Issued Patents All Time
Showing 151–169 of 169 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6217430 | Pad conditioner cleaning apparatus | Raijiro Koga, Hiromi Tsuruta, Takashi Kumagai, Gee Sun Hoey, Brian J. Brown +1 more | 2001-04-17 |
| 6182602 | Inductively coupled HDP-CVD reactor | Romuald Nowak, Tetsuya Ishikawa, Troy S. Detrick, Jay D. Pinson, II | 2001-02-06 |
| 6179709 | In-situ monitoring of linear substrate polishing operations | Manoocher Birang, Shijian Li, Sasson Somekh | 2001-01-30 |
| 6170428 | Symmetric tunable inductively coupled HDP-CVD reactor | Farhad Moghadam, Hiroji Hanawa, Tetsuya Ishikawa, Dan Maydan, Shijian Li +5 more | 2001-01-09 |
| 6162368 | Technique for chemical mechanical polishing silicon | Shijian Li, Thomas H. Osterheld | 2000-12-19 |
| 6083344 | Multi-zone RF inductively coupled source configuration | Hiroji Hanawa, Tetsuya Ishikawa, Manus Wong, Shijian Li, Kaveh Niazi +3 more | 2000-07-04 |
| 6070551 | Deposition chamber and method for depositing low dielectric constant films | Shijian Li, Yaxin Wang, Tetsuya Ishikawa, Alan W. Collins | 2000-06-06 |
| 6015591 | Deposition method | Shijian Li, Tetsuya Ishikawa | 2000-01-18 |
| 5984769 | Polishing pad having a grooved pattern for use in a chemical mechanical polishing apparatus | Doyle E. Bennett, Thomas H. Osterheld, Ginetto Addiego | 1999-11-16 |
| 5944902 | Plasma source for HDP-CVD chamber | Tetsuya Ishikawa | 1999-08-31 |
| 5865896 | High density plasma CVD reactor with combined inductive and capacitive coupling | Romuald Nowak, Kevin Fairbairn | 1999-02-02 |
| 5800621 | Plasma source for HDP-CVD chamber | Tetsuya Ishikawa | 1998-09-01 |
| 5788799 | Apparatus and method for cleaning of semiconductor process chamber surfaces | Robert Steger | 1998-08-04 |
| 5772771 | Deposition chamber for improved deposition thickness uniformity | Shijian Li, Tetsuya Ishikawa | 1998-06-30 |
| 5761023 | Substrate support with pressure zones having reduced contact area and temperature feedback | Brian Lue, Tetsuya Ishikawa, Manus Wong, Shijian Li | 1998-06-02 |
| 5748434 | Shield for an electrostatic chuck | Kent Rossman, Brian Lue | 1998-05-05 |
| 5705225 | Method of filling pores in anodized aluminum parts | Charles Dornfest, Mark Fodor, Craig Bercaw, H. Steven Tomozawa | 1998-01-06 |
| 5454903 | Plasma cleaning of a CVD or etch reactor using helium for plasma stabilization | Charles Dornfest, John Y. Leong | 1995-10-03 |
| 5292399 | Plasma etching apparatus with conductive means for inhibiting arcing | Terrance Y. Lee, Petru N. Nitescu, Robert Steger, David W. Groechel, Semyon Sherstinsky +2 more | 1994-03-08 |