LY

Lu You

AM AMD: 84 patents #44 of 9,279Top 1%
SL Spansion Llc.: 5 patents #175 of 769Top 25%
Globalfoundries: 1 patents #2,221 of 4,424Top 55%
RI Rensselaer Polytechnic Institute: 1 patents #306 of 819Top 40%
📍 Troy, NY: #3 of 610 inventorsTop 1%
🗺 New York: #709 of 115,490 inventorsTop 1%
Overall (All Time): #18,466 of 4,157,543Top 1%
89
Patents All Time

Issued Patents All Time

Showing 76–89 of 89 patents

Patent #TitleCo-InventorsDate
6200913 Cure process for manufacture of low dielectric constant interlevel dielectric layers Simon S. Chan, John A. Iacoponi, Richard J. Huang, Robin Cheung 2001-03-13
6197703 Apparatus and method for manufacturing semiconductors using low dielectric constant materials Dawn Hopper, Richard J. Huang 2001-03-06
6171949 Low energy passivation of conductive material in damascene process for semiconductors Shekhar Pramanick 2001-01-09
6147000 Method for forming low dielectric passivation of copper interconnects Shekhar Pramanick, Takeshi Nogami 2000-11-14
6136729 Method for improving semiconductor dielectrics Dawn Hopper, Richard J. Huang 2000-10-24
6100181 Low dielectric constant coating of conductive material in a damascene process for semiconductors John A. Iacoponi 2000-08-08
6093635 High integrity borderless vias with HSQ gap filled patterned conductive layers Khanh Tran, Richard J. Huang, Simon S. Chan 2000-07-25
6066574 Hot plate cure process for BCB low k interlevel dielectric Dawn Hopper, Christof Streck 2000-05-23
6030901 Photoresist stripping without degrading low dielectric constant materials Dawn Hopper, Richard J. Huang, Jacques Bertrand 2000-02-29
5888898 HSQ baking for reduced dielectric constant Minh Van Ngo, Khanh Tran, Terri Jo Kitson, Simon S. Chan, Jean Y. Yang 1999-03-30
5888911 HSQ processing for reduced dielectric constant Minh Van Ngo, Khanh Tran, Jean Y. Yang, Richard J. Huang 1999-03-30
5861677 Low RC interconnection Robin Cheung, Simon S. Chan, Richard J. Huang 1999-01-19
5760480 Low RC interconnection Robin Cheung, Simon S. Chan, Richard J. Huang 1998-06-02
5268202 Vapor deposition of parylene-F using 1,4-bis (trifluoromethyl) benzene Guang Yang, Toh-Ming Lu, James A. Moore, John McDonald 1993-12-07