Issued Patents All Time
Showing 76–100 of 111 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7528027 | Structure and method for manufacturing device with ultra thin SOI at the tip of a V-shape channel | Huilong Zhu, Mahender Kumar, Dan M. Mocuta, Wenjuan Zhu | 2009-05-05 |
| 7498271 | Nitrogen based plasma process for metal gate MOS device | Ricardo A. Donaton, Rashmi Jha, Siddarth A. Krishnan, Xi Li, Renee T. Mo +3 more | 2009-03-03 |
| 7485510 | Field effect device including inverted V shaped channel region and method for fabrication thereof | Huilong Zhu, Effendi Leobandung, Mahender Kumar, Wenjuan Zhu, Christine Norris | 2009-02-03 |
| 7387930 | Method of fabricating a bottle trench and a bottle trench capacitor | Oh-Jung Kwon, Kenneth T. Settlemyer, Jr., Min Soo Kim | 2008-06-17 |
| 7358130 | Method for monitoring lateral encroachment of spacer process on a CD SEM | Bachir Dirahoui, Renee T. Mo, Eric P. Solecky | 2008-04-15 |
| 7335969 | Method of monitoring introduction of interfacial species | Lance Genicola, Mark J. Hurley, Jeremy J. Kempisty, Paul Kirsch, Suri Hedge | 2008-02-26 |
| 7270130 | Semiconductor device cleaning employing heterogeneous nucleation for controlled cavitation | David L. Rath | 2007-09-18 |
| 7202187 | Method of forming sidewall spacer using dual-frequency plasma enhanced CVD | James T. Kelliher, Shreesh Narasimha, Jeffrey W. Sleight | 2007-04-10 |
| 7122439 | Method of fabricating a bottle trench and a bottle trench capacitor | Oh-Jung Kwon, Kenneth T. Settlemyer, Jr., Min Soo Kim | 2006-10-17 |
| 7122437 | Deep trench capacitor with buried plate electrode and isolation collar | Thomas W. Dyer, Chun-Yung Sung, Ramachandra Divakaruni, Carl Radens | 2006-10-17 |
| 7105398 | Method for monitoring lateral encroachment of spacer process on a CD SEM | Bachir Dirahoui, Renee T. Mo, Eric P. Solecky | 2006-09-12 |
| 6933192 | Method for fabricating a trench having a buried dielectric collar | Ramachandra Divakaruni, Chun-Yung Sung | 2005-08-23 |
| 6929964 | Method of monitoring introduction on interfacial species | Lance Genicola, Mark J. Hurley, Jeremy J. Kempisty, Paul Kirsch, Suri Hedge | 2005-08-16 |
| 6908806 | Gate metal recess for oxidation protection and parasitic capacitance reduction | Haining Yang, Ramachandra Divakaruni, Oleg Gluschenkov, Rajeev Malik, Hongwen Yan | 2005-06-21 |
| 6887761 | Vertical semiconductor devices | Hiroyuki Akatsu, Thomas W. Dyer, Kenneth T. Settlemyer, Jr. | 2005-05-03 |
| 6858441 | MRAM MTJ stack to conductive line alignment method | Joachim Nuetzel, Xian Jay Ning, Kia-Seng Low, Gill Yong Lee, Rajiv Ranade | 2005-02-22 |
| 6849153 | Removal of post-rie polymer on A1/CU metal line | Wesley C. Natzle, Martin Gutsche, Hiroyuki Akatsu, Chien-Yi Yu | 2005-02-01 |
| 6740568 | Method to enhance epitaxial regrowth in amorphous silicon contacts | Yun-Yu Wang, Johnathan E. Faltermeier, Colleen Snavely, Michael Maldei, Michael Iwatake +4 more | 2004-05-25 |
| 6723611 | Vertical hard mask | Hiroyuki Akatsu, Oleg Gluschenkov, Porshia S. Parkinson, Helmut Tews, Kenneth T. Settlemyer, Jr. | 2004-04-20 |
| 6716734 | Low temperature sidewall oxidation of W/WN/poly-gatestack | Mihel Seitz | 2004-04-06 |
| 6630074 | Etching composition and use thereof | David L. Rath | 2003-10-07 |
| 6579766 | Dual gate oxide process without critical resist and without N2 implant | Helmut Tews, Kilho Lee | 2003-06-17 |
| 6569769 | Slurry-less chemical-mechanical polishing | Laertis Economikos, Alexander William Simpson | 2003-05-27 |
| 6443811 | Ceria slurry solution for improved defect control of silicon dioxide chemical-mechanical polishing | Haruki Nojo, Sumit Pandey, Jeremy Stephens | 2002-09-03 |
| 6358850 | Slurry-less chemical-mechanical polishing of oxide materials | Laertis Economikos, Sumit Pandey, Ronald J. Schutz | 2002-03-19 |