Issued Patents All Time
Showing 51–64 of 64 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8873054 | Metrology systems and methods | Vladimir Levinski, Alexander Svizher, Joel Seligson, Andrew V. Hill, Ohad Bachar +6 more | 2014-10-28 |
| 8848186 | Angle-resolved antisymmetric scatterometry | Vladimir Levinski, Noam Sapiens | 2014-09-30 |
| 8655469 | Advanced process control optimization | DongSub Choi, Amir Widmann, David Tien | 2014-02-18 |
| 8582114 | Overlay metrology by pupil phase analysis | Amnon Manassen, Moshe Baruch, Vladimir Levinski, Noam Sapiens, Joel Seligson +4 more | 2013-11-12 |
| 8441639 | Metrology systems and methods | Vladimir Levinski, Alexander Svizher, Joel Seligson, Andrew V. Hill, Ohad Bachar +6 more | 2013-05-14 |
| 8214771 | Scatterometry metrology target design optimization | Michael Adel, Amnon Manassen | 2012-07-03 |
| 8142966 | Substrate matrix to decouple tool and process effects | Pavel Izikson, Michael Adel | 2012-03-27 |
| 8004679 | Target design and methods for scatterometry overlay determination | Vladimir Levinski | 2011-08-23 |
| 7616313 | Apparatus and methods for detecting overlay errors using scatterometry | Walter D. Mieher, Boris Golovanevsky | 2009-11-10 |
| 7602491 | Optical gain approach for enhancement of overlay and alignment systems performance | Vladimir Levinski, Michael Adel, Joel Seligson | 2009-10-13 |
| 7528941 | Order selected overlay metrology | Vladimir Levinski, Michael Adel, Joel Seligson | 2009-05-05 |
| 7526749 | Methods and apparatus for designing and using micro-targets in overlay metrology | Vladimir Levinski, Michael Adel, Aviv Frommer | 2009-04-28 |
| 7440105 | Continuously varying offset mark and methods of determining overlay | Michael Adel, Joel Seligson | 2008-10-21 |
| 7277172 | Measuring overlay and profile asymmetry using symmetric and anti-symmetric scatterometry signals | Kenneth P. Gross, Michael Friedmann, Jiyou Fu, Shakar Krishnan, Boris Golovanevsky | 2007-10-02 |