Issued Patents All Time
Showing 51–75 of 111 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9177868 | Annealing oxide gate dielectric layers for replacement metal gate field effect transistors | Unoh Kwon, Wing L. Lai, Vijay Narayanan, Shahab Siddiqui | 2015-11-03 |
| 9099393 | Enabling enhanced reliability and mobility for replacement gate planar and FinFET structures | Takashi Ando, Eduard A. Cartier, Kisik Choi, Wing L. Lai, Vijay Narayanan | 2015-08-04 |
| 9082851 | FinFET having suppressed leakage current | Henry K. Utomo, Reinaldo Vega | 2015-07-14 |
| 9059134 | Self-aligned contacts for high k/metal gate process flow | Ramachandra Divakaruni, Ying Li | 2015-06-16 |
| 9059290 | FinFET device formation | Emre Alptekin, Viraj Y. Sardesai, Reinaldo Vega | 2015-06-16 |
| 9029913 | Silicon-germanium fins and silicon fins on a bulk substrate | Henry K. Utomo, Kangguo Cheng, Ramachandra Divakaruni, Myung-Hee Na, Huiling Shang | 2015-05-12 |
| 8933528 | Semiconductor fin isolation by a well trapping fin portion | Henry K. Utomo, Kangguo Cheng, Ramachandra Divakaruni, Huiling Shang, Reinaldo Vega | 2015-01-13 |
| 8928057 | Uniform finFET gate height | William J. Cote, Johnathan E. Faltermeier, Babar A. Khan, Theodorus E. Standaert, Xinhui Wang | 2015-01-06 |
| 8928086 | Strained finFET with an electrically isolated channel | Henry K. Utomo, Kangguo Cheng, Ramachandra Divakaruni, Dechao Guo, Myung-Hee Na +2 more | 2015-01-06 |
| 8912607 | Replacement metal gate structures providing independent control on work function and gate leakage current | Unoh Kwon, Ramachandra Divakaruni, Siddarth A. Krishnan | 2014-12-16 |
| 8829617 | Uniform finFET gate height | Balasubramanian S. Haran, Sanjay C. Mehta, Shom Ponoth, Stefan Schmitz, Theodorus E. Standaert | 2014-09-09 |
| 8815693 | FinFET device formation | Emre Alptekin, Viraj Y. Sardesai, Reinaldo Vega | 2014-08-26 |
| 8642424 | Replacement metal gate structure and methods of manufacture | Sameer H. Jain, Jeffrey B. Johnson, Ying Li, Hasan M. Nayfeh | 2014-02-04 |
| 8629014 | Replacement metal gate structures for effective work function control | Unoh Kwon, Michael P. Chudzik | 2014-01-14 |
| 8536656 | Self-aligned contacts for high k/metal gate process flow | Ramachandra Divakaruni, Ying Li | 2013-09-17 |
| 8450169 | Replacement metal gate structures providing independent control on work function and gate leakage current | Unoh Kwon, Ramachandra Divakaruni, Siddarth A. Krishnan | 2013-05-28 |
| 8436427 | Dual metal and dual dielectric integration for metal high-K FETs | Michael P. Chudzik, Wiliam K. Henson, Rashmi Jha, Yue Liang, Richard S. Wise | 2013-05-07 |
| 8426300 | Self-aligned contact for replacement gate devices | Ying Li, Richard S. Wise | 2013-04-23 |
| 8420491 | Structure and method for replacement metal gate field effect transistors | Henry K. Utomo, Unoh Kwon, Dimitri Anastassios Levedakis, Viraj Y. Sardesai, Rajasekhar Venigalla | 2013-04-16 |
| 8236637 | Planar silicide semiconductor structure | Henry K. Utomo, Sameer H. Jain, Cung D. Tran | 2012-08-07 |
| 8193099 | Protecting exposed metal gate structures from etching processes in integrated circuit manufacturing | Mukesh V. Khare, Renee T. Mo, Richard S. Wise, Hongwen Yan | 2012-06-05 |
| 7943457 | Dual metal and dual dielectric integration for metal high-k FETs | Michael P. Chudzik, Wiliam K. Henson, Rashmi Jha, Yue Liang, Richard S. Wise | 2011-05-17 |
| 7838908 | Semiconductor device having dual metal gates and method of manufacture | Unoh Kwon, Siddarth A. Krishnan, Takashi Ando, Michael P. Chudzik, Martin M. Frank +5 more | 2010-11-23 |
| 7691701 | Method of forming gate stack and structure thereof | Michael P. Belyansky, Siddarth A. Krishnan, Unoh Kwon, Naim Moumen, James K. Schaeffer +3 more | 2010-04-06 |
| 7670901 | Method of fabricating a bottle trench and a bottle trench capacitor | Oh-Jung Kwon, Kenneth T. Settlemyer, Jr., Min Soo Kim | 2010-03-02 |