Issued Patents All Time
Showing 1–25 of 38 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12249626 | Arsenic diffusion profile engineering for transistors | Flora Fong-Song CHANG, Zhiyuan Ye | 2025-03-11 |
| 12227847 | Level monitoring and active adjustment of a substrate support assembly | James V. Santiago | 2025-02-18 |
| 12196617 | Temperature profile measurement and synchronized control on substrate and susceptor in an epitaxy chamber | Zuoming ZHU, Shu-Kwan LAU, Enle CHOO, Ala Moradian, Flora Fong-Song CHANG +10 more | 2025-01-14 |
| 12165934 | Substrate processing monitoring | Zuoming ZHU, Shu-Kwan LAU, Ala Moradian, Enle CHOO, Flora Fong-Song CHANG +10 more | 2024-12-10 |
| 11901182 | Silicide film nucleation | Xuebin Li, Errol Antonio C. Sanchez | 2024-02-13 |
| 11860973 | Method and system for foreline deposition diagnostics and control | Ala Moradian, Martin A. Hilkene, Zuoming ZHU, Errol Antonio C. Sanchez, Bindusagar Marath Sankarathodi +1 more | 2024-01-02 |
| 11733081 | Methods, systems, and apparatus for conducting a calibration operation for a plurality of mass flow controllers (MFCs) of a substrate processing system | Bindusagar Marath Sankarathodi, Zhiyuan Ye, Jyothi RAJEEVAN, Ala Moradian, Zuoming ZHU +1 more | 2023-08-22 |
| 11615986 | Methods and apparatus for metal silicide deposition | Xuebin Li, Wei Liu, Gaurav Thareja, Shashank Sharma, Schubert S. Chu | 2023-03-28 |
| 11456178 | Gate interface engineering with doped layer | Steven C. H. Hung, Benjamin Colombeau, Abhishek Dube, Sheng-Chin Kung, Malcolm J. Bevan +1 more | 2022-09-27 |
| 11309404 | Integrated CMOS source drain formation with advanced control | Benjamin Colombeau, Tushar Mandrekar, Suketu Arun Parikh, Matthias Bauer, Dimitri Kioussis +2 more | 2022-04-19 |
| 11271097 | Cap oxidation for FinFET formation | Steven C. H. Hung, Benjamin Colombeau, Abhishek Dube, Sheng-Chin Kung, Malcolm J. Bevan +1 more | 2022-03-08 |
| 11261538 | In-situ temperature mapping for epi chamber | Ala Moradian, Zuoming ZHU, Shu-Kwan LAU, Flora Fong-Song CHANG, Enle CHOO +1 more | 2022-03-01 |
| 11195914 | Transistor and method for forming a transistor | Flora Fong-Song CHANG, Zhiyuan Ye | 2021-12-07 |
| 11195923 | Method of fabricating a semiconductor device having reduced contact resistance | Gaurav Thareja, Xuebin Li, Abhishek Dube, Yi-Chiau Huang, Tushar Mandrekar +3 more | 2021-12-07 |
| 11152221 | Methods and apparatus for metal silicide deposition | Xuebin Li, Wei Liu, Gaurav Thareja, Shashank Sharma, Schubert S. Chu | 2021-10-19 |
| 11152479 | Semiconductor device, method of making a semiconductor device, and processing system | Gaurav Thareja, Xuebin Li, Abhishek Dube, Yi-Chiau Huang, Andy Lo +2 more | 2021-10-19 |
| 11081358 | Silicide film nucleation | Xuebin Li, Errol Antonio C. Sanchez | 2021-08-03 |
| 11037838 | In-situ integrated chambers | Xuebin Li, Schubert S. Chu, Errol Antonio C. Sanchez, Gaurav Thareja, Raymond Hung | 2021-06-15 |
| 10971366 | Methods for silicide deposition | Xuebin Li | 2021-04-06 |
| 10872763 | Treatments to enhance material structures | David Chu, Steven C. H. Hung, Malcolm J. Bevan, Charles Chu, Tatsuya Sato +2 more | 2020-12-22 |
| 10861722 | Integrated semiconductor processing | Benjamin Colombeau, Sheng-Chin Kung | 2020-12-08 |
| 9437640 | Engineering induced tunable electrostatic effect | Sherry L. Mings, Steven C. H. Hung | 2016-09-06 |
| 9048183 | NMOS metal gate materials, manufacturing methods, and equipment using CVD and ALD processes with metal based precursors | Seshadri Ganguli, Srinivas Gandikota, Yu Lei, Xinliang Lu, Sang Ho Yu +4 more | 2015-06-02 |
| 8778816 | In situ vapor phase surface activation of SiO2 | Tatsuya Sato, David Thompson, Jeffrey W. Anthis, Vladimir Zubkov, Steven Verhaverbeke +3 more | 2014-07-15 |
| 8658522 | Methods and apparatus for incorporating nitrogen in oxide films | Tatsuya Sato, Fanos Christodoulou | 2014-02-25 |