Issued Patents All Time
Showing 51–75 of 106 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8759976 | Structure with sub-lithographic random conductors as a physical unclonable function | Daniel C. Edelstein, Gregory M. Fritz, Stephen M. Gates | 2014-06-24 |
| 8741713 | Reliable physical unclonable function for device authentication | John Bruley, Vijay Narayanan, Jean-Oliver Plouchart, Peilin Song | 2014-06-03 |
| 8680511 | Bilayer gate dielectric with low equivalent oxide thickness for graphene devices | Christos D. Dimitrakopoulos, Damon B. Farmer, Alfred Grill, Yu-Ming Lin, Deborah A. Neumayer +1 more | 2014-03-25 |
| 8623761 | Method of forming a graphene cap for copper interconnect structures | Griselda Bonilla, Christos D. Dimitrakopoulos, Alfred Grill, James B. Hannon, Qinghuang Lin +3 more | 2014-01-07 |
| 8609322 | Process of making a lithographic structure using antireflective materials | Marie Angelopoulos, Katherina Babich, Sean D. Burns, Allen H. Gabor, Scott D. Halle +1 more | 2013-12-17 |
| 8525169 | Reliable physical unclonable function for device authentication | Daniel C. Edelstein, Stephen M. Gates, Edward W. Kiewra, Satyanarayana V. Nitta, Ramachandran Muralidhar | 2013-09-03 |
| 8334203 | Interconnect structure and method of fabricating | Qinghuang Lin, Ratnam Sooriyakumaran | 2012-12-18 |
| 8323871 | Antireflective hardmask composition and a method of preparing a patterned material using same | Sean D. Burns, David R. Medeiros | 2012-12-04 |
| 8293454 | Process of making a lithographic structure using antireflective materials | Marie Angelopoulos, Katherina Babich, Sean D. Burns, Allen H. Gabor, Scott D. Halle +1 more | 2012-10-23 |
| 8137996 | Method and system for tone inverting of residual layer tolerant imprint lithography | Matthew E. Colburn, Theodore G. van Kessel, Yves Martin | 2012-03-20 |
| 8137997 | Method and system for tone inverting of residual layer tolerant imprint lithography | Matthew E. Colburn, Theodore G. van Kessel, Yves Martin | 2012-03-20 |
| 8125618 | Reflective film interface to restore transverse magnetic wave contrast in lithographic processing | Kafai Lai, Alan E. Rosenbluth | 2012-02-28 |
| 8124485 | Molecular spacer layer for semiconductor oxide surface and high-K dielectric stack | Dario L. Goldfarb, Hemanth Jagannathan | 2012-02-28 |
| 7982312 | Method for fabricating dual damascene structures using photo-imprint lithography, methods for fabricating imprint lithography molds for dual damascene structures, materials for imprintable dielectrics and equipment for photo-imprint lithography used in dual damascene patterning | Matthew E. Colburn, Kenneth Raymond Carter, Gary M. McClelland | 2011-07-19 |
| 7968270 | Process of making a semiconductor device using multiple antireflective materials | Marie Angelopoulos, Katherina Babich, Sean D. Burns, Richard A. Conti, Allen H. Gabor +2 more | 2011-06-28 |
| 7914975 | Multiple exposure lithography method incorporating intermediate layer patterning | Sean D. Burns, Allen H. Gabor, Scott D. Halle | 2011-03-29 |
| 7901864 | Radiation-sensitive composition and method of fabricating a device using the radiation-sensitive composition | Wu-Song Huang, Marie Angelopoulos, Timothy A. Brunner, Ratnam Sooriyakumaran | 2011-03-08 |
| 7879717 | Polycarbosilane buried etch stops in interconnect structures | Elbert E. Huang, Kaushik A. Kumar, Kelly Malone, Muthumanickam Sankarapandian, Christy S. Tyberg | 2011-02-01 |
| 7862989 | Method for fabricating dual damascene structures using photo-imprint lithography, methods for fabricating imprint lithography molds for dual damascene structures, materials for imprintable dielectrics and equipment for photo-imprint lithography used in dual damascene patterning | Matthew E. Colburn, Kenneth Raymond Carter, Gary M. McClelland | 2011-01-04 |
| 7837459 | Method for fabricating dual damascene structures using photo-imprint lithography, methods for fabricating imprint lithography molds for dual damascene structures, materials for imprintable dielectrics and equipment for photo-imprint lithography used in dual damascene patterning | Matthew E. Colburn, Kenneth Raymond Carter, Gary M. McClelland | 2010-11-23 |
| 7816069 | Graded spin-on organic antireflective coating for photolithography | Colin J. Brodsky, Sean D. Burns, Dario L. Goldfarb, Michael Lercel, David R. Medeiros +3 more | 2010-10-19 |
| 7776628 | Method and system for tone inverting of residual layer tolerant imprint lithography | Matthew E. Colburn, Theodore G. van Kessel, Yves Martin | 2010-08-17 |
| 7764502 | Control device, in particular in the form of an electric switch for electric handtools | Tino Erb, Klaus Fiederer | 2010-07-27 |
| 7736841 | Reflective film interface to restore transverse magnetic wave contrast in lithographic processing | Kafai Lai, Alan E. Rosenbluth | 2010-06-15 |
| 7687913 | Recovery of hydrophobicity of low-k and ultra low-k organosilicate films used as inter metal dielectrics | Nirupama Chakrapani, Matthew E. Colburn, Christos D. Dimitrakopoulos, Sampath Purushothaman, Satyanarayana V. Nitta | 2010-03-30 |