Issued Patents All Time
Showing 25 most recent of 28 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7992518 | Silicon carbide gas distribution plate and RF electrode for plasma etch chamber | Tuqiang Ni | 2011-08-09 |
| 6800213 | Precision dielectric etch using hexafluorobutadiene | Ji Ding, Hidehiro Kojiri, Yoshio Ishikawa, Keiji Horioka, Ruiping Wang +1 more | 2004-10-05 |
| 6776873 | Yttrium oxide based surface coating for semiconductor IC processing vacuum chambers | Jennifer Y. Sun, Shun Wu, Senh Thach, Ananda H. Kumar, Hong Wang +2 more | 2004-08-17 |
| 6513452 | Adjusting DC bias voltage in plasma chamber | Hongching Shan, Evans Lee, Michael Welch, Bryan Pu, Paul Luscher +2 more | 2003-02-04 |
| 6454898 | Inductively coupled RF Plasma reactor having an overhead solenoidal antenna and modular confinement magnet liners | Kenneth S. Collins, Michael R. Rice, Douglas A. Buchberger, Jr., Craig A. Roderick, Eric Askarinam +5 more | 2002-09-24 |
| 6432318 | Dielectric etch process reducing striations and maintaining critical dimensions | Ji Ding, Hidehiro Kojiri, Yoshio Ishikawa, Keiji Horioka, Ruiping Wang +1 more | 2002-08-13 |
| 6379574 | Integrated post-etch treatment for a dielectric etch process | Hui Ou-Yang, Chih-Ping Yang, Lin-Xiu Ye, Chih-Pang Chen, You-Neng Cheng +2 more | 2002-04-30 |
| 6361705 | Plasma process for selectively etching oxide using fluoropropane or fluoropropylene | Ruiping Wang, Gerald Yin, Hao Lu, Jian Ding | 2002-03-26 |
| 6308654 | Inductively coupled parallel-plate plasma reactor with a conical dome | Gerhard Schneider, Viktor Shel, Andrew Nguyen, Gerald Yin | 2001-10-30 |
| 6221782 | Adjusting DC bias voltage in plasma chamber | Hongching Shan, Evans Lee, Michael Welch, Bryan Pu, Paul Luscher +2 more | 2001-04-24 |
| 6183655 | Tunable process for selectively etching oxide using fluoropropylene and a hydrofluorocarbon | Ruiping Wang, Gerald Yin, Jian Ding | 2001-02-06 |
| 6074512 | Inductively coupled RF plasma reactor having an overhead solenoidal antenna and modular confinement magnet liners | Kenneth S. Collins, Michael R. Rice, Douglas A. Buchberger, Jr., Craig A. Roderick, Eric Askarinam +5 more | 2000-06-13 |
| 6074959 | Method manifesting a wide process window and using hexafluoropropane or other hydrofluoropropanes to selectively etch oxide | Ruiping Wang, Gerald Yin, Jian Ding | 2000-06-13 |
| 6009830 | Independent gas feeds in a plasma reactor | Haojiang Li | 2000-01-04 |
| 5986875 | Puncture resistant electrostatic chuck | Arik Donde, Hyman J. Levinstein, Andreas Hegedus, Edwin C. Weldon, Shamouil Shamouilian +2 more | 1999-11-16 |
| 5965463 | Silane etching process | Chunshi Cui, Gerald Yin | 1999-10-12 |
| 5910221 | Bonded silicon carbide parts in a plasma reactor | — | 1999-06-08 |
| 5904778 | Silicon carbide composite article particularly useful for plasma reactors | Hao Lu, Nianci Han, Gerald Yin | 1999-05-18 |
| 5891350 | Adjusting DC bias voltage in plasma chambers | Hong Ching Shan, Evans Lee, Michael Welch, Bryan Pu, Paul Luscher +2 more | 1999-04-06 |
| 5865937 | Broad-band adjustable power ratio phase-inverting plasma reactor | Hongching Shan, Hiroji Hanawa, Michael Welch | 1999-02-02 |
| 5729423 | Puncture resistant electrostatic chuck | Arik Donde, Hyman J. Levinstein, Andreas Hegedus, Edwin C. Weldon, Shamouil Shamouilian +2 more | 1998-03-17 |
| 5607542 | Inductively enhanced reactive ion etching | Gerald Yin | 1997-03-04 |
| 5605637 | Adjustable dc bias control in a plasma reactor | Hongching Shan, Evans Lee | 1997-02-25 |
| 5585012 | Self-cleaning polymer-free top electrode for parallel electrode etch operation | Hyman J. Levinstein, Hongching Shan | 1996-12-17 |
| 5560780 | Protective coating for dielectric material on wafer support used in integrated circuit processing apparatus and method of forming same | Jian Ding | 1996-10-01 |