Issued Patents All Time
Showing 126–150 of 255 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9040373 | Silicon device on SI:C-OI and SGOI and method of manufacture | Dureseti Chidambarrao, Omer H. Dokumaci | 2015-05-26 |
| 8963567 | Pressure sensing and control for semiconductor wafer probing | Robert D. Edwards, Louis V. Medina, Tso-Hui Ting, Ping-Chuan Wang, Yongchun Xin | 2015-02-24 |
| 8759152 | Configurable interposer | Yunsheng Song, Tso-Hui Ting, Ping-Chuan Wang | 2014-06-24 |
| 8679938 | Shallow trench isolation for device including deep trench capacitors | Sunfei Fang, Byeong Y. Kim, Rishikesh Krishnan, Daewon Yang | 2014-03-25 |
| 8643061 | Structure of high-K metal gate semiconductor transistor | Haizhou Yin, Dae-Gyu Park, Zhijiong Luo, Dominic J. Schepis, Jun Yuan | 2014-02-04 |
| 8642434 | Structure and method for mobility enhanced MOSFETS with unalloyed silicide | Yaocheng Liu, Dureseti Chidambarrao, Judson R. Holt, Renee T. Mo, Kern Rim | 2014-02-04 |
| 8633071 | Silicon device on Si: C-oi and Sgoi and method of manufacture | Duresti Chidambarrao, Omer H. Dokumaci | 2014-01-21 |
| 8557652 | Application of cluster beam implantation for fabricating threshold voltage adjusted FETs | Dae-Gyu Park, Haizhou Yin | 2013-10-15 |
| 8507346 | Method of forming a semiconductor device having a cut-way hole to expose a portion of a hardmask layer | Martin Burkhardt, Matthew E. Colburn, Allen H. Gabor, Scott D. Halle, Howard S. Landis +1 more | 2013-08-13 |
| 8492848 | Application of cluster beam implantation for fabricating threshold voltage adjusted FETs | Dae-Gyu Park, Haizhou Yin | 2013-07-23 |
| 8455322 | Silicon germanium heterojunction bipolar transistor structure and method | Rajendran Krishnasamy, Kathryn T. Schonenberg | 2013-06-04 |
| 8288222 | Application of cluster beam implantation for fabricating threshold voltage adjusted FETs | Dae-Gyu Park, Haizhou Yin | 2012-10-16 |
| 8237278 | Configurable interposer | Yunsheng Song, Tso-Hui Ting, Ping-Chuan Wang | 2012-08-07 |
| 8232153 | Silicon device on Si:C-OI and SGOI and method of manufacture | Dureseti Chidambarrao, Omer H. Dokumaci | 2012-07-31 |
| 8227316 | Method for manufacturing double gate finFET with asymmetric halo | Huilong Zhu, Jing Wang | 2012-07-24 |
| 8217423 | Structure and method for mobility enhanced MOSFETs with unalloyed silicide | Yaocheng Liu, Dureseti Chidambarrao, Judson R. Holt, Renee T. Mo, Kern Rim | 2012-07-10 |
| 8159247 | Yield enhancement for stacked chips through rotationally-connecting-interposer | Muthukumarasamy Karthikeyan, Yunsheng Song, Tso-Hui Ting, Richard P. Volant, Ping-Chuan Wang | 2012-04-17 |
| 8119472 | Silicon device on Si:C SOI and SiGe and method of manufacture | Dureseti Chidambarrao, Omer H. Dokumaci | 2012-02-21 |
| 8111903 | Inline low-damage automated failure analysis | Steven B. Herschbein, Ronald C. Geiger, Jr., George Y. Gu, Xu Ouyang | 2012-02-07 |
| 8095230 | Method for optimizing the routing of wafers/lots based on yield | Xu Ouyang, Yunsheng Song, Keith Kwong Hon Wong | 2012-01-10 |
| 8067805 | Ultra shallow junction formation by epitaxial interface limited diffusion | Huajie Chen, Omer H. Dokumaci, Werner Rausch | 2011-11-29 |
| 8013392 | High mobility CMOS circuits | Bruce B. Doris, Huilong Zhu | 2011-09-06 |
| 7968944 | Integrated circuit chip with FETs having mixed body thicknesses and method of manufacture thereof | Rajiv V. Joshi, Louis C. Hsu | 2011-06-28 |
| 7952149 | Anti-halo compensation | Omer H. Dokumaci | 2011-05-31 |
| 7932136 | Source/drain junction for high performance MOSFET formed by selective EPI process | Xuefeng Hua, Johnathan E. Faltermeier, Toshiharu Furukawa | 2011-04-26 |