Issued Patents All Time
Showing 76–100 of 106 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7648820 | Antireflective hardmask and uses thereof | Katherina Babich, Elbert E. Huang, Arpan Mahorowala, David R. Medeiros, Karen Temple | 2010-01-19 |
| 7588879 | Graded spin-on organic antireflective coating for photolithography | Colin J. Brodsky, Sean D. Burns, Dario L. Goldfarb, Michael Lercel, David R. Medeiros +3 more | 2009-09-15 |
| 7545041 | Techniques for patterning features in semiconductor devices | Scott D. Allen, Katherina Babich, Steven J. Holmes, Arpan Mahorowala, Richard Wise | 2009-06-09 |
| 7541134 | Antireflective film-forming composition, method for manufacturing the same, and antireflective film and pattern formation method using the same | Motoaki Iwabuchi, Yoshitaka Hamada, Tsutomu Ogihara, Takeshi Asano, Takafumi Ueda | 2009-06-02 |
| 7521172 | Topcoat material and use thereof in immersion lithography processes | Robert Allen David, Phillip Brock, Sean D. Burns, Dario L. Goldfarb, David R. Medeiros +3 more | 2009-04-21 |
| 7497959 | Methods and structures for protecting one area while processing another area on a chip | Deok-kee Kim, Kenneth T. Settlemyer, Jr., Kangguo Cheng, Ramachandra Divakaruni, Carl Radens +4 more | 2009-03-03 |
| 7485573 | Process of making a semiconductor device using multiple antireflective materials | Marie Angelopoulos, Katherina Babich, Sean D. Burns, Richard A. Conti, Allen H. Gabor +2 more | 2009-02-03 |
| 7485690 | Sacrificial film-forming composition, patterning process, sacrificial film and removal method | Yoshitaka Hamada, Tsutomu Ogihara, Motoaki Iwabuchi, Takeshi Asano, Takafumi Ueda | 2009-02-03 |
| 7470504 | Reflective film interface to restore transverse magnetic wave contrast in lithographic processing | Kafai Lai, Alan E. Rosenbluth | 2008-12-30 |
| 7435074 | Method for fabricating dual damascence structures using photo-imprint lithography, methods for fabricating imprint lithography molds for dual damascene structures, materials for imprintable dielectrics and equipment for photo-imprint lithography used in dual damascence patterning | Matthew E. Colburn, Kenneth Raymond Carter, Gary M. McClelland | 2008-10-14 |
| 7396758 | Polycarbosilane buried etch stops in interconnect structures | Elbert E. Huang, Kaushik A. Kumar, Kelly Malone, Muthumanickam Sankarapandian, Christy S. Tyberg | 2008-07-08 |
| 7326442 | Antireflective composition and process of making a lithographic structure | Katherina Babich, Sean D. Burns, Elbert E. Huang, Arpan Mahorowala, Karen Temple | 2008-02-05 |
| 7276327 | Silicon-containing compositions for spin-on arc/hardmask materials | Marie Angelopoulos, Wu-Song Huang, Arpan P. Mahorowila, Wayne M. Moreau, Ratnam Sooriyekumaren | 2007-10-02 |
| 7270931 | Silicon-containing compositions for spin-on ARC/hardmask materials | Marie Angelopoulos, Wu-Song Huang, Arpan P. Mahorowila, Wayne M. Moreau, Ratnam Sooriyakumaran | 2007-09-18 |
| 7256146 | Method of forming a ceramic diffusion barrier layer | Stephan A. Cohen, Stephen M. Gates, Jeffrey Hedrick, Elbert E. Huang | 2007-08-14 |
| 7223517 | Lithographic antireflective hardmask compositions and uses thereof | Katherina Babich, Arpan Mahorowala, David R. Medeiros | 2007-05-29 |
| 7187081 | Polycarbosilane buried etch stops in interconnect structures | Elbert E. Huang, Kaushik A. Kumar, Kelly Malone, Muthumanickam Sankarapandian, Christy S. Tyberg | 2007-03-06 |
| 7179758 | Recovery of hydrophobicity of low-k and ultra low-k organosilicate films used as inter metal dielectrics | Nirupama Chakrapani, Matthew E. Colburn, Christos D. Dimitrakopoulos, Sampath Purushothaman, Satyanarayana V. Nitta | 2007-02-20 |
| 7175966 | Water and aqueous base soluble antireflective coating/hardmask materials | Katherina Babich, Alfred Grill, Arpan Mahorowala | 2007-02-13 |
| 7172849 | Antireflective hardmask and uses thereof | Katherina Babich, Elbert E. Huang, Arpan Mahorowala, David R. Medeiros, Karen Temple | 2007-02-06 |
| 7141692 | Molecular photoresists containing nonpolymeric silsesquioxanes | Robert David Allen, Wu-Song Huang, Mahmoud Khojasteh, Qinghuang Lin, Ratnam Sooriyakumaran +1 more | 2006-11-28 |
| 7135595 | Photoresist composition | Robert David Allen, Gregory Breyta, Phillip Brock, Richard Anthony DiPietro, Debra Fenzel-Alexander +5 more | 2006-11-14 |
| 7077903 | Etch selectivity enhancement for tunable etch resistant anti-reflective layer | Katherina Babich, Scott D. Halle, David V. Horak, Arpan Mahorowala, Wesley C. Natzle +1 more | 2006-07-18 |
| 7030008 | Techniques for patterning features in semiconductor devices | Scott D. Allen, Katherina Babich, Steven J. Holmes, Arpan Mahorowala, Richard Wise | 2006-04-18 |
| 7014980 | Photoresist composition | Robert David Allen, Gregory Breyta, Phillip Brock, Richard Anthony DiPietro, Debra Fenzel-Alexander +5 more | 2006-03-21 |