Issued Patents All Time
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11748549 | Method and apparatus for integrated circuit mask patterning | Chin-Min Huang, Bo-Han Chen, Chien-Wen Lai, Hua-Tai Lin, Chia-Cheng Chang +2 more | 2023-09-05 |
| 10990744 | Method and apparatus for integrated circuit mask patterning | Chin-Min Huang, Bo-Han Chen, Chien-Wen Lai, Hua-Tai Lin, Chia-Cheng Chang +2 more | 2021-04-27 |
| 9870443 | Method and apparatus for integrated circuit mask patterning | Chin-Min Huang, Bo-Han Chen, Chien-Wen Lai, Hua-Tai Lin, Chia-Cheng Chang +2 more | 2018-01-16 |
| 9213233 | Photolithography scattering bar structure and method | Chia-Cheng Chang, Wei-Kuan Yu, Yen-Hsu Chu, Tsai-Ming Huang, Chin-Min Huang +2 more | 2015-12-15 |
| 9026956 | Method of lithographic process evaluation | Chia-Cheng Chang, Wei-Kuan Yu, Tsai-Ming Huang, Chin-Min Huang, Chien-Wen Lai +2 more | 2015-05-05 |
| 8972912 | Structure for chip extension | Chin-Min Huang, Chia-Cheng Chang, Chien-Wen Lai, Kong-Beng Thei, Hua-Tai Lin +1 more | 2015-03-03 |
| 8972909 | OPC method with higher degree of freedom | Chia-Cheng Chang, Jau-Shian Liang, Wen-Chen Lu, Chin-Min Huang, Ming-Hui Chih +2 more | 2015-03-03 |
| 8677290 | Method of forming and using photolithography mask having a scattering bar structure | Yung-Sung Yen, Kuei-Shun Chen, Chien-Wen Lai | 2014-03-18 |
| 8589830 | Method and apparatus for enhanced optical proximity correction | Chia-Cheng Chang, Chin-Min Huang, Wei-Kuan Yu, Lai Chien Wen, Hua-Tai Lin | 2013-11-19 |
| 8048590 | Photolithography mask having a scattering bar structure that includes transverse linear assist features | Yung-Sung Yen, Kuei-Shun Chen, Chien-Wen Lai | 2011-11-01 |
| 7778805 | Regression system and methods for optical proximity correction modeling | Wen-Chun Huang, Ru-Gun Liu, Chih-Ming Lai, Chen Kun Tsai, Chien-Wen Lai +2 more | 2010-08-17 |