Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
JB

Joffre F. Bernard — 17 Patents

AMD: 13 patents #943 of 9,280Top 15%
SLSpansion Llc.: 3 patents #241 of 769Top 35%
Santa Clara, CA: #984 of 9,301 inventorsTop 15%
California: #35,467 of 386,348 inventorsTop 10%
Overall (All Time): #263,971 of 4,157,543Top 7%
17 Patents All Time
Joffre F. Bernard has been granted 17 US patents while listed as an inventor at AMD. The first was granted in 2001 and the most recent in February 2013. Joffre F. Bernard ranks #263,971 of 4,157,543 US inventors in our database (top 6.3%). Patent records list Joffre F. Bernard in Santa Clara, CA, US.

Patents per Year

Patents granted per year, 2001 to 2013Bar chart with a peak of 6 patents in 2003.peak 62001: 1 patents20012002: 5 patents20022003: 6 patents20032004: 2 patents20042010: 1 patents20102012: 1 patents20122013: 1 patents2013

Issued Patents All Time

Showing 1–17 of 17 patents

Patent #TitleCo-InventorsDateApprox Value ⓘ
8373148 Memory device with improved performance Zhida Lan, Manuj Rathor 2013-02-12 $2,724,000
8093698 Gettering/stop layer for prevention of reduction of insulating oxide in metal-insulator-metal device Manuj Rathor, Matthew S. Buynoski, Steven C. Avanzino, Suzette K. Pangrle 2012-01-10 $945,000
7790497 Method to prevent alloy formation when forming layered metal oxides by metal oxidation Steven C. Avanzino, Jeffrey A. Shields, Suzette K. Pangrle 2010-09-07 $1,192,000
6811671 Method of controlling zinc-doping in a copper-zinc alloy thin film electroplated on a copper surface and a semiconductor device thereby formed Sergey Lopatin, Alexander H. Nickel 2004-11-02 $2,431,000
6770559 Method of forming wiring by implantation of seed layer material Ercan Adem, Fei Wang 2004-08-03 $1,898,000
6630741 Method of reducing electromigration by ordering zinc-doping in an electroplated copper-zinc interconnect and a semiconductor device thereby formed Sergey Lopatin, Paul L. King 2003-10-07 $3,893,000
6624074 Method of fabricating a semiconductor device by calcium doping a copper surface using a chemical solution Sergey Lopatin, Paul L. King 2003-09-23 $3,430,000
6621165 Semiconductor device fabricated by reducing carbon, sulphur, and oxygen impurities in a calcium-doped copper surface Sergey Lopatin, Paul L. King 2003-09-16
6541286 Imaging of integrated circuit interconnects Minh Quoc Tran 2003-04-01 $3,014,000
6541860 Barrier-to-seed layer alloying in integrated circuit interconnects Christy Mei-Chu Woo, Pin-Chin Connie Wang 2003-04-01 $3,014,000
6515367 Sub-cap and method of manufacture therefor in integrated circuit capping layers Minh Van Ngo, Tim Z. Hossain 2003-02-04 $1,030,000
6479898 Dielectric treatment in integrated circuit interconnects Dawn Hopper, Minh Van Ngo 2002-11-12 $1,765,000
6469387 Semiconductor device formed by calcium doping a copper surface using a chemical solution Sergey Lopatin, Paul L. King 2002-10-22 $2,399,000
6465867 Amorphous and gradated barrier layer for integrated circuit interconnects Sergey Lopatin 2002-10-15 $861,000
6444580 Method of reducing carbon, sulphur, and oxygen impurities in a calcium-doped copper surface and semiconductor device thereby formed Sergey Lopatin, Paul L. King 2002-09-03 $1,843,000
6406996 Sub-cap and method of manufacture therefor in integrated circuit capping layers Minh Van Ngo, Tim Z. Hossain 2002-06-18 $3,499,000
6309959 Formation of self-aligned passivation for interconnect to minimize electromigration Pin-Chin Connie Wang, Lu You, Amit P. Marathe 2001-10-30 $4,666,000