JB

Joffre F. Bernard

AM AMD: 13 patents #907 of 9,279Top 10%
SL Spansion Llc.: 3 patents #241 of 769Top 35%
Overall (All Time): #277,710 of 4,157,543Top 7%
17
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
8373148 Memory device with improved performance Zhida Lan, Manuj Rathor 2013-02-12
8093698 Gettering/stop layer for prevention of reduction of insulating oxide in metal-insulator-metal device Manuj Rathor, Matthew S. Buynoski, Steven C. Avanzino, Suzette K. Pangrle 2012-01-10
7790497 Method to prevent alloy formation when forming layered metal oxides by metal oxidation Steven C. Avanzino, Jeffrey A. Shields, Suzette K. Pangrle 2010-09-07
6811671 Method of controlling zinc-doping in a copper-zinc alloy thin film electroplated on a copper surface and a semiconductor device thereby formed Sergey Lopatin, Alexander H. Nickel 2004-11-02
6770559 Method of forming wiring by implantation of seed layer material Ercan Adem, Fei Wang 2004-08-03
6630741 Method of reducing electromigration by ordering zinc-doping in an electroplated copper-zinc interconnect and a semiconductor device thereby formed Sergey Lopatin, Paul L. King 2003-10-07
6624074 Method of fabricating a semiconductor device by calcium doping a copper surface using a chemical solution Sergey Lopatin, Paul L. King 2003-09-23
6621165 Semiconductor device fabricated by reducing carbon, sulphur, and oxygen impurities in a calcium-doped copper surface Sergey Lopatin, Paul L. King 2003-09-16
6541286 Imaging of integrated circuit interconnects Minh Quoc Tran 2003-04-01
6541860 Barrier-to-seed layer alloying in integrated circuit interconnects Christy Mei-Chu Woo, Pin-Chin Connie Wang 2003-04-01
6515367 Sub-cap and method of manufacture therefor in integrated circuit capping layers Minh Van Ngo, Tim Z. Hossain 2003-02-04
6479898 Dielectric treatment in integrated circuit interconnects Dawn Hopper, Minh Van Ngo 2002-11-12
6469387 Semiconductor device formed by calcium doping a copper surface using a chemical solution Sergey Lopatin, Paul L. King 2002-10-22
6465867 Amorphous and gradated barrier layer for integrated circuit interconnects Sergey Lopatin 2002-10-15
6444580 Method of reducing carbon, sulphur, and oxygen impurities in a calcium-doped copper surface and semiconductor device thereby formed Sergey Lopatin, Paul L. King 2002-09-03
6406996 Sub-cap and method of manufacture therefor in integrated circuit capping layers Minh Van Ngo, Tim Z. Hossain 2002-06-18
6309959 Formation of self-aligned passivation for interconnect to minimize electromigration Pin-Chin Connie Wang, Lu You, Amit P. Marathe 2001-10-30