Issued Patents All Time
Showing 1–16 of 16 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12286449 | Metal complexes containing cyclopentadienyl ligands | Ming Fang, Joby Eldo, Charles Dezelah, Daniel Moser | 2025-04-29 |
| 11312730 | Metal complexes containing cyclopentadienyl ligands | Ming Fang, Joby Eldo, Charles Dezelah, Daniel Moser | 2022-04-26 |
| 10723749 | Metal complexes containing allyl ligands | Bin Xi, Joby Eldo, Charles Dezelah, Guo Liu | 2020-07-28 |
| 10364492 | Film deposition using precursors containing amidoimine ligands | Jeffrey W. Anthis, David Thompson, Shaun Garrett | 2019-07-30 |
| 10221481 | Metal complexes containing amidoimine ligands | Shaun Garratt, David Thompson, Jeffrey W. Anthis | 2019-03-05 |
| 10155783 | Manganese complexes and use thereof for preparing thin films | Shaun Garratt | 2018-12-18 |
| 9297071 | Solid precursor delivery assemblies and related methods | Chris Platts, Nam Nguyen, Mark R. Wilkinson | 2016-03-29 |
| 9175023 | Molybdenum allyl complexes and use thereof in thin film deposition | Rajesh Odedra, Shaun Garratt, Mark Saly | 2015-11-03 |
| 9028917 | High molecular weight alkyl-allyl cobalttricarbonyl complexes and use thereof for preparing dielectric thin films | Rajesh Odedra, Neil Boag, Jeff Anthis | 2015-05-12 |
| 8927748 | Alkyl-substituted allyl carbonyl metal complexes and use thereof for preparing dielectric thin films | Rajesh Odedra, Neil Boag, Jeff Anthis, Mark Saly | 2015-01-06 |
| 8481121 | Methods of forming thin metal-containing films by chemical phase deposition | Rajesh Odedra, Neil Boag, David W. Weyburne | 2013-07-09 |
| 8476467 | Organometallic precursors for use in chemical phase deposition processes | Rajesh Odedra, Neil Boag | 2013-07-02 |
| 8272626 | Bubbler for the transportation of substances by a carrier gas | Hugh Cunning, Graham Williams, Rajesh Odedra | 2012-09-25 |
| 5603988 | Method for depositing a titanium or tantalum nitride or nitride silicide | Michael J. Shapiro, Ben C. Hui, Paul F. Seidler, Karen L. Holloway, Richard A. Conti +1 more | 1997-02-18 |
| 5120676 | Use of phosphine and arsine compounds in chemical vapor deposition and chemical doping | Andreas A. Melas, Ben C. Hui | 1992-06-09 |
| 4999223 | Chemical vapor deposition and chemicals with diarsines and polyarsines | Benjamin C. Hui | 1991-03-12 |