Issued Patents All Time
Showing 51–75 of 89 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6566283 | Silane treatment of low dielectric constant materials in semiconductor device manufacturing | Suzette K. Pangrle, Minh Van Ngo, Dawn Hopper | 2003-05-20 |
| 6530340 | Apparatus for manufacturing planar spin-on films | Dawn Hopper, Richard J. Huang | 2003-03-11 |
| 6518646 | Semiconductor device with variable composition low-k inter-layer dielectric and method of making | Dawn Hopper, Suzette K. Pangrle, Calvin T. Gabriel, Richard J. Huang | 2003-02-11 |
| 6518167 | Method of forming a metal or metal nitride interface layer between silicon nitride and copper | Matthew S. Buynoski, Paul R. Besser, Jeremias D. Romero, Pin-Chin Connie Wang, Minh Quoc Tran | 2003-02-11 |
| 6492257 | Water vapor plasma for effective low-k dielectric resist stripping | Jeffrey A. Shields, Mohammad R. Rakhshandehroo | 2002-12-10 |
| 6489253 | Method of forming a void-free interlayer dielectric (ILD0) for 0.18-&mgr;m flash memory technology and semiconductor device thereby formed | Minh Van Ngo, Robert A. Huertas, King Wai Kelwin Ko, Pei-Yuan Gao | 2002-12-03 |
| 6465361 | Method for preventing damage of low-k dielectrics during patterning | Steve Avanzino, Fei Wang | 2002-10-15 |
| 6448594 | Method and system for processing a semiconductor device | Maria C. Chan, Hao Fang, Mark S. Chang, King Wai Kelwin Ko | 2002-09-10 |
| 6445051 | Method and system for providing contacts with greater tolerance for misalignment in a flash memory | Mark S. Chang, Hao Fang, King Wai Kelwin Ko, John Jianshi Wang, Michael K. Templeton +1 more | 2002-09-03 |
| 6420278 | Method for improving the dielectric constant of silicon-based semiconductor materials | Dawn Hopper, Richard J. Huang | 2002-07-16 |
| 6417090 | Damascene arrangement for metal interconnection using low k dielectric constant materials for etch stop layer | Fei Wang | 2002-07-09 |
| 6410458 | Method and system for eliminating voids in a semiconductor device | Dawn Hopper, John Jianshi Wang | 2002-06-25 |
| 6407009 | Methods of manufacture of uniform spin-on films | Dawn Hopper, Richard J. Huang | 2002-06-18 |
| 6388309 | Apparatus and method for manufacturing semiconductors using low dielectric constant materials | Dawn Hopper, Richard J. Huang | 2002-05-14 |
| 6387825 | Solution flow-in for uniform deposition of spin-on films | Dawn Hopper, Richard J. Huang | 2002-05-14 |
| 6383925 | Method of improving adhesion of capping layers to cooper interconnects | Minh Van Ngo, Robert A. Huertas, Ercan Adem | 2002-05-07 |
| 6376309 | Method for reduced gate aspect ratio to improve gap-fill after spacer etch | John Jianshi Wang, Kent Kuohua Chang, Hao Fang | 2002-04-23 |
| 6335533 | Electron microscopy sample having silicon nitride passivation layer | Guarionex Morales, Dawn Hopper | 2002-01-01 |
| 6317642 | Apparatus and methods for uniform scan dispensing of spin-on materials | Dawn Hopper, Christof Streck, John G. Pellerin, Richard J. Huang | 2001-11-13 |
| 6309959 | Formation of self-aligned passivation for interconnect to minimize electromigration | Pin-Chin Connie Wang, Joffre F. Bernard, Amit P. Marathe | 2001-10-30 |
| 6300658 | Method for reduced gate aspect ration to improve gap-fill after spacer etch | John Jianshi Wang, Kent Kuohua Chang, Hao Fang | 2001-10-09 |
| 6259115 | Dummy patterning for semiconductor manufacturing processes | Simon S. Chan, Kai Yang | 2001-07-10 |
| 6235453 | Low-k photoresist removal process | Steven C. Avanzino, Jacques Bertrand, Richard J. Huang | 2001-05-22 |
| 6225240 | Rapid acceleration methods for global planarization of spin-on films | Dawn Hopper, Richard J. Huang | 2001-05-01 |
| 6207552 | Forming and filling a recess in interconnect for encapsulation to minimize electromigration | Pin-Chin Connie Wang | 2001-03-27 |