JW

Junli Wang

IBM: 418 patents #38 of 70,183Top 1%
Globalfoundries: 20 patents #152 of 4,424Top 4%
SS Stmicroelectronics Sa: 13 patents #86 of 1,676Top 6%
TE Tessera: 4 patents #104 of 271Top 40%
SO Sony: 4 patents #8,966 of 25,231Top 40%
AS Adeia Semiconductor Solutions: 2 patents #9 of 57Top 20%
EU East China Normal University: 1 patents #33 of 168Top 20%
📍 Slingerlands, NY: #1 of 96 inventorsTop 2%
🗺 New York: #26 of 115,490 inventorsTop 1%
Overall (All Time): #509 of 4,157,543Top 1%
437
Patents All Time

Issued Patents All Time

Showing 76–100 of 437 patents

Patent #TitleCo-InventorsDate
11239343 Vertical transistor including symmetrical source/drain extension junctions Chun-Chen Yeh, Alexander Reznicek, Veeraraghavan S. Basker 2022-02-01
11239115 Partial self-aligned contact for MOL Ruilong Xie, Veeraraghavan S. Basker, Alexander Reznicek 2022-02-01
11205723 Selective source/drain recess for improved performance, isolation, and scaling Ardasheir Rahman, Brent A. Anderson, Stuart A. Sieg, Christopher J. Waskiewicz 2021-12-21
11195745 Forming single and double diffusion breaks for fin field-effect transistor structures Juntao Li, Kangguo Cheng, Ruilong Xie 2021-12-07
11189693 Transistor having reduced contact resistance Veeraraghavan S. Basker, Kangguo Cheng, Theodorus E. Standaert 2021-11-30
11189725 VTFET with cell height constraints Heng Wu, Ruilong Xie, Lan Yu, Alexander Reznicek 2021-11-30
11183558 Nanosheet transistor having partially self-limiting bottom isolation extending into the substrate and under the source/drain and gate regions Chun-Chen Yeh, Veeraraghavan S. Basker, Alexander Reznicek 2021-11-23
11177162 Trapezoidal interconnect at tight BEOL pitch Nicholas Anthony Lanzillo, Hosadurga Shobha, Huai Huang, Koichi Motoyama, Christopher J. Penny +1 more 2021-11-16
11177132 Self aligned block masks for implantation control Romain Lallement, Ardasheir Rahman, Liying Jiang, Brent A. Anderson 2021-11-16
11164778 Barrier-free vertical interconnect structure Hsueh-Chung Chen, Su Chen Fan, Yann Mignot, Lawrence A. Clevenger 2021-11-02
11164792 Complementary field-effect transistors Ruilong Xie, Alexander Reznicek, Jingyun Zhang 2021-11-02
11152307 Buried local interconnect Kangguo Cheng, Lawrence A. Clevenger, Carl Radens, John H. Zhang 2021-10-19
11152257 Barrier-less prefilled via formation Nicholas Anthony Lanzillo, Hosadurga Shobha, Lawrence A. Clevenger, Christopher J. Penny, Robert R. Robison +1 more 2021-10-19
11145543 Semiconductor via structure with lower electrical resistance Lawrence A. Clevenger, Baozhen Li, Kirk D. Peterson, Terry A. Spooner 2021-10-12
11145550 Dummy fin template to form a self-aligned metal contact for output of vertical transport field effect transistor Brent A. Anderson, Albert M. Young 2021-10-12
11145551 FinFET devices Veeraraghavan S. Basker, Kangguo Cheng, Theodoras E. Standaert 2021-10-12
11139385 Interface-less contacts to source/drain regions and gate electrode over active portion of device Veeraraghavan S. Basker, Huiming Bu 2021-10-05
11121032 Fabrication of self-aligned gate contacts and source/drain contacts directly above gate electrodes and source/drains Veeraraghavan S. Basker, Kangguo Cheng, Theodorus E. Standaert 2021-09-14
11107814 Vertical fin field effect transistor devices with a replacement metal gate Ruqiang Bao, Michael P. Belyansky 2021-08-31
11101217 Buried power rail for transistor devices Ruilong Xie, Alexander Reznicek, Kangguo Cheng 2021-08-24
11088278 Precise junction placement in vertical semiconductor devices using etch stop layers Huiming Bu, Liying Jiang, Siyuranga O. Koswatta 2021-08-10
11075161 Large via buffer Yann Mignot, Hsueh-Chung Chen, Chi-Chun Liu, Mary Claire Silvestre 2021-07-27
11062960 Shared contact trench comprising dual silicide layers and dual epitaxial layers for source/drain layers of NFET and PFET devices Heng Wu, Kangguo Cheng, Zuoguang Liu 2021-07-13
11062993 Contacts having a geometry to reduce resistance Lawrence A. Clevenger, Baozhen Li, Kirk D. Peterson, Terry A. Spooner 2021-07-13
11056386 Two-dimensional (2D) self-aligned contact (or via) to enable further device scaling Veeraraghavan S. Basker, Chun-Chen Yeh, Alexander Reznicek 2021-07-06