Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6620296 | Target sidewall design to reduce particle generation during magnetron sputtering | Jim Thompson, Marc Schweitzer, Yoichiro Tanaka, Alan Liu, ANTHONY CHAN +2 more | 2003-09-16 |
| 6143140 | Method and apparatus to improve the side wall and bottom coverage in IMP process by using magnetic field | Wei Wang, Keith A. Miller, Praburam Gopalraja | 2000-11-07 |
| 5942042 | Apparatus for improved power coupling through a workpiece in a semiconductor wafer processing system | — | 1999-08-24 |
| 5907220 | Magnetron for low pressure full face erosion | Avi Tepman | 1999-05-25 |