Issued Patents All Time
Showing 1–20 of 20 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7023059 | Trenches to reduce lateral silicide growth in integrated circuit technology | Darin A. Chan, Simon S. Chan, Jeffrey P. Patton | 2006-04-04 |
| 6841449 | Two-step process for nickel deposition | George Jonathan Kluth | 2005-01-11 |
| 6746973 | Effect of substrate surface treatment on 193 NM resist processing | Catherine B. Labelle, Ernesto A. Gallardo, Ramkumar Subramanian | 2004-06-08 |
| 6730587 | Titanium barrier for nickel silicidation of a gate electrode | Christy Mei-Chu Woo, Minh Van Ngo, George Jonathan Kluth | 2004-05-04 |
| 6689687 | Two-step process for nickel deposition | George Jonathan Kluth | 2004-02-10 |
| 6632740 | Two-step process for nickel deposition | George Jonathan Kluth | 2003-10-14 |
| 6627504 | Stacked double sidewall spacer oxide over nitride | George Jonathan Kluth | 2003-09-30 |
| 6605513 | Method of forming nickel silicide using a one-step rapid thermal anneal process and backend processing | Eric N. Paton, Ercan Adem, Paul R. Besser, Matthew S. Buynoski, John Foster +4 more | 2003-08-12 |
| 6562718 | Process for forming fully silicided gates | Qi Xiang, Ercan Adem, Paul R. Besser, Matthew S. Buynoski, John Foster +5 more | 2003-05-13 |
| 6541866 | Cobalt barrier for nickel silicidation of a gate electrode | Christy Mei-Chu Woo, Minh Van Ngo, George Jonathan Kluth | 2003-04-01 |
| 6525391 | Nickel silicide process using starved silicon diffusion barrier | Minh Van Ngo | 2003-02-25 |
| 6507123 | Nickel silicide process using UDOX to prevent silicide shorting | Christy Mei-Chu Woo, Minh Van Ngo | 2003-01-14 |
| 6495460 | Dual layer silicide formation using a titanium barrier to reduce surface roughness at silicide/junction interface | George Jonathan Kluth, Minh Van Ngo, Christy Mei-Chu Woo | 2002-12-17 |
| 6468900 | Dual layer nickel deposition using a cobalt barrier to reduce surface roughness at silicide/junction interface | George Jonathan Kluth, Minh Van Ngo, Christy Mei-Chu Woo | 2002-10-22 |
| 6432817 | Tungsten silicide barrier for nickel silicidation of a gate electrode | Christy Mei-Chu Woo, Minh Van Ngo, George Jonathan Kluth | 2002-08-13 |
| 6362095 | Nickel silicide stripping after nickel silicide formation | Christy Mei-Chu Woo, George Jonathan Kluth | 2002-03-26 |
| 6340395 | Salsa clean process | Barry Earl Dick, Shu Tsai Wang, Weiwen Ou, Lynne A. Okada, Yen-Chia Chu | 2002-01-22 |
| 6274504 | Minimizing metal corrosion during post metal solvent clean | Anne E. Sanderfer | 2001-08-14 |
| 6235453 | Low-k photoresist removal process | Lu You, Steven C. Avanzino, Richard J. Huang | 2001-05-22 |
| 6030901 | Photoresist stripping without degrading low dielectric constant materials | Dawn Hopper, Richard J. Huang, Lu You | 2000-02-29 |