BH

Bala Haran

Globalfoundries: 6 patents #578 of 4,424Top 15%
IBM: 4 patents #21,733 of 70,183Top 35%
EH Elisha Holding: 1 patents #10 of 22Top 50%
GU Globalfoundries U.S.: 1 patents #344 of 665Top 55%
Overall (All Time): #453,248 of 4,157,543Top 15%
11
Patents All Time

Issued Patents All Time

Showing 1–11 of 11 patents

Patent #TitleCo-InventorsDate
10991689 Additional spacer for self-aligned contact for only high voltage FinFETs Abu Naser Zainuddin, Christopher D. Sheraw, Sangameshwar Rao Saudari, Wei Ma, Kai Zhao 2021-04-27
10741668 Short channel and long channel devices Ruilong Xie, Balaji Kannan, Katsunori Onishi, Vimal Kamineni 2020-08-11
10658363 Cut inside replacement metal gate trench to mitigate N-P proximity effect Balaji Kannan, Ayse M. Ozbek, Tao Chu, Vishal Chhabra, Katsunori Onishi +1 more 2020-05-19
10566328 Integrated circuit products with gate structures positioned above elevated isolation structures Christopher D. Sheraw, Mahender Kumar 2020-02-18
10461173 Methods, apparatus, and manufacturing system for forming source and drain regions in a vertical field effect transistor Ajey Poovannummoottil Jacob, Xuan Anh Tran, Hui Zang, Suryanarayana Kalaga 2019-10-29
10446550 Cut inside replacement metal gate trench to mitigate N-P proximity effect Balaji Kannan, Ayse M. Ozbek, Tao Chu, Vishal Chhabra, Katsunori Onishi +1 more 2019-10-15
9269611 Integrated circuits having gate cap protection and methods of forming the same Daniel T. Pham, Xiuyu Cai, Charan V. Surisetty, Jin-Wook Lee, Shom Ponoth +1 more 2016-02-23
8691687 Superfilled metal contact vias for semiconductor devices James J. Kelly, Veeraghavan S. Basker, Soon-Cheon Seo, Tuan A. Vo 2014-04-08
8673699 Semiconductor structure having NFET extension last implants Thomas N. Adam, Kangguo Cheng, Bruce B. Doris, Pranita Kulkarni, Amlan Majumdar +1 more 2014-03-18
8546203 Semiconductor structure having NFET extension last implants Kangguo Cheng, Bruce B. Doris, Pranita Kulkarni, Nicolas Loubet, Amlan Majumdar +1 more 2013-10-01
6753039 Electrolytic and electroless process for treating metallic surfaces and products formed thereby Robert L. Heimann, Branko N. Popov, Dragan Slavkov 2004-06-22