Issued Patents All Time
Showing 201–223 of 223 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8435902 | Invertable pattern loading with dry etch | Jing Tang, Dongqing Yang, Shankar Venkataraman | 2013-05-07 |
| 8329587 | Post-planarization densification | Jingmei Liang, Shankar Venkataraman | 2012-12-11 |
| 8318584 | Oxide-rich liner layer for flowable CVD gapfill | Dongqing Li, Jingmei Liang | 2012-11-27 |
| 8304351 | In-situ ozone cure for radical-component CVD | Linlin Wang, Abhijit Basu Mallick, Shankar Venkataraman | 2012-11-06 |
| 8211808 | Silicon-selective dry etch for carbon-containing films | Kedar Sapre, Jing Tang, Linlin Wang, Abhijit Basu Mallick | 2012-07-03 |
| 8043933 | Integration sequences with top surface profile modification | Chien-Teh Kao, Xinliang Lu, Zhenbin Ge, Mei Chang, Hoiman Raymond Hung | 2011-10-25 |
| 8012887 | Precursor addition to silicon oxide CVD for improved low temperature gapfill | Shankar Venkataraman, Hiroshi Hamana, Manuel A. Hernandez, Paul Edward Gee | 2011-09-06 |
| 7939422 | Methods of thin film process | Jing Tang, Yi Zheng, Zheng Yuan, Zhenbin Ge, Xinliang Lu +4 more | 2011-05-10 |
| 7935643 | Stress management for tensile films | Jingmei Liang, Anjana M. Patel, Shankar Venkataraman | 2011-05-03 |
| 7825038 | Chemical vapor deposition of high quality flow-like silicon dioxide using a silicon containing precursor and atomic oxygen | Zheng Yuan, Paul Edward Gee, Kedar Sapre | 2010-11-02 |
| 7674684 | Deposition methods for releasing stress buildup | Jing Tang, Zheng Yuan, Rossella Mininni | 2010-03-09 |
| 7642171 | Multi-step anneal of thin films for film densification and improved gap-fill | Zheng Yuan, Vikash Banthia, Xinyun Xia, Hali Forstner, Rong Pan | 2010-01-05 |
| 7528051 | Method of inducing stresses in the channel region of a transistor | Reza Arghavani, Zheng Yuan, Ellie Yieh, Shankar Venkataraman | 2009-05-05 |
| 7459405 | Method using TEOS ramp-up during TEOS/ozone CVD for improved gap-fill | Xinyua Xia, Zheng Yuan | 2008-12-02 |
| 7456116 | Gap-fill depositions in the formation of silicon containing dielectric materials | Shan Wong, Xinyun Xia, Vikash Banthia, Won Bae Bang, Yen-Kun Wang +1 more | 2008-11-25 |
| 7431967 | Limited thermal budget formation of PMD layers | Zheng Yuan, Shankar Venkataraman, Cary Ching, Shang-Hsiao WONG, Kevin Mukai | 2008-10-07 |
| 7335609 | Gap-fill depositions introducing hydroxyl-containing precursors in the formation of silicon containing dielectric materials | Shan Wong, Xinyun Xia, Vikash Banthia, Won Bae Bang, Yen-Kun Wang | 2008-02-26 |
| 7208425 | Method using TEOS ramp-up during TEOS/ozone CVD for improved gap-fill | Xinyua Xia, Zheng Yuan | 2007-04-24 |
| 7037859 | Method using TEOS ramp-up during TEOS/ozone CVD for improved gap-fill | Xinyua Xia, Zheng Yuan | 2006-05-02 |
| 6905940 | Method using TEOS ramp-up during TEOS/ozone CVD for improved gap-fill | Xinyua Xia, Zheng Yuan | 2005-06-14 |
| 6843882 | Gas flow control in a wafer processing system having multiple chambers for performing same process | Karthik Janakiraman, Victor Wang, Vikash Banthia, Teresa Winson | 2005-01-18 |
| 6793733 | Gas distribution showerhead | Karthik Janakiraman, Zheng Yuan, Steven Gianoulakis | 2004-09-21 |
| 6544345 | Method and system for in-situ cleaning of semiconductor manufacturing equipment using combination chemistries | Bruce E. Mayer, Robert H. Chatham, III, Zheng Yuan | 2003-04-08 |