Issued Patents All Time
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6905944 | Sacrificial collar method for improved deep trench processing | Michael P. Chudzik, Helmut Tews, Porshia Wrschka | 2005-06-14 |
| 6709947 | Method of area enhancement in capacitor plates | Porshia Wrschka | 2004-03-23 |
| 6706634 | Control of separation between transfer gate and storage node in vertical DRAM | Mihel Seitz, Andreas Knorr | 2004-03-16 |
| 6620724 | Low resistivity deep trench fill for DRAM and EDRAM applications | Uwe Schroeder, Helmut Tews, Manfred Hauf, Matthias Goldbach, Bernhard Sell +5 more | 2003-09-16 |
| 6613642 | Method for surface roughness enhancement in semiconductor capacitor manufacturing | Stephen Rahn, Helmut Tews, Uwe Schroeder, Stephan Kudelka, Rajarao Jammy | 2003-09-02 |
| 6576565 | RTCVD process and reactor for improved conformality and step-coverage | Ashima B. Chakravarti, Oleg Gluschenkov | 2003-06-10 |
| 6559002 | Rough oxide hard mask for DT surface area enhancement for DT DRAM | Stephan Kudelka, Helmut Tews, Stephen Rahn, Uwe Schroeder | 2003-05-06 |
| 6555430 | Process flow for capacitance enhancement in a DRAM trench | Michael P. Chudzik, Johnathan E. Faltermeier, Rajarao Jammy, Stephan Kudelka, Kenneth T. Settlemyer, Jr. +1 more | 2003-04-29 |
| 6544855 | Process flow for sacrificial collar with polysilicon void | Helmut Tews, Rolf Weis | 2003-04-08 |
| 6528383 | Simultaneous formation of deep trench capacitor and resistor | Satya N. Chakravarti, Ashima B. Chakravarti, Kwong Hon Wong | 2003-03-04 |
| 6498061 | Negative ion implant mask formation for self-aligned, sublithographic resolution patterning for single-sided vertical device formation | Rama Divakaruni, Stephan Kudelka, Helmut Tews, Kil-Ho Lee, Uwe Schroeder | 2002-12-24 |
| 6458647 | Process flow for sacrificial collar with poly mask | Helmut Tews, Stephan Kudelka | 2002-10-01 |
| 6444516 | Semi-insulating diffusion barrier for low-resistivity gate conductors | Lawrence A. Clevenger, Jack A. Mandelman, Rajarao Jammy, Oleg Gluschenkov, Kwong Hon Wong +1 more | 2002-09-03 |
| 6309924 | Method of forming self-limiting polysilicon LOCOS for DRAM cell | Ramachandra Divakaruni, Jack A. Mandelman, Larry Nesbit, Carl Radens, Helmut Tews | 2001-10-30 |