Issued Patents All Time
Showing 1–18 of 18 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7105404 | Method for fabricating a semiconductor structure | Stephan Wege | 2006-09-12 |
| 7034352 | DRAM with very shallow trench isolation | Venkatachalam C. Jaiprakash | 2006-04-25 |
| 6960514 | Pitcher-shaped active area for field effect transistor and method of forming same | Jochen Beintner, Rama Divakaruni, Johnathan E. Faltermeier, Philip L. Flaitz, Oleg Gluschenkov +5 more | 2005-11-01 |
| 6849496 | DRAM with vertical transistor and trench capacitor memory cells and method of fabrication | Venkatachalam C. Jaiprakash, Norbert Arnold | 2005-02-01 |
| 6812092 | Method for fabricating transistors having damascene formed gate contacts and self-aligned borderless bit line contacts | Michael Wise, Christian Dubuc | 2004-11-02 |
| 6794282 | Three layer aluminum deposition process for high aspect ratio CL contacts | Thomas Goebel, Werner Robl, Rajeev Malik | 2004-09-21 |
| 6759292 | Method for fabricating a trench capacitor | Michael P. Chudzik, Jack A. Mandelman | 2004-07-06 |
| 6746933 | Pitcher-shaped active area for field effect transistor and method of forming same | Jochen Beintner, Rama Divakaruni, Johnathan E. Faltermeier, Philip L. Flaitz, Oleg Gluschenkov +5 more | 2004-06-08 |
| 6724054 | Self-aligned contact formation using double SiN spacers | Woo-Tag Kang, Rajeev Malik | 2004-04-20 |
| 6716734 | Low temperature sidewall oxidation of W/WN/poly-gatestack | Ravikumar Ramachandran | 2004-04-06 |
| 6706634 | Control of separation between transfer gate and storage node in vertical DRAM | Andreas Knorr, Irene McStay | 2004-03-16 |
| 6667223 | High aspect ratio high density plasma (HDP) oxide gapfill method in a lines and space pattern | — | 2003-12-23 |
| 6621112 | DRAM with vertical transistor and trench capacitor memory cells and methods of fabrication | Venkatachalam C. Jaiprakash, Norbert Arnold | 2003-09-16 |
| 6531377 | Method for high aspect ratio gap fill using sequential HDP-CVD | Andreas Knorr | 2003-03-11 |
| 6509226 | Process for protecting array top oxide | Venkatachalam C. Jaiprakash, Jack A. Mandelman, Ramachandra Divakaruni, Rajeev Malik | 2003-01-21 |
| 6383691 | Photomask and method for increasing image aspect ratio while relaxing mask fabrication requirements | Gerhard Kunkel | 2002-05-07 |
| 6319840 | For mol integration | Gregory Costrini | 2001-11-20 |
| 6294423 | Method for forming and filling isolation trenches | Rajeev Malik, Andreas Knorr | 2001-09-25 |