Issued Patents All Time
Showing 76–100 of 100 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9889567 | Wafer swapper | Dale R. Du Bois, Juan Carlos Rocha-Alvarez, Karthik Janakiraman, Hari Ponnekanti, Prajeeth Wilton | 2018-02-13 |
| 9506145 | Method and hardware for cleaning UV chambers | Alexandros T. Demos, Kelvin Chan, Juan Carlos Rocha-Alvarez, Scott A. Hendrickson, Abhijit A. Kangude +6 more | 2016-11-29 |
| 9364871 | Method and hardware for cleaning UV chambers | Alexandros T. Demos, Kelvin Chan, Juan Carlos Rocha-Alvarez, Scott A. Hendrickson, Abhijit A. Kangude +6 more | 2016-06-14 |
| 8911553 | Quartz showerhead for nanocure UV chamber | Juan Carlos Rocha-Alvarez, Alexandros T. Demos, Thomas Nowak, Jianhua Zhou | 2014-12-16 |
| 8841629 | Microwave excursion detection for semiconductor processing | Scott A. Hendrickson, Liliya Krivulina, Juan Carlos Rocha | 2014-09-23 |
| 8753449 | Enhancement in UV curing efficiency using oxygen-doped purge for ultra low-K dielectric film | Mahendra CHHABRA, Scott A. Hendrickson, Tsutomu Kiyohara, Juan Carlos Rocha-Alvarez, Alexandros T. Demos | 2014-06-17 |
| 8679987 | Deposition of an amorphous carbon layer with high film density and high etch selectivity | Patrick Reilly, Shahid Shaikh, Tersem Summan, Deenesh Padhi, Juan Carlos Rocha-Alvarez +3 more | 2014-03-25 |
| 8664061 | Pulse method of oxidizing sidewall dielectrics for high capacitance applications | Bo Xie, Alexandros T. Demos, Juan Carlos Rocha-Alvarez | 2014-03-04 |
| 8657961 | Method for UV based silylation chamber clean | Bo Xie, Alexandros T. Demos, Scott A. Hendrickson, Juan Carlos Rocha-Alvarez | 2014-02-25 |
| 8597011 | Apparatus and method for exposing a substrate to UV radiation using a reflector having both elliptical and parabolic reflective sections | Andrzei Kaszuba, Juan Carlos Rocha-Alvarez, Thomas Nowak, Ashish Shah, Inna Shmurun | 2013-12-03 |
| 8455849 | Method and apparatus for modulating wafer treatment profile in UV chamber | Juan Carlos Rocha-Alvarez, Alexandros T. Demos | 2013-06-04 |
| 8343881 | Silicon dioxide layer deposited with BDEAS | Yong Won Lee, Vladimir Zubkov, Mei-Yee Shek, Li-Qun Xia, Prahallad Iyengar +4 more | 2013-01-01 |
| 8338809 | Ultraviolet reflector with coolant gas holes and method | Yao-Hung YANG, Tuan Nguyen, Andrzej Kaszuba, Juan Carlos Rocha, Thomas Nowak +1 more | 2012-12-25 |
| 8309421 | Dual-bulb lamphead control methodology | Yao-Hung YANG, Abhijit A. Kangude, Michael A. Martinelli, Liliya Krivulina, Thomas Nowak +2 more | 2012-11-13 |
| 8274017 | Multifunctional heater/chiller pedestal for wide range wafer temperature control | Lipyeow Yap, Tuan Nguyen, Dale R. Du Bois, Thomas Nowak, Juan Carlos Rocha-Alvarez +1 more | 2012-09-25 |
| 8203126 | Apparatus and method for exposing a substrate to a rotating irradiance pattern of UV radiation | Juan Carlos Rocha-Alvarez, Thomas Nowak, Dale R. Du Bois, Scott A. Hendrickson, Dustin W. Ho +2 more | 2012-06-19 |
| 7964858 | Ultraviolet reflector with coolant gas holes and method | Yao-Hung YANG, Tuan Nguyen, Andrzej Kaszuba, Juan Carlos Rocha, Thomas Nowak +1 more | 2011-06-21 |
| 7909595 | Apparatus and method for exposing a substrate to UV radiation using a reflector having both elliptical and parabolic reflective sections | Andrzei Kaszuba, Juan Carlos Rocha-Alvarez, Thomas Nowak, Ashish Shah, Inna Shmurun | 2011-03-22 |
| 7777198 | Apparatus and method for exposing a substrate to a rotating irradiance pattern of UV radiation | Juan Carlos Rocha-Alvarez, Thomas Nowak, Dale R. Du Bois, Scott A. Hendrickson, Dustin W. Ho +2 more | 2010-08-17 |
| 7692171 | Apparatus and method for exposing a substrate to UV radiation using asymmetric reflectors | Andrzei Kaszuba, Juan Carlos Rocha-Alvarez, Tom K. Cho, Hichem M'Saad, Scott A. Hendrickson +2 more | 2010-04-06 |
| 7663121 | High efficiency UV curing system | Thomas Nowak, Juan Carlos Rocha-Alvarez, Andrzej Kaszuba, Scott A. Hendrickson, Dustin W. Ho +3 more | 2010-02-16 |
| 7589336 | Apparatus and method for exposing a substrate to UV radiation while monitoring deterioration of the UV source and reflectors | Andrzei Kaszuba, Juan Carlos Rocha-Alvarez, Thomas Nowak, Ndanka O. Mukuti | 2009-09-15 |
| 7566891 | Apparatus and method for treating a substrate with UV radiation using primary and secondary reflectors | Juan Carlos Rocha-Alvarez, Thomas Nowak, Dale R. Du Bois, Scott A. Hendrickson, Dustin W. Ho +2 more | 2009-07-28 |
| 7554103 | Increased tool utilization/reduction in MWBC for UV curing chamber | Juan Carlos Rocha-Alvarez, Thomas Nowak, Andrzej Kaszuba, Ndanka O. Mukuti | 2009-06-30 |
| 7226269 | Substrate edge grip apparatus | Satish Sundar | 2007-06-05 |