 10170373 | Methods for making robust replacement metal gates and multi-threshold devices in a soft mask integration scheme | Rekha Rajaram, Unoh Kwon | 2019-01-01 |
| 10062618 | Method and structure for formation of replacement metal gate field effect transistors | Takashi Ando, Aritra Dasgupta, Unoh Kwon | 2018-08-28 |
| 10020202 | Fabrication of multi threshold-voltage devices | Donghun Kang, Jinping Liu | 2018-07-10 |
| 9997361 | Gate stack formed with interrupted deposition processes and laser annealing | Takashi Ando, Aritra Dasgupta, Oleg Gluschenkov, Unoh Kwon | 2018-06-12 |
| 9997610 | Gate stack formed with interrupted deposition processes and laser annealing | Takashi Ando, Aritra Dasgupta, Oleg Gluschenkov, Unoh Kwon | 2018-06-12 |
| 9824930 | Method of patterning dopant films in high-k dielectrics in a soft mask integration scheme | Takashi Ando, Hemanth Jagannathan, Siddarth A. Krishnan, Unoh Kwon, Rekha Rajaram | 2017-11-21 |
| 9754015 | Feature rich view of an entity subgraph | Aamod Sane, Zhiwei Gu, Michael J. Welch | 2017-09-05 |
| 9748145 | Semiconductor devices with varying threshold voltage and fabrication methods thereof | Unoh Kwon, Siddarth A. Krishnan, Takashi Ando, Vijay Narayanan | 2017-08-29 |
| 9741720 | Higher ‘K’ gate dielectric cap for replacement metal gate (RMG) FINFET devices | Shahab Siddiqui, Siddarth A. Krishnan | 2017-08-22 |
| 9721842 | Method of patterning dopant films in high-k dielectrics in a soft mask integration scheme | Takashi Ando, Hemanth Jagannathan, Siddarth A. Krishnan, Unoh Kwon, Rekha Rajaram | 2017-08-01 |
| 9691662 | Field effect transistors having multiple effective work functions | Takashi Ando, Min Dai, Siddarth A. Krishnan, Unoh Kwon | 2017-06-27 |
| 9613870 | Gate stack formed with interrupted deposition processes and laser annealing | Takashi Ando, Aritra Dasgupta, Oleg Gluschenkov, Unoh Kwon | 2017-04-04 |
| 9613866 | Gate stack formed with interrupted deposition processes and laser annealing | Takashi Ando, Aritra Dasgupta, Oleg Gluschenkov, Unoh Kwon | 2017-04-04 |