Issued Patents All Time
Showing 26–39 of 39 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7802538 | Method to deposit functionally graded dielectric films via chemical vapor deposition using viscous precursors | Deenesh Padhi, Sohyun Park, Ganesh Balasubramanian, Juan Carlos Rocha-Alvarez, Li-Qun Xia +1 more | 2010-09-28 |
| 7790635 | Method to increase the compressive stress of PECVD dielectric films | Mihaela Balseanu, Victor Nguyen, Li-Qun Xia, Vladimir Zubkov, Hichem M'Saad | 2010-09-07 |
| 7704816 | Boron derived materials deposition method | Jeong-Uk Huh, Mihaela Balseanu, Li-Qun Xia, Hichem M'Saad | 2010-04-27 |
| 7670924 | Air gap integration scheme | Alexandros T. Demos, Li-Qun Xia, Bok Hoen Kim, Hichem M'Saad | 2010-03-02 |
| 7611996 | Multi-stage curing of low K nano-porous films | Francimar Schmitt, Yi Zheng, Kang Sub Yim, Sang-Hoon Ahn, Lester D'Cruz +4 more | 2009-11-03 |
| 7547643 | Techniques promoting adhesion of porous low K film to underlying barrier layer | Francimar Schmitt, Alexandros T. Demos, Hichem M'Sadd, Sang-Hoon Ahn, Lester D'Cruz +2 more | 2009-06-16 |
| 7514125 | Methods to improve the in-film defectivity of PECVD amorphous carbon films | Deenesh Padhi, Chiu Chan, Sudha Rathi, Ganesh Balasubramanian, Jianhua Zhou +4 more | 2009-04-07 |
| 7501354 | Formation of low K material utilizing process having readily cleaned by-products | Dustin W. Ho, Helen R. Armer, Hichem M'Saad | 2009-03-10 |
| 7425716 | Method and apparatus for reducing charge density on a dielectric coated substrate after exposure to a large area electron beam | Alexandros T. Demos, Khaled A. Elsheref, Yuri Trachuk, Tom K. Cho, Girish Dixit +1 more | 2008-09-16 |
| 7166544 | Method to deposit functionally graded dielectric films via chemical vapor deposition using viscous precursors | Deenesh Padhi, Sohyun Park, Ganesh Balasubramanian, Juan Carlos Rocha-Alvarez, Li-Qun Xia +1 more | 2007-01-23 |
| 7112541 | In-situ oxide capping after CVD low k deposition | Li-Qun Xia, Huiwen Xu, Hichem M'Saad | 2006-09-26 |
| 7018941 | Post treatment of low k dielectric films | Zhenjiang Cui, Josephine Chang, Alexandros T. Demos, Reza Arghavani, Helen R. Armer +2 more | 2006-03-28 |
| 6465051 | Method of operating high density plasma CVD reactor with combined inductive and capacitive coupling | Turgut Sahin, Fred C. Redeker, Romuald Nowak, Shijian Li, Timothy Dyer | 2002-10-15 |
| 6413871 | Nitrogen treatment of polished halogen-doped silicon glass | Hichem M'Saad, Manoj Vellaikal, Lin Zhang, Yaxin Wang | 2002-07-02 |