Issued Patents All Time
Showing 51–75 of 88 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5907220 | Magnetron for low pressure full face erosion | James Gogh | 1999-05-25 |
| 5885358 | Gas injection slit nozzle for a plasma process reactor | Dan Maydan, Steve S. Y. Mak, Donald Olgado, Gerald Yin, Timothy D. Driscoll +1 more | 1999-03-23 |
| 5883017 | Compartmentalized substrate processing chamber | Gerald Yin, Donald Olgado | 1999-03-16 |
| 5879575 | Self-cleaning plasma processing reactor | Yan Ye | 1999-03-09 |
| 5879127 | Robot assembly | Howard Grunes, Robert B. Lowrance | 1999-03-09 |
| 5868847 | Clamp ring for shielding a substrate during film layer deposition | Aihua Chen, Zheng Xu, Howard Grunes, Igor Kogan | 1999-02-09 |
| 5846332 | Thermally floating pedestal collar in a chemical vapor deposition chamber | Jun Zhao, Ashok Sinha, Mei Chang, Lee Luo, Alex Schreiber +4 more | 1998-12-08 |
| D400511 | Magnet structure for a conical target | — | 1998-11-03 |
| 5803977 | Apparatus for full wafer deposition | Robert E. Davenport | 1998-09-08 |
| 5772858 | Method and apparatus for cleaning a target in a sputtering source | — | 1998-06-30 |
| 5762748 | Lid and door for a vacuum chamber and pretreatment therefor | Thomas Banholzer, Dan Marohl, Donald M. Mintz | 1998-06-09 |
| 5746875 | Gas injection slit nozzle for a plasma process reactor | Dan Maydan, Steve S. Y. Mak, Donald Olgado, Gerald Yin, Timothy D. Driscoll +1 more | 1998-05-05 |
| 5735339 | Semiconductor processing apparatus for promoting heat transfer between isolated volumes | Robert E. Davenport | 1998-04-07 |
| 5730801 | Compartnetalized substrate processing chamber | Gerald Yin, Donald Olgado | 1998-03-24 |
| 5678980 | Robot assembly | Howard Grunes, Robert B. Lowrance | 1997-10-21 |
| 5673167 | Support platen with removable insert useful in semiconductor processing apparatus | Robert E. Davenport | 1997-09-30 |
| D381030 | Sputtering target | — | 1997-07-15 |
| 5632873 | Two piece anti-stick clamp ring | Joseph Stevens, Roy Edwards | 1997-05-27 |
| 5589224 | Apparatus for full wafer deposition | Takeshi Jinbo, Hiroyuki Takahama, Akihiko Saito | 1996-12-31 |
| 5566744 | Apparatus and method to ensure heat transfer to and from an entire substrate during semiconductor processing | — | 1996-10-22 |
| 5565058 | Lid and door for a vacuum chamber and pretreatment therefor | Thomas Banholzer, Dan Marohl, Donald M. Mintz | 1996-10-15 |
| 5540821 | Method and apparatus for adjustment of spacing between wafer and PVD target during semiconductor processing | — | 1996-07-30 |
| 5527438 | Cylindrical sputtering shield | — | 1996-06-18 |
| 5516403 | Reversing orientation of sputtering screen to avoid contamination | John C. Forster, James Van Gogh | 1996-05-14 |
| 5511799 | Sealing device useful in semiconductor processing apparatus for bridging materials having a thermal expansion differential | Robert E. Davenport | 1996-04-30 |