| 9159606 |
Metal air gap |
Vinod R. Purayath, Randhir P. S. Thakur |
2015-10-13 |
| 9153442 |
Processing systems and methods for halide scavenging |
Anchuan Wang, Xinglong Chen, Zihui Li, Hiroshi Hamana, Zhijun Chen +5 more |
2015-10-06 |
| 9136273 |
Flash gate air gap |
Vinod R. Purayath |
2015-09-15 |
| 9111877 |
Non-local plasma oxide etch |
Zhijun Chen, Seung Ho Park, Mikhail Korolik, Anchuan Wang |
2015-08-18 |
| 9093390 |
Conformal oxide dry etch |
Anchuan Wang, Jingchun Zhang, Young S. Lee |
2015-07-28 |
| 9093371 |
Processing systems and methods for halide scavenging |
Anchuan Wang, Xinglong Chen, Zihui Li, Hiroshi Hamana, Zhijun Chen +5 more |
2015-07-28 |
| 9064816 |
Dry-etch for selective oxidation removal |
Sang Hyuk Kim, Dongqing Yang, Young S. Lee, Weon Young Jung, Sang Jin Kim +2 more |
2015-06-23 |
| 9064815 |
Methods for etch of metal and metal-oxide films |
Jingchun Zhang, Anchuan Wang |
2015-06-23 |
| 9040422 |
Selective titanium nitride removal |
Xikun Wang, Anchuan Wang, Dmitry Lubomirsky |
2015-05-26 |
| 9034770 |
Differential silicon oxide etch |
Seung Ho Park, Yunyu Wang, Jingchun Zhang, Anchuan Wang |
2015-05-19 |
| 9023734 |
Radical-component oxide etch |
Zhijun Chen, Jingchun Zhang, Ching-Mei Hsu, Seung Ho Park, Anchuan Wang |
2015-05-05 |
| 9023732 |
Processing systems and methods for halide scavenging |
Anchuan Wang, Xinglong Chen, Zihui Li, Hiroshi Hamana, Zhijun Chen +5 more |
2015-05-05 |
| 9018108 |
Low shrinkage dielectric films |
Sukwon Hong, Toan Q. Tran, Abhijit Basu Mallick, Jingmei Liang |
2015-04-28 |
| 9012302 |
Intrench profile |
Kedar Sapre, Jing Tang |
2015-04-21 |
| 8999856 |
Methods for etch of sin films |
Jingchun Zhang, Anchuan Wang |
2015-04-07 |
| 8986557 |
HDD patterning using flowable CVD film |
Brian Saxton Underwood, Abhijit Basu Mallick, Roman Gouk, Steven Verhaverbeke |
2015-03-24 |
| 8980382 |
Oxygen-doping for non-carbon radical-component CVD films |
Abhijit Basu Mallick, Earl Osman Solis, Nicolay Kovarsky, Olga Lyubimova |
2015-03-17 |
| 8980763 |
Dry-etch for selective tungsten removal |
Xikun Wang, Ching-Mei Hsu, Zihui Li, Anchuan Wang |
2015-03-17 |
| 8969212 |
Dry-etch selectivity |
He Ren, Jang-Gyoo Yang, Jonghoon Baek, Anchuan Wang, Soonam Park +2 more |
2015-03-03 |
| 8956980 |
Selective etch of silicon nitride |
Zhijun Chen, Zihui Li, Anchuan Wang, Shankar Venkataraman |
2015-02-17 |
| 8951429 |
Tungsten oxide processing |
Jie Liu, Xikun Wang, Seung Ho Park, Mikhail Korolik, Anchuan Wang |
2015-02-10 |
| 8927390 |
Intrench profile |
Kedar Sapre, Jing Tang |
2015-01-06 |
| 8921234 |
Selective titanium nitride etching |
Jie Liu, Jingchun Zhang, Anchuan Wang, Seung Ho Park, Zhijun Chen +1 more |
2014-12-30 |
| 8921235 |
Controlled air gap formation |
Kiran V. Thadani, Jingjing Xu, Abhijit Basu Mallick, Joe Griffith Cruz, Pravin K. Narwankar |
2014-12-30 |
| 8889566 |
Low cost flowable dielectric films |
Amit Chatterjee, Abhijit Basu Mallick, Brian Saxton Underwood, Kiran V. Thadani, Xiaolin Chen +2 more |
2014-11-18 |
