Issued Patents All Time
Showing 26–50 of 88 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6440261 | Dual buffer chamber cluster tool for semiconductor wafer processing | Donald Olgado, Allen L. D'Ambra | 2002-08-27 |
| 6430468 | Method and apparatus for accurate placement of semiconductor wafers onto respective platforms within a single reaction chamber | Lawrence Chung-Lai Lei | 2002-08-06 |
| 6379466 | Temperature controlled gas distribution plate | Turgut Sahin, Salvador P. Umotoy, Ronald L. Rose | 2002-04-30 |
| 6368469 | Coils for generating a plasma and for sputtering | Jaim Nulman, Sergio Edelstein, Mani Subramani, Zheng Xu, Howard Grunes +2 more | 2002-04-09 |
| 6350353 | Alternate steps of IMP and sputtering process to improve sidewall coverage | Praburam Gopalraja, Sergio Edelstein, Peijun Ding, Debabrata Ghosh, Nirmalya Maity | 2002-02-26 |
| 6298685 | Consecutive deposition system | — | 2001-10-09 |
| 6296712 | Chemical vapor deposition hardware and process | Xin Sheng Guo, Mohan K. Bhan, Justin Jones, Lawrence Chung-Lai Lei, Russell C. Ellwanger +2 more | 2001-10-02 |
| D446506 | Monolith processing system platform | — | 2001-08-14 |
| 6270859 | Plasma treatment of titanium nitride formed by chemical vapor deposition | Jun Zhao, Ashok Sinha, Mei Chang, Lee Luo, Alex Schreiber +4 more | 2001-08-07 |
| 6270687 | RF plasma method | Yan Ye, Donald Olgado, Diana Xiaobing Ma, Gerald Yin, Peter Loewenhardt +2 more | 2001-08-07 |
| 6258220 | Electro-chemical deposition system | Yezdi Dordi, Donald Olgado, Ratson Morad, Peter Hey, Mark Denome +10 more | 2001-07-10 |
| 6254746 | Recessed coil for generating a plasma | Anantha K. Subramani, John C. Forster, Bradley O. Stimson, Sergio Edelstein, Howard Grunes +1 more | 2001-07-03 |
| 6228235 | Magnetron for low pressure, full face erosion | James Van Gogh | 2001-05-08 |
| D436609 | Transfer chamber | — | 2001-01-23 |
| 6143086 | Apparatus for full wafer deposition | — | 2000-11-07 |
| 6136163 | Apparatus for electro-chemical deposition with thermal anneal chamber | Robin Cheung, Ashok Sinha, Dan Carl | 2000-10-24 |
| 6129044 | Apparatus for substrate processing with improved throughput and yield | Jun Zhao, Ashok Sinha, Mei Chang, Lee Luo, Alex Schreiber +4 more | 2000-10-10 |
| 6071055 | Front end vacuum processing environment | — | 2000-06-06 |
| 6071372 | RF plasma etch reactor with internal inductive coil antenna and electrically conductive chamber walls | Yan Ye, Donald Olgado, Diana Xiaobing Ma, Gerald Yin, Peter Loewenhardt +2 more | 2000-06-06 |
| 6045620 | Two-piece slit valve insert for vacuum processing system | Robert B. Lowrance | 2000-04-04 |
| 5983644 | Integrated bake and chill plate | Hooman Bolandi | 1999-11-16 |
| 5964947 | Removable pumping channel liners within a chemical vapor deposition chamber | Jun Zhao, Ashok Sinha, Mei Chang, Lee Luo, Alex Schreiber +4 more | 1999-10-12 |
| 5951775 | Apparatus for full wafer deposition | — | 1999-09-14 |
| 5922133 | Multiple edge deposition exclusion rings | James Van Gogh | 1999-07-13 |
| 5919345 | Uniform film thickness deposition of sputtered materials | — | 1999-07-06 |