Issued Patents All Time
Showing 76–100 of 111 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8677290 | Method of forming and using photolithography mask having a scattering bar structure | Yung-Sung Yen, Chien-Wen Lai, Cherng-Shyan Tsay | 2014-03-18 |
| 8673520 | Intensity selective exposure photomask | George Liu, Chih-Yang Yeh, Te-Chih Huang, Wen-Hao Liu, Ying-Chou Cheng +9 more | 2014-03-18 |
| 8656319 | Optical proximity correction convergence control | Cheng-Cheng Kuo, Ching-Che Tsai, Tzu-Chun Lo, Chih-Wei Hsu, Hua-Tai Lin +4 more | 2014-02-18 |
| 8623231 | Method for etching an ultra thin film | George Liu, Vencent Chang, Chih-Yang Yeh | 2014-01-07 |
| 8562843 | Integrated circuit method with triple patterning | Chia-Chu Liu, Meng-Wei Chen | 2013-10-22 |
| 8472005 | Methodology for implementing enhanced optical lithography for hole patterning in semiconductor fabrication | George Liu, Norman Chen, Vencent Chang, Chin-Hsiang Lin | 2013-06-25 |
| 8431291 | Intensity selective exposure photomask | George Liu, Chih-Yang Yeh, Te-Chih Huang, Wen-Hao Liu, Ying-Chou Cheng +9 more | 2013-04-30 |
| 8394576 | Method for patterning a photosensitive layer | Hsiao-Tzu Lu, Tsiao-Chen Wu, Vencent Chang, George Liu | 2013-03-12 |
| 8236579 | Methods and systems for lithography alignment | Hsiao-Tzu Lu, Hung-Chang Hsieh, Hsueh-Hung Fu, Ching-Hua Hsieh, Shau-Lin Shue | 2012-08-07 |
| 8237297 | System and method for providing alignment mark for high-k metal gate process | Meng-Wei Chen, George Liu, Jiann Yuan Huang, Chia-Ching Lin | 2012-08-07 |
| 8178289 | System and method for photolithography in semiconductor manufacturing | Chin-Hsiang Lin, David Lu | 2012-05-15 |
| 8158306 | Method and system for combining photomasks to form semiconductor devices | Chin-Hsiang Lin, Chih-Cheng Chiu | 2012-04-17 |
| 8132503 | Method and apparatus for planarizing gap-filling material | Chin-Hsiang Lin, T. Lin, Chia-Hsiang Lin | 2012-03-13 |
| 8119533 | Pattern formation in semiconductor fabrication | George Liu, Vencent Chang, Shang-Wen Chang | 2012-02-21 |
| 8119992 | System for overlay measurement in semiconductor manufacturing | Hsiao-Tzu Lu, Chin-Hsiang Lin, Hua-Shu Wu, Chia-Hsiang Lin | 2012-02-21 |
| 8101340 | Method of inhibiting photoresist pattern collapse | Ching-Yu Chang, Heng-Jen Lee, Chin-Hsiang Lin, Hua-Tai Lin, Bang-Chein Ho +4 more | 2012-01-24 |
| 8048590 | Photolithography mask having a scattering bar structure that includes transverse linear assist features | Yung-Sung Yen, Chien-Wen Lai, Cherng-Shyan Tsay | 2011-11-01 |
| 8003303 | Intensity selective exposure method and apparatus | George Liu, Chih-Yang Yeh, Te-Chih Huang | 2011-08-23 |
| 7960821 | Dummy vias for damascene process | Chin-Hsiang Lin, Vencent Chang, Lawrence Lin, Lai Chien Wen, Jhun Hua Chen | 2011-06-14 |
| 7838205 | Utilization of electric field with isotropic development in photolithography | Vincent S. Chang, George Liu, Norman Chen | 2010-11-23 |
| 7811720 | Utilizing compensation features in photolithography for semiconductor device fabrication | Chin-Hsiang Lin, Chih-Cheng Chiu | 2010-10-12 |
| 7767570 | Dummy vias for damascene process | Chin-Hsiang Lin, Vencent Chang, Lawrence Lin, Lai Chien Wen, Jhun Hua Chen | 2010-08-03 |
| 7723014 | System and method for photolithography in semiconductor manufacturing | Chin-Hsiang Lin, Tsai-Cheng Gau, Chun-Kung Chen, Hsiao-Tzu Lu, Fu-Jye Liang | 2010-05-25 |
| 7648918 | Method of pattern formation in semiconductor fabrication | George Liu, Vencent Chang, Shang-Wen Chang | 2010-01-19 |
| 7642101 | Semiconductor device having in-chip critical dimension and focus patterns | George Liu, Vencent Chang, Chin-Hsiang Lin, Norman Chen | 2010-01-05 |