Issued Patents All Time
Showing 51–75 of 75 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6232222 | Method of eliminating a critical mask using a blockout mask and a resulting semiconductor structure | Michael D. Armacost, Jeffrey P. Gambino, Jeremy K. Stephens | 2001-05-15 |
| 6208008 | Integrated circuits having reduced stress in metallization | Kenneth C. Arndt, David M. Dobuzinsky, Laertis Economikos, Jeffrey P. Gambino, Peter D. Hoh +1 more | 2001-03-27 |
| 6177344 | BPSG reflow method to reduce thermal budget for next generation device including heating in a steam ambient | Li-Qun Xia, Maria Galiano, Ellie Yieh | 2001-01-23 |
| 6159870 | Borophosphosilicate glass incorporated with fluorine for low thermal budget gap fill | Ashima B. Chakravarti, Frank V. Liucci, Darryl D. Restaino | 2000-12-12 |
| 6114736 | Controlled dopant diffusion and metal contamination in thin polycide gate conductor of MOSFET device | Karanam Balasubramanyam, Stephen Bruce Brodsky, Badih El-Kareh | 2000-09-05 |
| 6077786 | Methods and apparatus for filling high aspect ratio structures with silicate glass | Ashima B. Chakravarti, Donna R. Cote, Frank V. Liucci, Son V. Nguyen | 2000-06-20 |
| 6049131 | Device formed by selective deposition of refractory metal of less than 300 Angstroms of thickness | Stephen Bruce Brodsky, Seshadri Subbanna | 2000-04-11 |
| 6030881 | High throughput chemical vapor deposition process capable of filling high aspect ratio structures | George D. Papasouliotis, Ashima B. Chakravarti, Laertis Economikos, Patrick A. Van Cleemput | 2000-02-29 |
| 5939335 | Method for reducing stress in the metallization of an integrated circuit | Kenneth C. Arndt, David M. Dobuzinsky, Laertis Economikos, Jeffrey P. Gambino, Peter D. Hoh +1 more | 1999-08-17 |
| 5923999 | Method of controlling dopant diffusion and metal contamination in thin polycide gate conductor of mosfet device | Karanam Balasubramanyam, Stephen Bruce Brodsky, Badih El-Kareh | 1999-07-13 |
| 5807788 | Method for selective deposition of refractory metal and device formed thereby | Stephen Bruce Brodsky, Seshadri Subbanna | 1998-09-15 |
| 5728222 | Apparatus for chemical vapor deposition of aluminum oxide | Steven G. Barbee, Alexander Kostenko, Narayana V. Sarma, Donald L. Wilson, Justin W. Wong +1 more | 1998-03-17 |
| 5665608 | Method of aluminum oxide low pressure chemical vapor deposition (LPCVD) system-fourier transform infrared (FTIR) source chemical control | Jonathan D. Chapple-Sokol, James A. O'Neill, Narayana V. Sarma, Donald L. Wilson, Justin W. Wong | 1997-09-09 |
| 5648113 | Aluminum oxide LPCVD system | Steven G. Barbee, Jonathan D. Chapple-Sokol, Richard Hsiao, James A. O'Neill, Narayana V. Sarma +3 more | 1997-07-15 |
| 5614247 | Apparatus for chemical vapor deposition of aluminum oxide | Steven G. Barbee, Alexander Kostenko, Narayana V. Sarma, Donald L. Wilson, Justin W. Wong +1 more | 1997-03-25 |
| 5603988 | Method for depositing a titanium or tantalum nitride or nitride silicide | Michael J. Shapiro, Ravi Kanjolia, Ben C. Hui, Paul F. Seidler, Karen L. Holloway +1 more | 1997-02-18 |
| 5540777 | Aluminum oxide LPCVD system | Steven G. Barbee, Jonathan D. Chapple-Sokol, Richard Hsiao, James A. O'Neill, Narayana V. Sarma +3 more | 1996-07-30 |
| 5534066 | Fluid delivery apparatus having an infrared feedline sensor | James A. O'Neill, Michael L. Passow, Tina J. Cotler, Jonathan D. Chapple-Sokol, Jyothi Singh | 1996-07-09 |
| 5492718 | Fluid delivery apparatus and method having an infrared feedline sensor | James A. O'Neill, Michael L. Passow, Tina J. Cotler, Jonathan D. Chapple-Sokol, Jyothi Singh | 1996-02-20 |
| 5431734 | Aluminum oxide low pressure chemical vapor deposition (LPCVD) system-fourier transform infrared (FTIR) source chemical control | Jonathan D. Chapple-Sokol, James A. O'Neill, Narayana V. Sarma, Donald L. Wilson, Justin W. Wong | 1995-07-11 |
| 5425810 | Removable gas injectors for use in chemical vapor deposition of aluminium oxide | David E. Kotecki, Donald L. Wilson, Justin W. Wong, Steven P. Zuhoski | 1995-06-20 |
| 5383088 | Storage capacitor with a conducting oxide electrode for metal-oxide dielectrics | Jonathan D. Chapple-Sokol, Jeffrey P. Gambino | 1995-01-17 |
| 5328868 | Method of forming metal connections | Kenneth L. DeVries, James F. White | 1994-07-12 |
| 5268069 | Safe method for etching silicon dioxide | Jonathan D. Chapple-Sokol, David E. Kotecki, Andrew H. Simon, Manu J. Tejwani | 1993-12-07 |
| 5134963 | LPCVD reactor for high efficiency, high uniformity deposition | Steven G. Barbee, Jonathan D. Chapple-Sokol, David E. Kotecki | 1992-08-04 |