RB

Ralph Brinkhof

AB Asml Netherlands B.V.: 20 patents #201 of 3,192Top 7%
AN Asml Holding N.V.: 1 patents #312 of 520Top 60%
Overall (All Time): #212,519 of 4,157,543Top 6%
20
Patents All Time

Issued Patents All Time

Showing 1–20 of 20 patents

Patent #TitleCo-InventorsDate
12276919 Method for controlling a semiconductor manufacturing process Marc Hauptmann, Cornelis Johannes Henricus LAMBREGTS, Amir Bin Ismail, Rizvi Rahman, Allwyn Boustheen +4 more 2025-04-15
12189314 Metrology method and associated metrology and lithographic apparatuses Sebastianus Adrianus GOORDEN, Simon Gijsbert Josephus Mathijssen, Leendert Jan KARSSEMEIJER, Manouk RIJPSTRA, Kaustuve Bhattacharyya 2025-01-07
12032299 Metrology method and associated metrology and lithographic apparatuses Patricius Aloysius Jacobus Tinnemans, Igor Matheus Petronella Aarts, Kaustuve Bhattacharyya, Leendert Jan KARSSEMEIJER, Stefan Carolus Jacobus Antonius Keij +4 more 2024-07-09
11442372 Method of measuring an alignment mark or an alignment mark assembly, alignment system, and lithographic tool Franciscus Godefridus Casper Bijnen 2022-09-13
11029610 Lithographic method Patricius Aloysius Jacobus Tinnemans, Edo Maria Hulsebos, Henricus Johannes Lambertus Megens, Ahmet Koray Erdamar, Loek Johannes Petrus Verhees +11 more 2021-06-08
10962887 Lithographic method Patricius Aloysius Jacobus Tinnemans, Edo Maria Hulsebos, Henricus Johannes Lambertus Megens, Sudharshanan Raghunathan, Boris Menchtchikov +13 more 2021-03-30
10901326 Method of controlling a lithographic apparatus and device manufacturing method, control system for a lithographic apparatus and lithographic apparatus Edo Maria Hulsebos, Patricius Aloysius Jacobus Tinnemans, Pieter Jacob Heres, Jorn Kjeld Lucas, Loek Johannes Petrus Verhees +2 more 2021-01-26
10620549 Method of controlling a lithographic apparatus and device manufacturing method, control system for a lithographic apparatus and lithographic apparatus Edo Maria Hulsebos, Patricius Aloysius Jacobus Tinnemans, Pieter Jacob Heres, Jorn Kjeld Lucas, Loek Johannes Petrus Verhees +2 more 2020-04-14
10527958 Lithographic method Patricius Aloysius Jacobus Tinnemans, Edo Maria Hulsebos, Henricus Johannes Lambertus Megens, Sudharshanan Raghunathan, Boris Menchtchikov +13 more 2020-01-07
10416577 Position measuring method of an alignment target Simon Gijsbert Josephus Mathijssen, Maikel Robert GOOSEN, Vassili Demergis, Bartolomeus Petrus Rijpers 2019-09-17
10331040 Method of controlling a lithographic apparatus and device manufacturing method, control system for a lithographic apparatus and lithographic apparatus Edo Maria Hulsebos, Patricius Aloysius Jacobus Tinnemans, Pieter Jacob Heres, Jorn Kjeld Lucas, Loek Johannes Petrus Verhees +2 more 2019-06-25
8842293 Level sensor arrangement for lithographic apparatus and device manufacturing method Arie Jeffrey Den Boef, Jozef Petrus Henricus Benschop, Lukasz Jerzy Macht 2014-09-23
8675210 Level sensor, lithographic apparatus, and substrate surface positioning method Arie Jeffrey Den Boef, Jozef Petrus Henricus Benschop, Willem Jurrianus Venema, Lukasz Jerzy Macht, Laurent Khuat Duy +1 more 2014-03-18
8208118 Method for determining exposure settings, lithographic exposure apparatus, computer program and data carrier David Warren Burry, Frank Staals, Robert Franken, Erik Johan Koop 2012-06-26
7889357 Method for positioning a target portion of a substrate with respect to a focal plane of a projection system Cornelis Henricus Van De Vin, Arthur Winfried Eduardus Minnaert, Alex Van Zon 2011-02-15
7746484 Method for positioning a target portion of a substrate with respect to a focal plane of a projection system Cornelis Henricus Van De Vin, Arthur Winfried Eduardus Minnaert, Alex Van Zon 2010-06-29
7649635 Method for determining a map, device manufacturing method, and lithographic apparatus Hielke Schoonewelle, Marcus Boonman, Martin Jules Marie-Emile De Nivelle, Jan Stoeten, Erwin Antonius Martinus Van Alphen 2010-01-19
7292351 Method for determining a map, device manufacturing method, and lithographic apparatus Hielke Schoonewelle, Marcus Boonman, Martin Jules Marie-Emile De Nivelle, Jan Stoeten, Erwin Antonius Martinus Van Alphen 2007-11-06
7239368 Using unflatness information of the substrate table or mask table for decreasing overlay Rene Oesterholt, Tjarko Adriaan Rudolf Van Empel, Leon Martin Levasier, Joost Jeroen Ottens, Koen Jacobus Johannes Maria Zaal +1 more 2007-07-03
7113257 Assembly comprising a sensor for determining at least one of tilt and height of a substrate, a method therefor and a lithographic projection apparatus Marcus Boonman, Martin Jules Marie-Emile De Nivelle 2006-09-26