Issued Patents All Time
Showing 25 most recent of 159 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12261204 | Semiconductor devices and methods for fabricating the same | Mun Hyeon Kim, Dae Won Ha | 2025-03-25 |
| 11973111 | Semiconductor devices and methods for fabricating the same | Mun Hyeon Kim, Dae Won Ha | 2024-04-30 |
| 11728428 | Dielectric isolated fin with improved fin profile | Kangguo Cheng, Bruce B. Doris, Darsen D. Lu, Ali Khakifirooz | 2023-08-15 |
| 11545555 | Gate-all-around (GAA) transistors with shallow source/drain regions and methods of fabricating the same | Peijie Feng, Stanley Seungchul Song | 2023-01-03 |
| 11437379 | Field-effect transistors (FET) circuits employing topside and backside contacts for topside and backside routing of FET power and logic signals, and related complementary metal oxide semiconductor (CMOS) circuits | Stanley Seungchul Song, Deepak Sharma, Bharani Chava, Hyeokjin Lim, Peijie Feng +6 more | 2022-09-06 |
| 11302638 | Hybrid conductor integration in power rail | John Jianhong Zhu, Stanley Seungchul Song | 2022-04-12 |
| 11257917 | Gate-all-around (GAA) transistors with additional bottom channel for reduced parasitic capacitance and methods of fabrication | Jun Yuan, Peijie Feng, Stanley Seungchul Song | 2022-02-22 |
| 11152347 | Cell circuits formed in circuit cells employing offset gate cut areas in a non-active area for routing transistor gate cross-connections | Stanley Seungchul Song, John Jianhong Zhu, Da Yang | 2021-10-19 |
| 11145654 | Field effect transistor (FET) comprising channels with silicon germanium (SiGe) | Kwanyong LIM, Stanley Seungchul Song, Jun Yuan | 2021-10-12 |
| 11121075 | Hybrid metallization interconnects for power distribution and signaling | Mustafa Badaroglu | 2021-09-14 |
| 11038344 | Shunt power rail with short line effect | John Jianhong Zhu, Xiangdong Chen, Haining Yang | 2021-06-15 |
| 10892364 | Dielectric isolated fin with improved fin profile | Kangguo Cheng, Bruce B. Doris, Darsen D. Lu, Ali Khakifirooz | 2021-01-12 |
| 10886385 | Semiconductor structures having increased channel strain using fin release in gate regions | Kangguo Cheng, Bruce B. Doris, Ali Khakifirooz, Darsen D. Lu, Alexander Reznicek | 2021-01-05 |
| 10854604 | Offset gate contact | ChihWei Kuo, Haining Yang, Jun Yuan | 2020-12-01 |
| 10763364 | Circuits having a diffusion break with avoided or reduced adjacent semiconductor channel strain relaxation, and related methods | Stanley Seungchul Song, Da Yang, Peijie Feng | 2020-09-01 |
| 10700204 | Circuits having a diffusion break with avoided or reduced adjacent semiconductor channel strain relaxation, and related methods | Stanley Seungchul Song, Da Yang, Peijie Feng | 2020-06-30 |
| 10593700 | Standard cell architecture with M1 layer unidirectional routing | Mukul Gupta, Xiangdong Chen, Ohsang Kwon, Foua Vang, Stanley Seungchul Song | 2020-03-17 |
| 10559501 | Self-aligned quadruple patterning process for Fin pitch below 20nm | Stanley Seungchul Song, Jeffrey Junhao Xu, Da Yang, Choh Fei Yeap | 2020-02-11 |
| 10546955 | Dielectric isolated fin with improved fin profile | Kangguo Cheng, Bruce B. Doris, Darsen D. Lu, Ali Khakifirooz | 2020-01-28 |
| 10439039 | Integrated circuits including a FinFET and a nanostructure FET | Stanley Seungchul Song, Jeffrey Junhao Xu, Choh Fei Yeap | 2019-10-08 |
| 10411091 | Integrated circuits employing a field gate(s) without dielectric layers and/or work function metal layers for reduced gate layout parasitic resistance, and related methods | Mustafa Badaroglu | 2019-09-10 |
| 10347752 | Semiconductor structures having increased channel strain using fin release in gate regions | Kangguo Cheng, Bruce B. Doris, Ali Khakifirooz, Darsen D. Lu, Alexander Reznicek | 2019-07-09 |
| 10332881 | Integrating a gate-all-around (GAA) field-effect transistor(s) (FET(S)) and a finFET(s) on a common substrate of a semiconductor die | Mustafa Badaroglu | 2019-06-25 |
| 10181403 | Layout effect mitigation in FinFET | Da Yang, Yanxiang Liu, Jun Yuan | 2019-01-15 |
| 10175571 | Hybrid coloring methodology for multi-pattern technology | Xiangdong Chen, Hyeokjin Lim, Ohsang Kwon, Mickael Malabry, Jingwei Zhang +5 more | 2019-01-08 |