Issued Patents All Time
Showing 26–50 of 64 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9934353 | Focus measurements using scatterometry metrology | Mohamed El Kodadi, Nuriel Amir, Roie Volkovich, Vladimir Levinski, Yoel Feler +3 more | 2018-04-03 |
| 9927718 | Multi-layer overlay metrology target and complimentary overlay metrology measurement systems | Vladimir Levinski, Guy M. Cohen | 2018-03-27 |
| 9903711 | Feed forward of metrology data in a metrology system | Ady Levy, Michael Adel, Leonid Poslavsky, John Robinson, Tal Marciano +9 more | 2018-02-27 |
| 9875946 | On-device metrology | Andrei V. Shchegrov, Jonathan M. Madsen, Stilian Ivanov Pandev, Ady Levy, Michael Adel +1 more | 2018-01-23 |
| 9869543 | Reducing algorithmic inaccuracy in scatterometry overlay metrology | Barak Bringoltz, Mark Ghinovker, Vladimir Levinski, Zeev Bomzon | 2018-01-16 |
| 9864209 | Self-moire target design principles for measuring unresolved device-like pitches | Vladimir Levinski, Yuri Paskover | 2018-01-09 |
| 9851300 | Decreasing inaccuracy due to non-periodic effects on scatterometric signals | Barak Bringoltz, Ofer Zaharan, Amnon Manassen, Nadav Carmel, Victoria Naipak +2 more | 2017-12-26 |
| 9841689 | Approach for model calibration used for focus and dose measurement | Vladimir Levinski, Yoel Feler, Nadav Gutman | 2017-12-12 |
| 9784987 | Apodization for pupil imaging scatterometry | Andrew V. Hill, Amnon Manassen, Barak Bringoltz, Ohad Bachar, Mark Ghinovker +1 more | 2017-10-10 |
| 9739702 | Symmetric target design in scatterometry overlay metrology | Barak Bringoltz, Yoel Feler, Noam Sapiens, Irina Paykin, Alexander Svizher +4 more | 2017-08-22 |
| 9678421 | Target element types for process parameter metrology | Vladimir Levinski, Feler Yoel | 2017-06-13 |
| 9645079 | Structured illumination for contrast enhancement in overlay metrology | Joel Seligson, Noam Sapiens | 2017-05-09 |
| 9620426 | Method and system for providing process tool correctables using an optimized sampling scheme with smart interpolation | Pavel Izikson, John Robinson | 2017-04-11 |
| 9581430 | Phase characterization of targets | Amnon Manassen, Ohad Bachar, Daria Negri, Boris Golovanevsky, Barak Bringoltz +8 more | 2017-02-28 |
| 9512985 | Systems for providing illumination in optical metrology | Gregory Brady, Andrei V. Shchegrov, Lawrence D. Rotter, Derrick Shaughnessy, Anatoly Shchemelinin +16 more | 2016-12-06 |
| 9454072 | Method and system for providing a target design displaying high sensitivity to scanner focus change | Vladimir Levinski, Yoel Feler | 2016-09-27 |
| 9255895 | Angle-resolved antisymmetric scatterometry | Vladimir Levinski, Noam Sapiens | 2016-02-09 |
| 9164397 | Optics symmetrization for metrology | Amnon Manassen, Moshe Baruch, Joel Seligson, Alexander Svizher, Guy M. Cohen +4 more | 2015-10-20 |
| 9104120 | Structured illumination for contrast enhancement in overlay metrology | Joel Seligson, Noam Sapiens | 2015-08-11 |
| 9091650 | Apodization for pupil imaging scatterometry | Andrew V. Hill, Amnon Manassen, Barak Bringoltz, Ohad Bachar, Mark Ghinovker +1 more | 2015-07-28 |
| 9093458 | Device correlated metrology (DCM) for OVL with embedded SEM structure overlay targets | Nuriel Amir, DongSub Choi, Tal Itzkovich | 2015-07-28 |
| 9080971 | Metrology systems and methods | Vladimir Levinski, Alexander Svizher, Joel Seligson, Andrew V. Hill, Ohad Bachar +6 more | 2015-07-14 |
| 8913237 | Device-like scatterometry overlay targets | Vladimir Levinski, Eran Amit | 2014-12-16 |
| 8908175 | Flexible scatterometry metrology system and method | Michael Adel, Joel Seligson, Boris Golovanevsky | 2014-12-09 |
| 8896832 | Discrete polarization scatterometry | Andrew V. Hill, Amnon Manassen, Vladimir Levinski, Joel Seligson, Alexander Svizher +3 more | 2014-11-25 |